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1.发明授权
公开(公告)号：US5970213A
公开(公告)日：1999-10-19
申请号：US204728
申请日：1994-03-01
CPC分类号： H01L21/67115 , H05B3/0047
摘要： A heating disk is located inside a vacuum chamber between a substrate holder inside the chamber and a lamp outside the chamber. The lamp emits radiation in a wavelength range which passes through a glass plate in the chamber wall but is absorbed by the heating disk, which may consist of graphite. When the disk is heated to 1000.degree. K. it emits radiation in a wavelength range which can be absorbed by a transparent substrate in the holder.
摘要翻译： 加热盘位于室内的基板保持器和室外的灯之间的真空室内。 该灯发射波长范围内的辐射，其通过室壁中的玻璃板，但被可由石墨组成的加热盘吸收。 当盘被加热到1000°K时，其发射波长范围内的辐射，该波长范围可被保持器中的透明基底吸收。
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公开(公告)号：US20050217992A1
公开(公告)日：2005-10-06
申请号：US11141572
申请日：2005-05-31
IPC分类号： H05H1/46 , C23C14/34 , C23C14/35 , G11B5/851 , G11B11/105 , H01J37/34 , H01L21/203
CPC分类号： H01J37/3429 , C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/3408 , H01J37/3455
摘要： A magnetron sputtering source with a target having a surface to be sputtered, has a magnet arrangement for generating on the surface a magnetron magnetic field pattern, so as to generate on the surface to be sputtered an outer erosion profile along a substantially circular locus and an inner erosion profile within the outer erosion profile. The surface consists of a material with at least two elements of different weight and the magnet arrangement is adapted to form the inner erosion profile three-dimensionally cup-shaped.
摘要翻译： 具有具有待溅射表面的靶的磁控溅射源具有用于在表面上产生磁控管磁场图案的磁体布置，以便在表面上产生溅射以沿着基本上圆形的轨迹的外部侵蚀曲线，并且 外部侵蚀剖面内部侵蚀剖面。 表面由具有不同重量的至少两个元件的材料组成，并且磁体布置适于形成三维杯形的内部侵蚀廓线。
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3.发明授权Method for the production of substrates, magnetron source and sputter-coating chamber 失效制造基板，磁控管源和溅射镀膜室的方法公开(公告)号：US06579424B2
公开(公告)日：2003-06-17
申请号：US09775527
申请日：2001-02-01
IPC分类号： C23C1435
CPC分类号： H01J37/3429 , C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/3408 , H01J37/3455
摘要： A target of an alloy of metals having different specific weights is used in a method for producing substrates that are coated with a layer comprising the same two metals by magnetron sputtering of the target. When sputtering such a target material, the metals of the alloy will sputter off with different sputtering characteristics with regard to a static angle &agr; at which the sputtered off material leaves the target. For this reason, at the substrate to be sputter-coated, there occurs a demixing effect of these metals which will be deposited with a varying local ratio of the metals, that differs form the ratio of the metals in the alloy of the target. To counter-act this demixing phenomenon, the location of an electron trap formed by the magnetron field of the sputter source at the target with respect to the location of the substrate, is selected. By proving this electron trap and the resulting erosion profile on the target, the amount of deposited heavier metal to the amount of lighter metal is increased along the surface of the substrate.
摘要翻译： 在具有不同比重的金属的合金的靶材用于通过靶的磁控溅射涂覆有包含相同的两种金属的层的基板的制造方法。 当溅射这种目标材料时，关于溅射的材料离开靶材的静态角度α，合金的金属将以不同的溅射特性溅射掉。 为此，在溅射涂覆的基板上，会发生这些金属的分层效应，这些金属将以不同的局部比例的金属沉积，这不同于目标合金中金属的比例。 为了抵消这种分层现象，选择了相对于衬底的位置在靶处由溅射源的磁控管场形成的电子阱的位置。 通过证明该电子阱和在靶上产生的侵蚀曲线，沿着衬底的表面增加沉积的较重金属量与较轻金属量的量。
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公开(公告)号：US5292394A
公开(公告)日：1994-03-08
申请号：US881530
申请日：1992-05-12
申请人： Bernhard Cord , Helmut Rauner
发明人： Bernhard Cord , Helmut Rauner
CPC分类号： H01J37/32009 , H01J37/32082 , H01J37/32541
摘要： An evacuable tank having gas inlet and gas outlet openings, with at least one large-area anode at ground potential and a cathode provided as a substrate holder disposed substantially parallel thereto and connected to a high-frequency voltage source. The anode surface has step-shaped areas each being spaced at a different distance from the cathode in order to maintain a uniform ion concentration and therefore a uniform plasma.
摘要翻译： 具有气体入口和气体出口开口的排气罐，具有至少一个接地电位的大面积阳极和设置为基本平行于其并与高频电压源连接的衬底保持器的阴极。 阳极表面具有每个与阴极间隔不同距离的阶梯形区域，以便保持均匀的离子浓度并因此保持均匀的等离子体。
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公开(公告)号：US07155115B2
公开(公告)日：2006-12-26
申请号：US10119541
申请日：2002-04-09
申请人： Bernhard Cord
发明人： Bernhard Cord
CPC分类号： B05D1/60 , B05D5/083 , G11B5/8408
摘要： The invention concerns a device and a process for applying a lubricant by means of vapour deposition to a target object, especially a magnetic data carrier. The device in accordance with the invention comprises a lubricant supply means (1) that can be filled from outside, possibly by means of a feed line. The produced lubricant vapour (5) is expanded through one or more exit openings (6) in the direction of a target object (8) on which the vapour deposition is to be effected. The vapour at first becomes adsorbed on the walls of a cone-shaped distribution element (4) situated between the lubricant supply means (1) and the target object (8), from which it subsequently desorbs again. Said adsorption/desorption process assures an even and homogeneous vapour distribution over the target object (8). A device for interrupting the vapour supply makes it possible for the device to be operated in a discontinuous manner.
摘要翻译： 本发明涉及通过气相沉积将润滑剂施加到目标物体，特别是磁性数据载体上的装置和方法。 根据本发明的装置包括可以通过进料管线从外部填充的润滑剂供给装置（1）。 产生的润滑剂蒸汽（5）通过一个或多个出口（6）沿着要进行气相沉积的目标物体（8）的方向膨胀。 蒸汽首先被吸附在位于润滑剂供应装置（1）和目标物体（8）之间的锥形分配元件（4）的壁上，其随后再次解吸。 所述吸附/解吸过程确保在目标物体（8）上均匀且均匀的蒸气分布。 用于中断蒸汽供应的装置使得可以以不连续的方式操作装置。
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