公开(公告)号：US4746800A

公开(公告)日：1988-05-24

申请号：US910101

申请日：1986-09-22

申请人： Jan Van Eijk ,  Marinus A. Van Den Brink ,  Johannes M. M. Van Kimmenade ,  Hubert A. M. Neilen

发明人： Jan Van Eijk ,  Marinus A. Van Den Brink ,  Johannes M. M. Van Kimmenade ,  Hubert A. M. Neilen

IPC分类号： G03F9/00 ,  B23Q1/00 ,  B23Q1/36 ,  B23Q1/48 ,  G03F7/20 ,  G03F9/02 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  G21K5/10

CPC分类号： G03F7/70716 ,  B23Q1/36

摘要： A positioning device for manipulation of objects, provided with an object holder (5) which is rotatable about an axis of rotation (.theta.) by means of a .theta.-manipulator and is displaceable by translation along a Z-axis coinciding with the axis of rotation (.theta.) by means of a Z-manipulator. The two manipulators are coupled to each other by means of a separator (17, 153) in such a manner that the .theta.-movement and the Z-movement are independent of each other. The positioning device is particularly suitable for manipulation of objects in the submicron range, such as takes place, for example, in optical lithographic devices according to the invention.

公开(公告)号：US5953105A

公开(公告)日：1999-09-14

申请号：US776418

申请日：1997-01-30

申请人： Gerard Van Engelen ,  Frank B. Sperling ,  Henricus W. A. Janssen ,  Adianus G. Bouwer ,  Cornelis D. Van Dijk ,  Johannes M. M. Van Kimmenade ,  Jan Van Eijk ,  Adrianus Van Der Pal

发明人： Gerard Van Engelen ,  Frank B. Sperling ,  Henricus W. A. Janssen ,  Adianus G. Bouwer ,  Cornelis D. Van Dijk ,  Johannes M. M. Van Kimmenade ,  Jan Van Eijk ,  Adrianus Van Der Pal

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/709 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70833 ,  G03F9/70

摘要： A lithographic device comprising a mask table (5), a projection system (3), a substrate table (1) which is displaceable relative to the projection system (3) by means of a drive unit (21), and a measuring system (39) for measuring a position of the substrate table (1) relative to the projection system (3). A stationary part (157) of the drive unit (21) is fastened to a machine frame (85) of the lithographic device, while a stationary part (51, 53, 55) of the measuring system (39) is fastened to a reference frame (89) of the lithographic device which is dynamically isolated from the machine frame (85) by means of dynamic isolators (95). This prevents vibrations caused in the machine frame (85) by reaction forces of the drive unit (21) from being transmitted to the reference frame (89), so that the accuracy of the measuring system (39) is not adversely affected by such vibrations. The mask table (5) is displaceable relative to the projection system (3) by means of a further drive unit (31) having a stationary part (119) fastened to the machine frame (85), and the measuring system comprises a further stationary part (71, 73, 75) for measuring a position of the mask table (5) relative to the projection system (3), said further stationary part (71, 73, 75) being fastened to the reference frame (89).

摘要翻译： PCT No.PCT / IB96 / 00383 Sec。 371日期1997年1月30日 102（e）1997年1月30日PCT PCT 1996年4月29日PCT公布。 出版物WO96 / 38765 日期1996年12月5日一种光刻设备，包括一个掩模台（5），一个投影系统（3），一个通过驱动单元（21）可相对于投影系统（3）移位的衬底台（1） 以及用于测量所述基板台（1）相对于所述投影系统（3）的位置的测量系统（39）。 驱动单元（21）的固定部分（157）被紧固到平版印刷装置的机架（85）上，而测量系统（39）的固定部分（51,53,55）被固定到参考 通过动态隔离器（95）与机架（85）动态隔离的光刻设备的框架（89）。 这防止由驱动单元（21）的反作用力引起的机架（85）的振动传递到参考框架（89），使得测量系统（39）的精度不受这种振动的不利影响 。 掩模台（5）可通过具有固定在机架（85）上的固定部分（119）的另外的驱动单元（31）相对于投影系统（3）移动，并且测量系统包括另外的固定 用于测量掩模台（5）相对于投影系统（3）的位置的部分（71,73,75），所述另外的固定部分（71,73,75）紧固到参考框架（89）。

公开(公告)号：US5844666A

公开(公告)日：1998-12-01

申请号：US642014

申请日：1996-05-02

申请人： Gerard Van Engelen ,  Cornelis D. Van Dijk ,  Johannes M. M. Van Kimmenade ,  Jan Van Eijk

发明人： Gerard Van Engelen ,  Cornelis D. Van Dijk ,  Johannes M. M. Van Kimmenade ,  Jan Van Eijk

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G03B27/58 ,  G03B27/42 ,  G03B27/62

CPC分类号： G03F7/70241 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

摘要： A positioning device with a drive unit with which an object table is displaceable over a guide which is fastened to a first frame thereof. A stationary part of the drive unit is fastened to a second frame thereof and dynamically isolated from the first frame while a reaction force of the object table arising from a driving force exerted by the drive unit on the object table is transmittable exclusively into the second frame.

公开(公告)号：US5844664A

公开(公告)日：1998-12-01

申请号：US637895

申请日：1996-04-25

申请人： Johannes M. M. Van Kimmenade ,  Adrianus Van Der Pal ,  Jan Van Eijk

发明人： Johannes M. M. Van Kimmenade ,  Adrianus Van Der Pal ,  Jan Van Eijk

IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/709

摘要： A positioning device (21, 31) with a drive unit (147, 149, 151; 69, 71) with which an object table (1, 5) is displaceable over a guide (141, 65) which is fastened to a frame (45) of the positioning device (21, 31). The positioning device (21, 31) includes a force actuator system (205) which exerts on the frame (45) a compensation force which has a moment about a reference point (P) of the frame (45) whose value is equal to a value of a moment of a force of gravity acting on the object table (1, 5) about the reference point (P), and whose direction is opposed to a direction of the moment of said force of gravity. The use of the force actuator system (205) prevents the frame (45) from vibrating or being elastically deformed when a point of application on the frame (45) of the force of gravity is displaced relative to the frame (45) during a displacement of the object table (1,5). The accuracy with which the object table (1, 5) can be positioned relative to the guide (141, 65) by the drive unit (147, 149, 151; 69, 71) is accordingly not adversely affected by such vibrations or deformations. The positioning device (21, 31) is used in a lithographic device for the manufacture of integrated semiconductor circuits. The lithographic device includes a first positioning device (21) with which a substrate holder (1) is displaceable relative to a focusing system (3), and a second positioning device (31) with which a mask holder (5) is displaceable relative to the focusing system (3). A special embodiment of a lithographic device includes a joint force actuator system (205) for the first positioning device (21) and the second positioning device (31), by which system displacements of the centers, of gravity of both the substrate holder (1) and the mask holder (5) can be compensated. The force actuator system has three force actuators (205) which are integrated with three dynamic isolators (51) with which a machine frame (45) of the lithographic device rests on a base (39).

公开(公告)号：US5150153A

公开(公告)日：1992-09-22

申请号：US804577

申请日：1991-12-10

申请人： Dominicus J. Franken ,  Fransiscus M. Jacobs ,  Johannes M. M. Van Kimmenade ,  Cornelis D. Van Dijk ,  Jan Van Eljk

发明人： Dominicus J. Franken ,  Fransiscus M. Jacobs ,  Johannes M. M. Van Kimmenade ,  Cornelis D. Van Dijk ,  Jan Van Eljk

IPC分类号： F16F15/02 ,  F16F15/023 ,  F16F15/04 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： F16F15/04 ,  F16F15/022 ,  F16F15/0232 ,  G03F7/70716

摘要： A lithographic device with a lithographic irradiation system (1, 13) which is fastened near a lower side to a mounting member (5) of a frame (7). The device is provided with a unit (65) which is formed by a positioning device (37), with which an object table (21) arranged below the irradiation system (1, 13) is displaceable, and by a support member (35), over which the object table (21) is guided by means of an aerostatic foot (31). In an operational position, the unit (65) is coupled to a carrier (67) by means of coupling members (73), the carrier (67) being suspended from the mounting member (5) by means of suspension elements (79, 81, 83), so that the unit (65) is arranged between lower frame supports (25) of the frame (7) and a compact construction is obtained.The unit (65) can be rotated from the operational position to an end position, in which the unit (65) is entirely outside the frame (7) and is easily accessible for maintenance, by means of a rotation mechanism (87) and a swivel mechanism (89).The lithographic device can be used inter alia for irradiating semiconductor substrates, a semiconductor pattern provided on a mask (11) being imaged on a semiconductor substrate (19) provided on the object table (21) by means of the irradiation system (1, 13).