Cylindrical magnetic levitation stage and lithography
    1.
    发明授权
    Cylindrical magnetic levitation stage and lithography 有权
    圆柱磁悬浮台和光刻

    公开(公告)号:US08964167B2

    公开(公告)日:2015-02-24

    申请号:US13512477

    申请日:2010-10-28

    IPC分类号: G03F7/20 G03F7/24 H01L21/68

    摘要: The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The present invention provides an exposure apparatus including a new type of cylindrical magnetic levitation stage, which can levitate, rotate, and move a cylinder in the axial direction by the principle of magnetic levitation in a non-contact manner and form a nanoscale pattern on the surface of the cylinder, and a light source for irradiating light on the surface of the cylinder, thereby reducing the position error of the cylindrical magnetic levitation stage to a nanoscale size and correcting the error caused by mechanical processing in real time. Moreover, the present invention provides an exposure apparatus, which includes a differential vacuum means combined with the cylindrical magnetic levitation stage to create a partial vacuum environment between the light source and the surface of the cylinder, and thus it is possible to employ light sources such as X-rays, electron beams, extreme ultraviolet (EUV) rays, etc.

    摘要翻译: 本发明提供一种圆柱形磁悬浮台和曝光装置,其可以直接在大圆柱体的表面上形成大面积的纳米级图案。 本发明提供了一种曝光装置,其包括一种新型的圆柱形磁悬浮台,其可以通过非接触方式的磁悬浮原理沿轴向悬浮,旋转和移动圆柱体,并在其上形成纳米尺度图案 圆柱体的表面,以及用于在圆筒表面上照射光的光源,从而将圆柱形磁悬浮台的位置误差降低到纳米尺寸,并且实时校正由机械加工引起的误差。 此外,本发明提供了一种曝光装置,其包括与圆柱形磁悬浮台结合的差分真空装置,以在光源和圆柱体的表面之间产生局部真空环境,因此可以采用光源 作为X射线,电子束,极紫外(EUV)射线等

    CYLINDRICAL MAGNETIC LEVITATION STAGE AND LITHOGRAPHY
    2.
    发明申请
    CYLINDRICAL MAGNETIC LEVITATION STAGE AND LITHOGRAPHY 有权
    圆柱磁浮动阶段和平移

    公开(公告)号:US20130120732A1

    公开(公告)日:2013-05-16

    申请号:US13512477

    申请日:2010-10-28

    IPC分类号: G03F7/20 H01L21/68

    摘要: The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The present invention provides an exposure apparatus including a new type of cylindrical magnetic levitation stage, which can levitate, rotate, and move a cylinder in the axial direction by the principle of magnetic levitation in a non-contact manner and form a nanoscale pattern on the surface of the cylinder, and a light source for irradiating light on the surface of the cylinder, thereby reducing the position error of the cylindrical magnetic levitation stage to a nanoscale size and correcting the error caused by mechanical processing in real time. Moreover, the present invention provides an exposure apparatus, which includes a differential vacuum means combined with the cylindrical magnetic levitation stage to create a partial vacuum environment between the light source and the surface of the cylinder, and thus it is possible to employ light sources such as X-rays, electron beams, extreme ultraviolet (EUV) rays, etc.

    摘要翻译: 本发明提供一种圆柱形磁悬浮台和曝光装置,其可以直接在大圆柱体的表面上形成大面积的纳米级图案。 本发明提供了一种曝光装置,其包括一种新型的圆柱形磁悬浮台,其可以通过非接触方式的磁悬浮原理沿轴向悬浮,旋转和移动圆柱体,并在其上形成纳米尺度图案 圆柱体的表面,以及用于在圆筒表面上照射光的光源,从而将圆柱形磁悬浮台的位置误差降低到纳米尺寸,并且实时校正由机械加工引起的误差。 此外,本发明提供了一种曝光装置,其包括与圆柱形磁悬浮台结合的差分真空装置,以在光源和圆柱体的表面之间产生局部真空环境,因此可以采用光源 作为X射线,电子束,极紫外(EUV)射线等