摘要:
A substrate has first and second edges disposed in parallel and a principal surface connecting the first and second edges. An active layer is formed on the principal surface. A ridge-like region is disposed on the active layer along a path interconnecting a point on the first edge and a point on the second edge. The ridge-like region is made of semiconductor material having a refraction index smaller than a refraction index of the active layer, and defines a waveguide. The path is disposed along the principal surface and includes a first region on the side of the first edge and a second region on the side of the second edge. A first angle is taken between a normal to the first edge directing toward the principal surface and the first region. A second angle smaller than the first angle is taken between a normal to the second edge directing toward the principal surface and the second region. Electrodes inject current in a region of the active layer along the path.
摘要:
A light diffusion sheet receives light fluxes radiated from a light radiating element at a first plane of the light diffusion sheet and scatters or diffracts the received light fluxes, and radiates the scattered or diffracted light from an opposite second plane. A light distributing member distributes the light radiated from the second plane of the light diffusion sheet along some direction. A light radiating device is provided which has a relatively large light beam spot.
摘要:
The principal surface of a substrate made of a group III-V compound semiconductor material is about a (100) plane. A light emitting lamination structure is disposed on the principal surface. In the light emitting lamination structure, a quantum well layer is sandwiched by a pair of carrier confinement layers made of a semiconductor material having a band gap wider than a semiconductor material of the quantum well layer. The pair of carrier confinement layers are sandwiched by a pair of clad layers made of a semiconductor material having a band gap wider than the band gap of the semiconductor material of the carrier confinement layers. Thicknesses of the quantum well layer and the carrier confinement layers, as well as compositions of the semiconductor materials thereof, are set such that light emission recombination of electrons and holes occurs in the quantum well layer and not in the carrier confinement layers.
摘要:
The principal surface of a substrate made of group III-V compound semiconductor is about (100) plane. A light emitting lamination structure is disposed on the principal surface. The light emitting lamination structure includes a quantum well layer made of group III-V mixed crystal semiconductor containing In, a pair of carrier confinement layers made of semiconductor material having a band gap wider than the quantum well layer and sandwiching the quantum well layer, and a pair of clad layers made of semiconductor material having a band gap wider than the carrier confinement layers and sandwiching the quantum well layer and the carrier confinement layers. A difference of 100 meV or larger exists between an energy level of the carrier confinement layers at a conduction band lower end and a ground level of an electron in the quantum well layer.
摘要:
The principal surface of a substrate made of a group III-V compound semiconductor material is about a (100) plane. A light emitting lamination structure is disposed on the principal surface. In the light emitting lamination structure, a quantum well layer is sandwiched by a pair of carrier confinement layers made of a semiconductor material having a band gap wider than a semiconductor material of the quantum well layer. The pair of carrier confinement layers are sandwiched by a pair of clad layers made of a semiconductor material having a band gap wider than the band gap of the semiconductor material of the carrier confinement layers. Thicknesses of the quantum well layer and the carrier confinement layers, as well as compositions of the semiconductor materials thereof, are set such that light emission recombination of electrons and holes occurs in the quantum well layer and not in the carrier confinement layers.
摘要:
Provided is a liquid heating apparatus capable of heating fluid such as peroxosulfuric acid solution to high temperature in a short time. The heating apparatus includes: a flow channel member forming a flow channel 4 allowing liquid to flow and having flow channel thickness of 10 mm or smaller, the flow channel member composed of material transmitting near-infrared rays; and a near-infrared heaters 7, 8 placed over the outside of at least one of opposite flow channel surfaces of the flow channel and heating the liquid in the flow channel. The liquid flowing through the flow channel is instantaneously and evenly heated using near-infrared rays. It is preferable that spacers 6 be further provided within the flow channel 4 in order to limit the volume of the flow channel. Since not only the residence time in the heating apparatus can be shortened but the possible largest heat transfer area can be also maintained by decreasing the volume of the flow channel of the heating apparatus and by increasing the flow velocity in the heating apparatus, it is possible to increase the temperature of liquid to be heated to high temperature in a very short time even if the preset temperature of heat transfer surfaces is low.
摘要:
A heating apparatus includes a switching circuit configured to switch on/off current-feeding from an AC power source to the heater, a temperature detector configured to detect a temperature of the heater, and a current-feed controller configured to execute a first current-feed mode of changing a current-feed ratio of current-feeding time to unit time by controlling switching of the switching circuit so that the temperature detected by the temperature detector falls within a target range. The current-feed controller executes a second current-feed mode of fixing the current-feed ratio to almost 100% or almost 0% during execution of the first current-feed mode in place of the first current-feed mode.
摘要:
An image forming apparatus includes a voltage applying unit for applying a voltage to an electric load; a sub control unit for controlling the voltage applying unit; a restarting unit for restarting the sub control unit in response to receipt of a restart signal; a determining unit for determining whether or not a restart of the sub control unit is an abnormal restart; and a main control unit. The main control unit generates a control start signal for allowing the voltage applying unit to start generation of the voltage, and the restart signal. When the determining unit determines that the restart of the sub control unit is an abnormal restart, the main control unit sends again the control start signal to the sub control unit.
摘要:
An image forming apparatus is provided. A first cleaning unit is configured to collect a particle deposited on an object. An applying unit is configured to apply a voltage to the first cleaning unit. A first detector is configured to detect a first current flowing between the first cleaning unit and the object. A controller is configured to control the applying unit. When the detected first current becomes equal to or greater than a first predetermined value, the controller controls the applying unit to reduce the voltage applied to the first cleaning unit so as to make the first current smaller than the first predetermined value.
摘要:
An image forming apparatus includes: a carrier configured to carry developer; a voltage applying unit configured to apply a voltage to the carrier so that a carrier current flows from the voltage applying unit through the carrier; and a current detecting unit configured to detect the carrier current. The current detecting unit detects the carrier current at an uncharged portion of the carrier.