公开(公告)号：US5538560A

公开(公告)日：1996-07-23

申请号：US280310

申请日：1994-07-26

申请人： Jaroslav Zejda ,  Jurgen Henrich

发明人： Jaroslav Zejda ,  Jurgen Henrich

IPC分类号： C23C14/50 ,  C23C14/56 ,  C23C16/00 ,  B05C13/02 ,  B23Q1/25 ,  C23C14/00

CPC分类号： C23C14/56 ,  C23C14/566

摘要： A closed cylindrical housing defining a transport chamber has a top plate with a first opening communicating with an entry and exit chamber, and a second opening communicating with a coating chamber. A turntable rotatable about an axis in the transport chamber carries a holder to a first position below the first opening as it carries a like holder to a second position below the second opening. Each holder has thereon a container with a diameter smaller than the first opening but larger than the second opening. A first lifter raises a holder sealingly against the top plate around the first opening, the container thereon passing through the first opening to load or unload substrates. A second lifter raises the other holder so that the container thereon abuts a mask defining the second opening in order to coat a substrate in the container.

摘要翻译： 限定运输室的封闭的圆柱形壳体具有顶板，其具有与入口和出口室连通的第一开口，以及与涂覆室连通的第二开口。 在传送室中绕轴线转动的转台可将保持器运送到第一开口下方的第一位置，因为它将类似的支架运送到第二开口下方的第二位置。 每个支架上都有一个直径小于第一开口但大于第二开口的容器。 第一升降器将第一开口周围的顶板密封地抬起，其上的容器穿过第一开口以装载或卸载基板。 第二升降器升起另一个保持器，使得其上的容器抵靠限定第二开口的掩模，以便涂覆容器中的基底。

公开(公告)号：US5503675A

公开(公告)日：1996-04-02

申请号：US163854

申请日：1993-12-07

申请人： Jaroslav Zejda

发明人： Jaroslav Zejda

IPC分类号： C23C14/04 ,  C23C14/50 ,  G11B7/26 ,  C23C14/00

CPC分类号： G11B7/26 ,  C23C14/042 ,  C23C14/50

摘要： First and second transport chambers are joined to one another through a common opening (5), and house respective substrate carriers (6, 7) mounted for rotation about parallel axes. In at least one position the carriers may be superposed, plungers (14 and 15) being disposed in the area of this superposition on opposite sides of the carriers, both carriers being longitudinally displaceable parallel to the pivot axes (a and b, respectively). After a coating operation in the second transport chamber, the second plunger releases the mask from the second carrier, moves it back to the first carrier where the substrate is peripherally engaged, then moves the mask still further in order to release it from the substrate. The second plunger then retreats, and the coated substrate can be rotated in the first chamber.

摘要翻译： 第一和第二输送室通过公共开口（5）彼此连接，并且容纳各个安装成围绕平行轴线旋转的基板载体（6,7）。 在至少一个位置，载体可以重叠，柱塞（14和15）设置在载体的相对侧上的该叠加区域中，两个载体可以平行于枢转轴线（分别为a和b）纵向移动。 在第二传送室中的涂覆操作之后，第二柱塞从第二载体释放掩模，将其移回到基板周向接合的第一载体上，然后进一步移动掩模以将其从基板释放。 然后第二柱塞后退，并且涂覆的基板可以在第一室中旋转。

公开(公告)号：US5228968A

公开(公告)日：1993-07-20

申请号：US862071

申请日：1992-04-02

申请人： Jaroslav Zejda

发明人： Jaroslav Zejda

IPC分类号： C23C14/34 ,  G11B5/851 ,  H01J37/32 ,  H01J37/34

CPC分类号： H01J37/32449 ,  C23C14/3464 ,  G11B5/851 ,  H01J37/3244 ,  H01J37/34

摘要： A gas inlet (3), a substrate holder (10) with a substrate (11) and a gas outlet (5) are located on a common axis (4) in the vacuum casing (I) of a cathode sputtering system. This results in a symmetrical flow inside the cathode station (2) and a concentric uniformity of the gas pressure. These conditions result in a particularly even coating of the substrate (11) by means of sputtering.

摘要翻译： 在阴极溅射系统的真空壳体（I）中的共同轴线（4）上设置有气体入口（3），具有基板（11）的基板保持件（10）和气体出口（5）。 这导致阴极站（2）内的对称流动和气体压力的同心均匀性。 这些条件通过溅射导致基板（11）的特别均匀的涂层。

公开(公告)号：US5803521A

公开(公告)日：1998-09-08

申请号：US692536

申请日：1996-08-06

申请人： Jaroslav Zejda ,  Stefan Kempf

发明人： Jaroslav Zejda ,  Stefan Kempf

IPC分类号： B65G47/90 ,  C23C14/50 ,  B25J15/10

CPC分类号： C23C14/50 ,  B65G47/90

摘要： A plurality of finger-like grippers (12, 13, 14) pivotably supported in a housing (4, 5), and a plunger or piston (7) with a head part (8a) acting on the grippers (12, 13, 4), the piston being supported in such a way that it is free to slide in the housing (4). The grippers are held and guided in openings (17, 18) in the top part (5) of the housing (4) and can pivot about axes transverse to the longitudinal axis (L) of the housing (4, 5), where the pivot axes (a, b, c) of all the grippers are in the same plane (e) and together form a regular polygon surrounding the longitudinal axis (L). The ends of the grippers (12, 13, 14) facing the piston (7) are surrounded as a group by a ring of elastic material or by a garter spring (15), which pulls them toward stop surfaces (4b), which limit the pivoting movement.

摘要翻译： 可枢转地支撑在壳体（4,5）中的多个手指状夹持器（12,13,14）和具有作用在夹持器（12,13,14）上的头部（8a）的柱塞或活塞（7） ），所述活塞以这样的方式被支撑，使得所述活塞在所述壳体（4）中自由滑动。 夹具被保持和引导在壳体（4）的顶部（5）中的开口（17,18）中，并且可以围绕横向于壳体（4,5）的纵向轴线（L）的轴线枢转，其中 所有夹具的枢转轴线（a，b，c）在同一平面（e）中，并且一起形成围绕纵向轴线（L）的正多边形。 夹持器（12,13,14）的面对活塞（7）的端部由弹性材料环或通过一个拉动弹簧（15）组合而构成，它们将它们拉向止动表面（4b），这限制 枢轴运动。

公开(公告)号：US5611858A

公开(公告)日：1997-03-18

申请号：US317715

申请日：1994-10-04

申请人： Jaroslav Zejda

发明人： Jaroslav Zejda

IPC分类号： B65G47/86 ,  B65G49/07 ,  C23C14/56 ,  H01L21/203 ,  H01L21/677

CPC分类号： H01L21/67706 ,  C23C14/56 ,  H01L21/67712 ,  H01L21/6776

摘要： In an apparatus for the transport of discoidal substrates (3, 3', . . . ) through a treatment station or from a first to a second processing station (4 and 5, respectively) of a vacuum coating apparatus a motor unit (6) is provided, having three planar, positive conveyors driven by the latter, each having at least two sprockets (10, 10' and 12, 12') and a cogbelt (13, 14) guided over each sprocket pair, two of these conveyors being disposed to one another such that their sprockets (10, 10') extend in a common plane, the sprockets (12, 12') of a third conveyor extending in a plane which runs at right angles to the plane of the sprockets (10, 10') of the other two conveyors, and all three of the parallel strands of the three conveyors, which are at an angle to one another, being tangent to the outside edge of circular discoidal substrates (3, 3', . . . ) whose diameters correspond to the distance which the other two parallel strands of the first two conveyors have from one another and which extend in planes running across these strands, the cogbelts (13, 14) of the three conveyors being provided on their confronting outside surfaces with transversely running ribs or cleats whose number and distances apart correspond in each case to those of the cogs of the cogbelts which engage the sprockets.

摘要翻译： 在通过处理站或真空涂覆装置的第一处理站（4和5）分别传送盘状基板（3,3'，...）的装置中，马达单元（6） 具有由后者驱动的三个平面的正输送机，每个具有至少两个链轮（10,10'和12,12'）和在每个链轮对上引导的齿带（13,14），这些输送机中的两个是 彼此设置成使得它们的链轮（10,10'）在公共平面中延伸，第三传送器的链轮（12,12'）在与链轮（10,10'）的平面成直角的平面中延伸， 10'），并且三个输送机的彼此成一角度的所有三条平行线与​​圆形盘状基板（3,3'，...）的外边缘相切， 其直径对应于前两个输送机的另外两条平行线彼此之间的距离 在三条输送机的平面上延伸，三个输送机的嵌齿带（13,14）设置在其相对的外表面上，横向运行的肋条或夹板的数量和距离在每种情况下对应于齿轮的齿轮 其接合链轮。

公开(公告)号：US5112469A

公开(公告)日：1992-05-12

申请号：US572263

申请日：1990-08-27

申请人： Stefan Kempf ,  Jaroslav Zejda

发明人： Stefan Kempf ,  Jaroslav Zejda

IPC分类号： B65G49/07 ,  C23C14/50 ,  C23C14/56 ,  H01L21/677

CPC分类号： H01L21/67751 ,  C23C14/50 ,  C23C14/56 ,  C23C14/566

摘要： An apparatus for the inward and outward transfer of a workpiece, particularly of a disk-shaped substrate in a vacuum chamber having a coating system comprising a cathode station. A conveyor means designed as a rotary table is situated inside the vacuum chamber. The rotary table accepts substrate holders which are designed as turned parts. A supporting plate is provided in the region of the inward transfer station. It supports the substrate holder and prevents a sagging thereof. The supporting plate also presses the substrate holder against the inside wall of the vacuum chamber; i.e. against a seal situated in the inside wall. As a result thereof, an air-tight separation of the inward transfer chamber from the vacuum chamber and from the atmosphere is achieved. A considerable reduction in the moved masses of the rotating component parts is achieved by a skillful designing and arrangement of the component parts. A reduction in the mass moments of inertia associated therewith results since the process cycles of the coating system can sequence more quickly.

摘要翻译： 一种用于在具有包括阴极站的涂层系统的真空室中向内和向外输送工件，特别是盘形基板的装置。 设计为旋转台的传送装置位于真空室内。 旋转台接受被设计为转动部件的衬底保持器。 在向内转移站的区域中设置支撑板。 它支撑衬底支架并防止其下垂。 支撑板还将基板保持器压靠在真空室的内壁上; 即抵靠位于内壁中的密封件。 结果，实现向内转移室与真空室和大气的气密分离。 旋转部件的移动质量的显着减少通过组装部件的巧妙设计和布置来实现。 由于涂层系统的工艺循环可以更快地进行顺序，因此与其相关联的质量惯性矩的减小。

公开(公告)号：US5354380A

公开(公告)日：1994-10-11

申请号：US163855

申请日：1993-12-07

申请人： Jaroslav Zejda

发明人： Jaroslav Zejda

IPC分类号： C23C14/04 ,  C23C14/56 ,  G11B7/26 ,  C23C14/00

CPC分类号： G11B7/26 ,  C23C14/042 ,  C23C14/566

摘要： A plunger (14) is displaceably mounted in a vacuum chamber (42) and movable on a first linear path into the plane of substrate (20), for the mounting and for the transport of the mask (15) provided with a bore (32) receiving the plunger (14). A slide (41) having a forked extremity is movable from an airlock chamber (39) transverse to the first linear path to engage an annular flange of the mask (15). In a return movement the mask is transported into the removal airlock chamber (39) from which the mask is then removable by means of a removal plunger (48).

摘要翻译： 柱塞（14）可移动地安装在真空室（42）中并且可在第一线性路径上移动到基板（20）的平面中，用于安装和输送设置有孔（32）的掩模（15） ）接收柱塞（14）。 具有叉形末端的滑块（41）可从横向于第一线性路径的气锁室（39）移动以接合掩模（15）的环形凸缘。 在返回运动中，将掩模运送到去除气锁室（39）中，然后通过移除柱塞（48）将掩模从该拆卸气锁室移除。

公开(公告)号：US4886592A

公开(公告)日：1989-12-12

申请号：US196724

申请日：1988-05-20

申请人： Friedrich Anderle ,  Dan L. Costescu ,  Stefan Kempf ,  Emmerich Novak ,  Jaroslav Zejda

发明人： Friedrich Anderle ,  Dan L. Costescu ,  Stefan Kempf ,  Emmerich Novak ,  Jaroslav Zejda

IPC分类号： C23C14/50 ,  C23C14/56 ,  H01L21/00 ,  H01L21/687

CPC分类号： H01L21/6719 ,  C23C14/505 ,  C23C14/566 ,  C23C14/568 ,  H01L21/67126 ,  H01L21/6715 ,  H01L21/68764 ,  H01L21/68771 ,  Y10S414/139

摘要： A rotatable substrate holder (6) which has a plurality of substrate pickups in a circular arrangement at equal distances apart is disposed in a vacuum chamber (1). A corresponding number of substrates are driven stepwise on a circular path from an air lock station (8, 9) through at least one coating station (10, 11) to the air lock station. To increase the throughput of substrates, the vacuum chamber (1) has two air lock stations (8, 9) and two coating stations (10, 11) one following the other. The step size of the drive (36) on the one hand, and the angular position of each coating station (10 and 11, respectively) with respect to the air lock station associated with it (8 and 9, respectively) with reference to the axis of rotation of the substrate holder (6) on the other hand, are selected such that one and the same coating station (10 and 11, respectively), through the step-wise movement of a particular substrate pickup (63), is associated in each case with one and the same air lock station (8 and 9, respectively).

摘要翻译： 在真空室（1）中设置有可旋转的基板保持器（6），该基板保持器（6）具有多个间隔开的圆形布置的基板拾取器。 相应数量的基板在从空气锁定站（8,9）通过至少一个涂布站（10,11）到空气锁定站的圆形路径上逐步驱动。 为了增加基板的生产量，真空室（1）具有两个紧邻的空气锁定站（8,9）和两个涂覆站（10,11）。 一方面驱动器（36）的台阶大小以及相对于与其相关联的空气锁定站（分别为8和9）的每个涂覆站（分别为10和11）的角位置参考 另一方面，衬底保持器（6）的旋转轴线被选择成使得通过特定衬底拾取器（63）的逐步移动的相同的涂覆站（10和11）分别相关联 在每种情况下都有同一个空气锁定站（分别为8和9）。

公开(公告)号：US5970213A

公开(公告)日：1999-10-19

申请号：US204728

申请日：1994-03-01

申请人： Bernhard Cord ,  Karl-Heinz Schuller ,  Jaroslav Zejda

发明人： Bernhard Cord ,  Karl-Heinz Schuller ,  Jaroslav Zejda

IPC分类号： H01L21/31 ,  H01L21/00 ,  H05B3/00 ,  H05B3/68 ,  H05B6/00 ,  F27D11/00

CPC分类号： H01L21/67115 ,  H05B3/0047

摘要： A heating disk is located inside a vacuum chamber between a substrate holder inside the chamber and a lamp outside the chamber. The lamp emits radiation in a wavelength range which passes through a glass plate in the chamber wall but is absorbed by the heating disk, which may consist of graphite. When the disk is heated to 1000.degree. K. it emits radiation in a wavelength range which can be absorbed by a transparent substrate in the holder.

摘要翻译： 加热盘位于室内的基板保持器和室外的灯之间的真空室内。 该灯发射波长范围内的辐射，其通过室壁中的玻璃板，但被可由石墨组成的加热盘吸收。 当盘被加热到1000°K时，其发射波长范围内的辐射，该波长范围可被保持器中的透明基底吸收。

公开(公告)号：US5480530A

公开(公告)日：1996-01-02

申请号：US164009

申请日：1993-12-08

申请人： Jaroslav Zejda

发明人： Jaroslav Zejda

IPC分类号： C23C14/24 ,  C23C14/04 ,  C23C14/34 ,  C23C16/04

CPC分类号： C23C14/042 ,  Y10T29/4987

摘要： In a mask (7) for covering the outer marginal area of a disk-shaped substrate surface during a coating process, for example a vacuum sputtering or vapor depositing process, the mask (7) is made of an elastic material in the form of a planar plate with an essentially circular opening. To center and lock it onto the substrate (1) an inwardly extending annular flange is provided which assumes the actual masking function and extends in a plane parallel to the plane of the plate. The substrate (1) is laid on this flange and retained by projections extending radially inward. Prior to positioning the substrate it is bowed axially to spread apart the projections.

摘要翻译： 在用于在涂覆工艺（例如真空溅射或气相沉积工艺）中覆盖盘形基底表面的外部边缘区域的掩模（7）中，掩模（7）由弹性材料制成，形式为 具有基本圆形开口的平板。 为了使其中心并将其锁定到基板（1）上，提供向内延伸的环形凸缘，其呈现实际的遮蔽功能并且在平行于板的平面的平面中延伸。 衬底（1）被放置在该凸缘上并由径向向内延伸的突起保持。 在定位基板之前，它被轴向弯曲以将突起分开。