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公开(公告)号:US11690279B2
公开(公告)日:2023-06-27
申请号:US17205414
申请日:2021-03-18
Applicant: Japan Display Inc.
Inventor: Nobuto Managaki
CPC classification number: H10K77/111 , B32B27/08 , B32B27/281 , H10K59/12 , H10K71/00 , B32B2255/10 , B32B2255/26 , B32B2307/418 , B32B2457/20 , H10K2102/311
Abstract: A semiconductor device includes: a resin substrate; a display element configured to generate an image; and a circuit layer including a thin film transistor configured to control the display element. The resin substrate has a main body made of resin and a surface layer made of the resin laminated on the main body. The surface layer has a lower electrification property than the main body or the surface layer has a lower film density than the main body. Each of the display element and the circuit layer is on the surface layer.
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公开(公告)号:US10553657B2
公开(公告)日:2020-02-04
申请号:US16180116
申请日:2018-11-05
Applicant: Japan Display Inc.
Inventor: Nobuto Managaki
Abstract: Provided is a light-emitting element including a first electrode, a partition wall covering an edge portion of the first electrode, a light-confining layer in contact with a side surface of the partition wall and the first electrode, an electroluminescence layer over the first electrode and in contact with the first electrode and the light-confining layer, and a second electrode over the electroluminescence layer. A refractive index of the light-confining layer is lower than a refractive index of the electroluminescence layer.
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公开(公告)号:US20190189731A1
公开(公告)日:2019-06-20
申请号:US16208933
申请日:2018-12-04
Applicant: Japan Display Inc.
Inventor: Nobuto Managaki
IPC: H01L27/32 , G06F3/041 , H01L51/52 , H01L23/532 , G06F3/044
CPC classification number: H01L27/3276 , G06F3/0412 , G06F3/044 , H01L23/53266 , H01L51/5253
Abstract: A display device includes a substrate, a circuit element layer on the substrate, a display element layer on the circuit element layer, a sealing film on the display element layer, an oxide film on the sealing film, a barrier metal layer on the oxide film, and a wiring layer on the barrier metal layer, wherein a surface of the sealing film in contact with the oxide film has concave/convexities, and the barrier metal layer is formed by titanium nitride. A height of the concave/convexities of the surface of the sealing film may be less than 30 nm. A thickness of the oxide film may be 5 nm or less.
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公开(公告)号:US11211580B2
公开(公告)日:2021-12-28
申请号:US16778072
申请日:2020-01-31
Applicant: Japan Display Inc.
Inventor: Nobuto Managaki
Abstract: A display device includes an organic insulating layer, a first inorganic insulating layer, and a second inorganic insulating layer arranged in a first region and a second region, a plurality of pixels arranged in the first region, a protective film arranged in the second region and in contact with an upper surface of the second inorganic insulating layer in the second region, and a groove portion is provided in the organic insulating layer in the second region. A side surface and a bottom surface of the groove portion is covered by the first inorganic insulating layer and the second inorganic insulating layer. The protective film is overlapped with an upper surface of the organic insulating layer and an upper end portion and a part of the side surface of the groove portion.
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公开(公告)号:US12167659B2
公开(公告)日:2024-12-10
申请号:US18458218
申请日:2023-08-30
Applicant: Japan Display Inc.
Inventor: Nobuto Managaki
IPC: H01L27/32 , G06F3/041 , G06F3/044 , H01L23/532 , H01L51/52 , H10K50/844 , H10K59/131 , H10K59/40
Abstract: A display device includes a substrate, a circuit element layer on the substrate, a display element layer on the circuit element layer, a sealing film on the display element layer, an oxide film on the sealing film, a barrier metal layer on the oxide film, and a wiring layer on the barrier metal layer, wherein a surface of the sealing film in contact with the oxide film has concave/convexities, and the barrier metal layer is formed by titanium nitride. A height of the concave/convexities of the surface of the sealing film may be less than 30 nm. A thickness of the oxide film may be 5 nm or less.
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公开(公告)号:US11145705B2
公开(公告)日:2021-10-12
申请号:US16737127
申请日:2020-01-08
Applicant: Japan Display Inc.
Inventor: Nobuto Managaki
Abstract: A display device includes a flexible substrate, a display portion provided on a first surface of the flexible substrate and including a plurality of pixels, a first penetrating wiring located to penetrate the flexible substrate, and a second penetrating wiring located to penetrate the flexible substrate at a position farther from the display portion than the first penetrating wiring. The flexible substrate includes a curved portion between the first penetrating wiring and the second penetrating wiring. The first penetrating wiring and the second penetrating wiring are electrically connected with each other without being extended on the curved portion.
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公开(公告)号:US11778879B2
公开(公告)日:2023-10-03
申请号:US17729049
申请日:2022-04-26
Applicant: Japan Display Inc.
Inventor: Nobuto Managaki
IPC: H01L27/32 , H01L51/52 , H10K59/131 , G06F3/041 , G06F3/044 , H01L23/532 , H10K50/844 , H10K59/40
CPC classification number: H10K59/131 , G06F3/044 , G06F3/0412 , G06F3/0443 , G06F3/0446 , G06F3/04164 , H01L23/53266 , H10K50/844 , H10K50/8445 , H10K59/40 , G06F2203/04103 , G06F2203/04111
Abstract: A display device includes a substrate, a circuit element layer on the substrate, a display element layer on the circuit element layer, a sealing film on the display element layer, an oxide film on the sealing film, a barrier metal layer on the oxide film, and a wiring layer on the barrier metal layer, wherein a surface of the sealing film in contact with the oxide film has concave/convexities, and the barrier metal layer is formed by titanium nitride. A height of the concave/convexities of the surface of the sealing film may be less than 30 nm. A thickness of the oxide film may be 5 nm or less.
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公开(公告)号:US11342406B2
公开(公告)日:2022-05-24
申请号:US16952272
申请日:2020-11-19
Applicant: Japan Display Inc.
Inventor: Nobuto Managaki
IPC: H01L27/32 , H01L51/52 , G06F3/041 , G06F3/044 , H01L23/532
Abstract: A display device includes a substrate, a circuit element layer on the substrate, a display element layer on the circuit element layer, a sealing film on the display element layer, an oxide film on the sealing film, a barrier metal layer on the oxide film, and a wiring layer on the barrier metal layer, wherein a surface of the sealing film in contact with the oxide film has concave/convexities, and the barrier metal layer is formed by titanium nitride. A height of the concave/convexities of the surface of the sealing film may be less than 30 nm. A thickness of the oxide film may be 5 nm or less.
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公开(公告)号:US10923558B2
公开(公告)日:2021-02-16
申请号:US16735869
申请日:2020-01-07
Applicant: Japan Display Inc.
Inventor: Nobuto Managaki
IPC: H01L27/32 , H01L23/48 , H01L51/00 , H01L25/18 , H01L23/498 , H01L25/00 , H01L21/768 , H01L27/12
Abstract: A display device according to an embodiment of the present invention includes: a substrate that includes a display region and a peripheral region; a display element that is provided on the display region of the substrate; and an electronic component that is provided in the peripheral region on an opposite surface from a surface of the substrate on which the display element is provided, wherein the substrate includes one or more through holes in the peripheral region, the one or more through holes include a through electrode formed by a laminate structure of a plurality of conductive layers, and the through electrodes electrically connect the display element to the electronic component.
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公开(公告)号:US10896945B2
公开(公告)日:2021-01-19
申请号:US16208933
申请日:2018-12-04
Applicant: Japan Display Inc.
Inventor: Nobuto Managaki
IPC: G06F3/041 , H01L27/32 , G06F3/044 , H01L23/532 , H01L51/52
Abstract: A display device includes a substrate, a circuit element layer on the substrate, a display element layer on the circuit element layer, a sealing film on the display element layer, an oxide film on the sealing film, a barrier metal layer on the oxide film, and a wiring layer on the barrier metal layer, wherein a surface of the sealing film in contact with the oxide film has concave/convexities, and the barrier metal layer is formed by titanium nitride. A height of the concave/convexities of the surface of the sealing film may be less than 30 nm. A thickness of the oxide film may be 5 nm or less.
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