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    Interferometer for overlay measurements
    1.
    发明授权
    Interferometer for overlay measurements 失效
    用于覆盖测量的干涉仪

    公开(公告)号：US08248617B2

    公开(公告)日：2012-08-21

    申请号：US12427079

    申请日：2009-04-21

    Applicant: Peter De Groot ,  Jan Liesener ,  Xavier Colonna De Lega

    Inventor： Peter De Groot ,  Jan Liesener ,  Xavier Colonna De Lega

    IPC: G01B11/02

    CPC classification number: G01B9/02084 ,  G01B9/02057 ,  G01B9/0209 ,  G01B2290/70 ,  G01N21/95607 ,  G03F7/70633 ,  Y10T29/49004

    Abstract: In general, in a first aspect, the invention features a system including an interferometer configured to direct test light to an overlay target and subsequently combine it with reference light to form an interference pattern, the test and reference light being derived from a common source, a multi-element detector, one or more optics to image the overlay target on the multi-element detector; and an electronic processor in communication with the multi-element detector. The overlay target includes a first pattern and a second pattern and the electronic processor is configured to determine information about the relative alignment between the first and second patterns.

    Abstract translation: 通常，在第一方面，本发明的特征在于一种包括干涉仪的系统，该干涉仪被配置为将测试光引导到覆盖目标，并随后将其与参考光组合以形成干涉图案，测试和参考光源自公共源， 多元素检测器，用于对多元件检测器上的覆盖目标进行成像的一个或多个光学元件; 以及与多元件检测器通信的电子处理器。 覆盖目标包括第一图案和第二图案，并且电子处理器被配置为确定关于第一图案和第二图案之间的相对对准的信息。

    Interferometry for lateral metrology
    2.
    发明授权
    Interferometry for lateral metrology 有权
    侧向测量干涉测量

    公开(公告)号：US07889355B2

    公开(公告)日：2011-02-15

    申请号：US11757720

    申请日：2007-06-04

    Applicant: Xavier Colonna De Lega ,  Robert Stoner ,  Peter De Groot

    Inventor： Xavier Colonna De Lega ,  Robert Stoner ,  Peter De Groot

    IPC: G01B9/02

    CPC classification number: G01B9/02063 ,  G01B9/02057 ,  G01B9/02087 ,  G01B9/0209

    Abstract: A method is disclosed which includes: using a scanning interferometry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.

    Abstract translation: 公开了一种方法，其包括：使用扫描干涉测量系统，在包括掩埋表面的物体的不同扫描位置处产生相移干涉测量图像序列，识别对应于掩埋表面的最佳焦点位置的扫描位置 根据对象的相移干涉图像的序列，并且基于相移干涉测量图像和扫描位置生成最终图像，其中最终图像中的干涉条纹相对于相位干涉图像中的干涉条纹减小， 移位干涉图像。

    INTERFEROMETRY FOR LATERAL METROLOGY
    5.
    发明申请
    INTERFEROMETRY FOR LATERAL METROLOGY 有权
    横向计量学的干涉

    公开(公告)号：US20090303493A1

    公开(公告)日：2009-12-10

    申请号：US12540709

    申请日：2009-08-13

    Applicant: Xavier Colonna de Lega ,  Robert Stoner ,  Peter de Groot

    Inventor： Xavier Colonna de Lega ,  Robert Stoner ,  Peter de Groot

    IPC: G01B11/02

    CPC classification number: G01B9/02063 ,  G01B9/02057 ,  G01B9/02087 ,  G01B9/0209

    Abstract: A method is disclosed which includes: using a scanning interferometry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.

    Abstract translation: 公开了一种方法，其包括：使用扫描干涉测量系统，在包括掩埋表面的物体的不同扫描位置处产生相移干涉测量图像序列，识别对应于掩埋表面的最佳焦点位置的扫描位置 根据对象的相移干涉图像的序列，并且基于相移干涉测量图像和扫描位置生成最终图像，其中最终图像中的干涉条纹相对于相位干涉图像中的干涉条纹减小， 移位干涉图像。

    METHODS AND SYSTEMS FOR DETERMINING OPTICAL PROPERTIS USING LOW COHERENCE INTERFERENCE SIGNALS
    6.
    发明申请
    METHODS AND SYSTEMS FOR DETERMINING OPTICAL PROPERTIS USING LOW COHERENCE INTERFERENCE SIGNALS 审中-公开
    使用低相干干扰信号确定光学性质的方法和系统

    公开(公告)号：US20080278730A1

    公开(公告)日：2008-11-13

    申请号：US11950329

    申请日：2007-12-04

    Applicant: Xavier Colonna De Lega

    Inventor： Xavier Colonna De Lega

    IPC: G01B11/02

    CPC classification number: G01B9/02084 ,  G01B9/02058 ,  G01B9/0209 ,  G01B11/2441 ,  G01M11/0228 ,  G01M11/0271 ,  G01N21/45

    Abstract: Methods and related systems for determining properties of optical systems (e.g., interferometers) and/or optical elements (e.g., lenses and/or lens systems) are described. For example, information related to an optical thickness mismatch of an interferometer can be determined by providing scanning interferometry data. The data typically include obtaining one or more interference signals each corresponding to a different spatial location of a test object. A phase is determined for each of multiple frequencies of each interference signal. The information related to the optical thickness mismatch is determined based on the phase for each of the multiple frequencies of the interference signal(s).

    Abstract translation: 描述了用于确定光学系统（例如，干涉仪）和/或光学元件（例如，透镜和/或透镜系统）的性质的方法和相关系统。 例如，可以通过提供扫描干涉测量数据来确定与干涉仪的光学厚度失配有关的信息。 数据通常包括获得每个对应于测试对象的不同空间位置的一个或多个干扰信号。 确定每个干扰信号的多个频率中的每一个的相位。 基于干涉信号的多个频率中的每一个的相位确定与光学厚度失配有关的信息。

    Interferometer for determining characteristics of an object surface, including processing and calibration
    8.
    发明授权
    Interferometer for determining characteristics of an object surface, including processing and calibration 有权
    用于确定物体表面特征的干涉仪，包括处理和校准

    公开(公告)号：US07428057B2

    公开(公告)日：2008-09-23

    申请号：US11334949

    申请日：2006-01-19

    Applicant: Xavier Colonna De Lega ,  Peter De Groot

    Inventor： Xavier Colonna De Lega ,  Peter De Groot

    IPC: G01B11/02

    CPC classification number: G01B9/023 ,  G01B9/02004 ,  G01B9/02027 ,  G01B9/02043 ,  G01B9/02044 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02074 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B11/0675 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  G01N21/21 ,  G01N21/211

    Abstract: Disclosed is a system including: (i) an interferometer configured to direct test electromagnetic radiation to a test surface and reference electromagnetic radiation to a reference surface and subsequently combine the electromagnetic radiation to form an interference pattern, the electromagnetic radiation being derived from a common source; (ii) a multi-element detector; (iii) one or more optics configured to image the interference pattern onto the detector so that different elements of the detector correspond to different illumination angles of the test surface by the test electromagnetic radiation; and (iv) an electronic processor coupled to the detector, wherein the electronic processor is configured to process information measured by the detector to determine information about a test object having the test surface. The measurements made by the detector elements provide ellipsometry/reflectometry data for the test surface.

    Abstract translation: 公开了一种系统，包括：（i）干涉仪，被配置为将测试电磁辐射引导到测试表面并将电磁辐射引用到参考表面，并且随后组合电磁辐射以形成干涉图案，所述电磁辐射是从公共源 ; （ii）多元素检测器; （iii）一个或多个光学器件，被配置为将干涉图案成像到检测器上，使得检测器的不同元件对应于测试电磁辐射的测试表面的不同照明角度; 以及（iv）耦合到所述检测器的电子处理器，其中所述电子处理器被配置为处理由所述检测器测量的信息以确定关于具有所述测试表面的测试对象的信息。 由检测器元件进行的测量为测试表面提供椭偏仪/反射测量数据。

    Triangulation methods and systems for profiling surfaces through a thin film coating
    10.
    发明授权
    Triangulation methods and systems for profiling surfaces through a thin film coating 有权
    用于通过薄膜涂层对表面进行成形的三角测量方法和系统

    公开(公告)号：US07292346B2

    公开(公告)日：2007-11-06

    申请号：US10941622

    申请日：2004-09-15

    Applicant: Peter J. De Groot ,  Xavier Colonna De Lega

    Inventor： Peter J. De Groot ,  Xavier Colonna De Lega

    IPC: G01B9/02

    CPC classification number: G03F7/70491 ,  G01B9/02019 ,  G01B9/02022 ,  G01B9/02084 ,  G01B9/02087 ,  G01B9/0209 ,  G01B11/0675 ,  G01B2290/30 ,  G01B2290/70 ,  G03F7/70608 ,  G03F7/70641 ,  G03F7/70775 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7088

    Abstract: An optical system includes a photolithography system, a low coherence interferometer, and a detector. The photolithography system is configured to illuminate a portion of an object with a light pattern and has a reference surface. The low coherence interferometer has a reference optical path and a measurement optical path. Light that passes along the reference optical path reflects at least once from the reference surface and light that passes along the measurement optical path reflects at least once from the object. The detector is configured to detect a low coherence interference signal including light that has passed along the reference optical path and light that has passed along the measurement optical path. The low coherence interference signal is indicative of a spatial relationship between the reference surface and the object.

    Abstract translation: 光学系统包括光刻系统，低相干干涉仪和检测器。 光刻系统被配置为用光图案照射物体的一部分并具有参考表面。 低相干干涉仪具有参考光路和测量光路。 沿着基准光路通过的光至少从参考面反射一次，并且沿测量光路通过的光至少反射一次。 检测器被配置为检测包括沿着参考光路已经通过的光和沿着测量光路已经通过的光的低相干干涉信号。 低相干干涉信号指示参考表面和对象之间的空间关系。

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