公开(公告)号：US5953105A

公开(公告)日：1999-09-14

申请号：US776418

申请日：1997-01-30

申请人： Gerard Van Engelen ,  Frank B. Sperling ,  Henricus W. A. Janssen ,  Adianus G. Bouwer ,  Cornelis D. Van Dijk ,  Johannes M. M. Van Kimmenade ,  Jan Van Eijk ,  Adrianus Van Der Pal

发明人： Gerard Van Engelen ,  Frank B. Sperling ,  Henricus W. A. Janssen ,  Adianus G. Bouwer ,  Cornelis D. Van Dijk ,  Johannes M. M. Van Kimmenade ,  Jan Van Eijk ,  Adrianus Van Der Pal

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/709 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70833 ,  G03F9/70

摘要： A lithographic device comprising a mask table (5), a projection system (3), a substrate table (1) which is displaceable relative to the projection system (3) by means of a drive unit (21), and a measuring system (39) for measuring a position of the substrate table (1) relative to the projection system (3). A stationary part (157) of the drive unit (21) is fastened to a machine frame (85) of the lithographic device, while a stationary part (51, 53, 55) of the measuring system (39) is fastened to a reference frame (89) of the lithographic device which is dynamically isolated from the machine frame (85) by means of dynamic isolators (95). This prevents vibrations caused in the machine frame (85) by reaction forces of the drive unit (21) from being transmitted to the reference frame (89), so that the accuracy of the measuring system (39) is not adversely affected by such vibrations. The mask table (5) is displaceable relative to the projection system (3) by means of a further drive unit (31) having a stationary part (119) fastened to the machine frame (85), and the measuring system comprises a further stationary part (71, 73, 75) for measuring a position of the mask table (5) relative to the projection system (3), said further stationary part (71, 73, 75) being fastened to the reference frame (89).

摘要翻译： PCT No.PCT / IB96 / 00383 Sec。 371日期1997年1月30日 102（e）1997年1月30日PCT PCT 1996年4月29日PCT公布。 出版物WO96 / 38765 日期1996年12月5日一种光刻设备，包括一个掩模台（5），一个投影系统（3），一个通过驱动单元（21）可相对于投影系统（3）移位的衬底台（1） 以及用于测量所述基板台（1）相对于所述投影系统（3）的位置的测量系统（39）。 驱动单元（21）的固定部分（157）被紧固到平版印刷装置的机架（85）上，而测量系统（39）的固定部分（51,53,55）被固定到参考 通过动态隔离器（95）与机架（85）动态隔离的光刻设备的框架（89）。 这防止由驱动单元（21）的反作用力引起的机架（85）的振动传递到参考框架（89），使得测量系统（39）的精度不受这种振动的不利影响 。 掩模台（5）可通过具有固定在机架（85）上的固定部分（119）的另外的驱动单元（31）相对于投影系统（3）移动，并且测量系统包括另外的固定 用于测量掩模台（5）相对于投影系统（3）的位置的部分（71,73,75），所述另外的固定部分（71,73,75）紧固到参考框架（89）。

公开(公告)号：US5844666A

公开(公告)日：1998-12-01

申请号：US642014

申请日：1996-05-02

申请人： Gerard Van Engelen ,  Cornelis D. Van Dijk ,  Johannes M. M. Van Kimmenade ,  Jan Van Eijk

发明人： Gerard Van Engelen ,  Cornelis D. Van Dijk ,  Johannes M. M. Van Kimmenade ,  Jan Van Eijk

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G03B27/58 ,  G03B27/42 ,  G03B27/62

CPC分类号： G03F7/70241 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

摘要： A positioning device with a drive unit with which an object table is displaceable over a guide which is fastened to a first frame thereof. A stationary part of the drive unit is fastened to a second frame thereof and dynamically isolated from the first frame while a reaction force of the object table arising from a driving force exerted by the drive unit on the object table is transmittable exclusively into the second frame.

公开(公告)号：US5844664A

公开(公告)日：1998-12-01

申请号：US637895

申请日：1996-04-25

申请人： Johannes M. M. Van Kimmenade ,  Adrianus Van Der Pal ,  Jan Van Eijk

发明人： Johannes M. M. Van Kimmenade ,  Adrianus Van Der Pal ,  Jan Van Eijk

IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/709

摘要： A positioning device (21, 31) with a drive unit (147, 149, 151; 69, 71) with which an object table (1, 5) is displaceable over a guide (141, 65) which is fastened to a frame (45) of the positioning device (21, 31). The positioning device (21, 31) includes a force actuator system (205) which exerts on the frame (45) a compensation force which has a moment about a reference point (P) of the frame (45) whose value is equal to a value of a moment of a force of gravity acting on the object table (1, 5) about the reference point (P), and whose direction is opposed to a direction of the moment of said force of gravity. The use of the force actuator system (205) prevents the frame (45) from vibrating or being elastically deformed when a point of application on the frame (45) of the force of gravity is displaced relative to the frame (45) during a displacement of the object table (1,5). The accuracy with which the object table (1, 5) can be positioned relative to the guide (141, 65) by the drive unit (147, 149, 151; 69, 71) is accordingly not adversely affected by such vibrations or deformations. The positioning device (21, 31) is used in a lithographic device for the manufacture of integrated semiconductor circuits. The lithographic device includes a first positioning device (21) with which a substrate holder (1) is displaceable relative to a focusing system (3), and a second positioning device (31) with which a mask holder (5) is displaceable relative to the focusing system (3). A special embodiment of a lithographic device includes a joint force actuator system (205) for the first positioning device (21) and the second positioning device (31), by which system displacements of the centers, of gravity of both the substrate holder (1) and the mask holder (5) can be compensated. The force actuator system has three force actuators (205) which are integrated with three dynamic isolators (51) with which a machine frame (45) of the lithographic device rests on a base (39).

公开(公告)号：US4746800A

公开(公告)日：1988-05-24

申请号：US910101

申请日：1986-09-22

申请人： Jan Van Eijk ,  Marinus A. Van Den Brink ,  Johannes M. M. Van Kimmenade ,  Hubert A. M. Neilen

发明人： Jan Van Eijk ,  Marinus A. Van Den Brink ,  Johannes M. M. Van Kimmenade ,  Hubert A. M. Neilen

IPC分类号： G03F9/00 ,  B23Q1/00 ,  B23Q1/36 ,  B23Q1/48 ,  G03F7/20 ,  G03F9/02 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  G21K5/10

CPC分类号： G03F7/70716 ,  B23Q1/36

摘要： A positioning device for manipulation of objects, provided with an object holder (5) which is rotatable about an axis of rotation (.theta.) by means of a .theta.-manipulator and is displaceable by translation along a Z-axis coinciding with the axis of rotation (.theta.) by means of a Z-manipulator. The two manipulators are coupled to each other by means of a separator (17, 153) in such a manner that the .theta.-movement and the Z-movement are independent of each other. The positioning device is particularly suitable for manipulation of objects in the submicron range, such as takes place, for example, in optical lithographic devices according to the invention.

公开(公告)号：US5172160A

公开(公告)日：1992-12-15

申请号：US784286

申请日：1991-10-29

申请人： Jan Van Eijk ,  Gerard Van Engelen ,  Hendrikus H. M. Cox ,  Henricus E. Beekman ,  Fransiscus M. Jacobs

发明人： Jan Van Eijk ,  Gerard Van Engelen ,  Hendrikus H. M. Cox ,  Henricus E. Beekman ,  Fransiscus M. Jacobs

IPC分类号： F16F15/03 ,  F16H21/10 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H02P25/06

CPC分类号： G03F7/70716 ,  G03F7/70833 ,  G03F7/709

摘要： An optical lithographic device having a machine frame (1) to which is fastened a lens system (11) having a vertical optical main axis (13). Below the lens system (11), a positioning device (35) is fastened on a support member (3) of the machine frame (1), by means of which device an object table (27) is displaceable relative to the lens system (11) over a guide surface (5) of the support member (3) extending perpendicular to the optical main axis (13).The device is provided with a force actuator system (67) fastened to a reference frame (83) and controlled by a feedforward control system (95). The force actuator system (67) exerts a compensatory force on the support member (3) with a direction opposite to a direction of a reaction force simultaneously exerted by the positioning device (35) on the support member (3), and with a value which is substantially equal to a value of the said reaction force. The control system (95) further comprises a negative acceleration feedback (107), whereby the force actuator system (67) exerts a control force on the support member (3) which is determined by an acceleration of the support member (3) measured by an acceleration transducer (111, 113, 115). The use of the force actuator system (67) prevents undesirable movements of the support member (3) under the influence of a reaction force exerted by the positioning device (35) on the support member (3) and under the influence of external forces.The optical lithographic device can be used inter alia for illuminating semiconductor substrates, where a semiconductor pattern provided on a mask (17) is imaged on a semiconductor substrate (25), which is positioned on the object table (27), by means of the lens system (11).

公开(公告)号：US5204712A

公开(公告)日：1993-04-20

申请号：US774763

申请日：1991-10-09

申请人： Adrianus G. Bouwer ,  Marcel C. M. Baggen ,  Henricus W. A. Janssen ,  Petrus R. Bartray ,  Jan Van Eijk

发明人： Adrianus G. Bouwer ,  Marcel C. M. Baggen ,  Henricus W. A. Janssen ,  Petrus R. Bartray ,  Jan Van Eijk

IPC分类号： B23Q1/36 ,  B23Q1/54 ,  G03F7/20 ,  G12B5/00 ,  H01L21/027 ,  H01L21/68

CPC分类号： G03F7/70825 ,  B23Q1/36 ,  B23Q1/5462 ,  G03F7/70716 ,  H01L21/682

摘要： A support device comprises a first and a second bearing unit for guiding the support device along a base surface and a straight guide extending parallel to the base surface, respectively. The support device has an object table which is coupled to a rigidification member and which is displaceable relative to the two bearing units in a z-direction transverse to the base surface and is tiltable about at least one axis of rotation directed parallel to the base surface by three force actuators. The rigidification member is coupled to the second bearing unit by a coupling member which is elastically deformable in the z-direction, and coupled to the first bearing unit via the force actuators, whereby a statically determined coupling of the rigidification member and the object table to the two bearing units is obtained. The support device is particularly suitable for displacements of an object in the sub-micron range, such as, for example, in an optical lithographic device. In particular, an accurate focusing of the object may be obtained by the use of the support device in an optical lithographic device.

公开(公告)号：US5767948A

公开(公告)日：1998-06-16

申请号：US642010

申请日：1996-05-02

申请人： Erik R. Loopstra ,  Frank B. Sperling ,  Hendricus J.M. Meijer ,  Jan Van Eijk

发明人： Erik R. Loopstra ,  Frank B. Sperling ,  Hendricus J.M. Meijer ,  Jan Van Eijk

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/677 ,  G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/707 ,  G03F7/70716 ,  G03F7/70833

摘要： A lithographic device includes a machine frame which supports a substrate holder, a focusing system and a mask holder in a vertical direction. The substrate holder is displaceable parallel to a horizontal X-direction and a horizontal Y-direction perpendicular to the X-direction by a first positioning device, and the mask holder is displaceable parallel to the X-direction by a second positioning device. The substrate holder and the mask holder are displaced synchronously parallel to the X-direction during exposure of a semiconductor substrate. The second positioning device is capable of positioning the mask holder also parallel to the Y-direction and of rotating it about a vertical axis of rotation. Therefore, a displacement of the mask holder has a parallelism to the X-direction which is determined by a positioning accuracy of the second positioning device and which is not adversely affected by a deviation from parallelism and straightness of a guide of the second positioning device. An accuracy with which the semiconductor substrate is exposed is improved by a factor corresponding to an optical reduction factor of the focusing system.

摘要翻译： 光刻设备包括在垂直方向上支撑衬底保持器，聚焦系统和掩模保持器的机架。 基板保持器可以通过第一定位装置平行于水平X方向和垂直于X方向的水平Y方向移位，并且掩模保持器可通过第二定位装置平行于X方向移位。 衬底保持器和掩模保持器在半导体衬底的曝光期间与X方向平行地同步移位。 第二定位装置能够将掩模支架定位成平行于Y方向并围绕垂直旋转轴线旋转。 因此，掩模保持架的位移与X方向平行，该X方向由第二定位装置的定位精度确定，并且不受第二定位装置的引导件的平行度和平直度的偏差的不利影响。 通过与聚焦系统的光学降低因子相对应的因子来提高半导体衬底的曝光精度。

公开(公告)号：US08896811B2

公开(公告)日：2014-11-25

申请号：US12853916

申请日：2010-08-10

申请人： Sven Antoin Johan Hol ,  Jan Van Eijk ,  Antonius Franciscus Johannes De Groot ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Geert-Jan Petrus Naaijkens ,  Marijn Kessels ,  Daniël Godfried Emma Hobbelen

发明人： Sven Antoin Johan Hol ,  Jan Van Eijk ,  Antonius Franciscus Johannes De Groot ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Geert-Jan Petrus Naaijkens ,  Marijn Kessels ,  Daniël Godfried Emma Hobbelen

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70758

摘要： A method for positioning a substage, supported by a main stage, relative to a reference object, the substage moveable in a direction between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems, each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero.

摘要翻译： 一种用于定位由主台支撑的子台相对于参考对象的方法，所述子台可在相对于主台的第一和第二位置之间的方向上移动。 该方法包括使用通过定位主平台来激活的被动力系统来定位第一阶段。 被动力系统包括两个磁体系统，每个磁体系统构造成以非接触方式相对于第二平台向第一阶段施加力，所述力施加到第一阶段 被动力系统的方向。 合力的大小和/或方向取决于第一级相对于第二级的位置，第一级在合力为零的第一和第二位置之间具有零力位置。

公开(公告)号：US20120300188A1

公开(公告)日：2012-11-29

申请号：US13477748

申请日：2012-05-22

申请人： Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yang-Shan Huang

发明人： Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yang-Shan Huang

IPC分类号： G03B27/60

CPC分类号： G03F7/70783 ,  G03F7/70758

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.

摘要翻译： 光刻设备包括被配置为调节辐射束和构造成支撑图案形成装置的支撑件的照明系统，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述光刻设备还包括构造成保持基板的基板台; 定位器，其被构造成定位所述衬底台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，布置成接合面向投影系统的衬底的表面的一部分;以及位置控制器，其被配置为控制衬底台的位置，位置控制器布置成驱动定位器和衬底表面致动器。

公开(公告)号：US08059261B2

公开(公告)日：2011-11-15

申请号：US10855976

申请日：2004-05-28

申请人： Antoine Hendrik Verweij ,  Jacobus Frederik Molenaar ,  Gerbrand Petrus Johannes Van Den Hoven ,  Michael Johannes Vervoordeldonk ,  Michel Gerardus Pardoel ,  Gerardus Johannes Verdoes ,  Jan Van Eijk

发明人： Antoine Hendrik Verweij ,  Jacobus Frederik Molenaar ,  Gerbrand Petrus Johannes Van Den Hoven ,  Michael Johannes Vervoordeldonk ,  Michel Gerardus Pardoel ,  Gerardus Johannes Verdoes ,  Jan Van Eijk

IPC分类号： G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70858

摘要： A lithographic projection apparatus having a masking device for obscuring part of at least one of a patterning device used for patterning a projection beam before imaging the patterned beam onto a substrate. The masking device includes a first masking structure to obscure said part of said patterning device in a first direction and a second masking structure to obscure said part in a second different direction, wherein said first and second masking structure are disposed in the vicinity of said focal plane in a mechanically uncoupled arrangement with respect to each other.

摘要翻译： 一种具有掩模装置的光刻投影装置，其用于遮蔽在将图案化光束成像到基板上之前将投影光束图案化的图案形成装置中的至少一个的部分。 掩模装置包括第一掩模结构，以使第一方向上的所述图案形成装置的所述部分模糊，以及在第二不同方向上遮蔽所述部分的第二掩模结构，其中所述第一和第二掩模结构设置在所述焦点附近 平面相对于彼此以机械方式分离布置。