公开(公告)号：US20100108261A1

公开(公告)日：2010-05-06

申请号：US12609377

申请日：2009-10-30

申请人： Jason Augustino ,  Quan Chau ,  Keith William Gaff ,  Hanh Tuong Ha ,  Brett C. Richardson ,  Harmeet Singh

发明人： Jason Augustino ,  Quan Chau ,  Keith William Gaff ,  Hanh Tuong Ha ,  Brett C. Richardson ,  Harmeet Singh

IPC分类号： C23F1/08 ,  H01L21/306

CPC分类号： H01J37/20 ,  H01J37/32091 ,  H01J37/32541 ,  H01J37/3255 ,  H01J37/32642 ,  H01J37/32715

摘要： A lower electrode assembly for use in a plasma processing chamber comprises a metal base and upper and lower edge rings. The metal base comprises metal plates brazed together and forming a brazed line on a lower side surface of the base, an edge ring support surface extending horizontally inwardly from the lower side surface and an upper side surface above the edge ring support surface. The upper edge ring comprises a lower surface mounted on the edge ring support surface and the lower edge ring surrounds the lower side surface of the base with a gap between opposed surfaces of the upper and lower edge rings and between the lower edge ring and the outer periphery of the base. The gap has an aspect ratio of total gap length to average gap width sufficient to impede arcing at the location of the braze line.

摘要翻译： 用于等离子体处理室的下部电极组件包括金属基座和上部和下部边缘环。 金属基底包括钎焊在一起的金属板，在基座的下侧表面上形成钎焊线，从下侧表面向水平方向延伸的边缘环支撑表面和在边缘环支撑表面上方的上侧表面。 上边缘环包括安装在边缘环支撑表面上的下表面，并且下边缘环围绕基底的下侧表面，在上边缘环和下边缘环的相对表面之间以及下边缘环和外侧边缘环的相对表面之间具有间隙 基地周边。 间隙具有总间隙长度与平均间隙宽度的宽高比，足以阻止钎焊线位置处的电弧。

公开(公告)号：US09412555B2

公开(公告)日：2016-08-09

申请号：US12609377

申请日：2009-10-30

申请人： Jason Augustino ,  Quan Chau ,  Keith William Gaff ,  Hanh Tuong Ha ,  Brett C. Richardson ,  Harmeet Singh

发明人： Jason Augustino ,  Quan Chau ,  Keith William Gaff ,  Hanh Tuong Ha ,  Brett C. Richardson ,  Harmeet Singh

IPC分类号： H01J37/20 ,  H01J37/32

CPC分类号： H01J37/20 ,  H01J37/32091 ,  H01J37/32541 ,  H01J37/3255 ,  H01J37/32642 ,  H01J37/32715

摘要： A lower electrode assembly for use in a plasma processing chamber comprises a metal base and upper and lower edge rings. The metal base comprises metal plates brazed together and forming a brazed line on a lower side surface of the base, an edge ring support surface extending horizontally inwardly from the lower side surface and an upper side surface above the edge ring support surface. The upper edge ring comprises a lower surface mounted on the edge ring support surface and the lower edge ring surrounds the lower side surface of the base with a gap between opposed surfaces of the upper and lower edge rings and between the lower edge ring and the outer periphery of the base. The gap has an aspect ratio of total gap length to average gap width sufficient to impede arcing at the location of the braze line.

摘要翻译： 用于等离子体处理室的下部电极组件包括金属基座和上部和下部边缘环。 金属基底包括钎焊在一起的金属板，在基座的下侧表面上形成钎焊线，从下侧表面向水平方向延伸的边缘环支撑表面和在边缘环支撑表面上方的上侧表面。 上边缘环包括安装在边缘环支撑表面上的下表面，并且下边缘环围绕基底的下侧表面，在上边缘环和下边缘环的相对表面之间以及下边缘环和外侧边缘环的相对表面之间具有间隙 基地周边。 间隙具有总间隙长度与平均间隙宽度的宽高比，足以阻止钎焊线位置处的电弧。