PROTECTIVE COATING FOR GLASS MANUFACTURING AND PROCESSING INTO ARTICLES
    2.
    发明申请
    PROTECTIVE COATING FOR GLASS MANUFACTURING AND PROCESSING INTO ARTICLES 审中-公开
    玻璃制造和加工在玻璃制品中的保护涂层

    公开(公告)号:US20090258187A1

    公开(公告)日:2009-10-15

    申请号:US12418954

    申请日:2009-04-06

    IPC分类号: B32B3/10 B32B3/00 C03C19/00

    摘要: The invention is directed to a method of protecting a glass surface during transportation and/or process using an aqueous solution of an acrylic material to protectively coat the surface of the glass sheet. The acrylic protective coating may be applied by dipping, roller applying or spraying the coating on the glass. The coating is then cured, dried or baked in an oven. Subsequently, the glass sheet may be scored and separated into individual glass article blanks for further processing; for example, edge grinding to produce smooth edges and drilling/milling to produce openings such as holes in the surface of the glass. When processing of the glass article is completed, the protective coating can be removed or the article can be shipped to the end used who can remove the coating using an aqueous solution of pH≧12 to remove the coating.

    摘要翻译: 本发明涉及一种在使用丙烯酸材料的水溶液的运输和/或加工过程中保护玻璃表面以保护性地涂覆玻璃板的表面的方法。 丙烯酸保护涂层可以通过浸涂,辊施加或将涂层喷涂在玻璃上来施加。 然后将涂层固化,干燥或在烘箱中烘烤。 随后,可将玻璃片刻痕并分离成单独的玻璃制品坯料进一步加工; 例如,边缘磨削以产生平滑边缘和钻孔/铣削以产生诸如玻璃表面中的孔的开口。 当完成玻璃制品的加工时,可以将保护涂层去除,或将物品运至使用的最终用户,使用pH> = 12的水溶液除去涂层以除去涂层。

    Anti-reflective coating for optical windows and elements
    4.
    发明授权
    Anti-reflective coating for optical windows and elements 有权
    用于光学窗户和元件的防反射涂层

    公开(公告)号:US08619365B2

    公开(公告)日:2013-12-31

    申请号:US12575820

    申请日:2009-10-08

    IPC分类号: G02B1/11 G02B5/20

    CPC分类号: G02B1/115

    摘要: Multilayer anti-reflective coatings having four or more layers are disclosed. In one aspect, the multilayer anti-reflective coating comprises a first layer having a refractive index n1, where n1

    摘要翻译: 公开了具有四层或更多层的多层抗反射涂层。 一方面,多层抗反射涂层包括具有折射率n1的第一层,其中n1 <1.4,光学厚度为(0.25±5%)兰博纳nm; 与第一层相邻的第二层,第二层具有折射率n2,其中n2> = 1.8,光学厚度为(0.5±5%)兰博纳nm; 与第二层相邻的第三层,第三层具有折射率n3,其中1.4@n3 <1.6,光学厚度为(0.1±5%)兰博纳nm; 和与第三层相邻的第四层,第四层具有折射率n4,其中n4> = 1.8,光学厚度为(0.05±10%)兰波nm; 其中lambdao是可见光范围内的波长。

    Hermetic seals for micro-electromechanical system devices
    5.
    发明授权
    Hermetic seals for micro-electromechanical system devices 有权
    微机电系统装置的密封

    公开(公告)号:US07348193B2

    公开(公告)日:2008-03-25

    申请号:US11416864

    申请日:2006-05-02

    申请人: Mike Xu Ouyang

    发明人: Mike Xu Ouyang

    IPC分类号: H01L21/00

    摘要: The invention is directed to a hermetically sealed device and a method for making such device. The device includes optical, micro-electromechanical, electronic and opto-electronic devices, having a substrate with one or a plurality of optical, opto-electronic, electronic or micro-electromechanical (“MEMS”) elements either singly or in combination that are located on a substrate; a covering having a top part and an extension extending a distance from the top part from the top part, an adhesive that is used to bond the extension portion of the covering to the substrate; and a sealing agent for hermetically sealing the area where the covering extension is bonded to the substrate. In the method of the invention the sealing agent is applied using atomic layer deposition techniques.

    摘要翻译: 本发明涉及一种气密密封装置及其制造方法。 该装置包括光学,微机电,电子和光电子器件,其具有单独或组合地定位的一个或多个光学,光电子,电子或微机电(“MEMS”)元件的衬底 在基材上 覆盖物,其具有顶部和从顶部延伸离开顶部的距离的延伸部,用于将覆盖物的延伸部分粘合到基底的粘合剂; 以及密封剂,用于将覆盖延伸部结合到基底的区域进行气密密封。 在本发明的方法中,使用原子层沉积技术施加密封剂。

    ANTI-REFLECTIVE COATING FOR OPTICAL WINDOWS AND ELEMENTS
    6.
    发明申请
    ANTI-REFLECTIVE COATING FOR OPTICAL WINDOWS AND ELEMENTS 有权
    用于光学窗口和元件的防反射涂层

    公开(公告)号:US20100060979A1

    公开(公告)日:2010-03-11

    申请号:US12575820

    申请日:2009-10-08

    IPC分类号: G02B1/11

    CPC分类号: G02B1/115

    摘要: Multilayer anti-reflective coatings having four or more layers are disclosed. In one aspect, the multilayer anti-reflective coating comprises a first layer having a refractive index n1, where n1

    摘要翻译: 公开了具有四层或更多层的多层抗反射涂层。 一方面,多层抗反射涂层包括折射率n1的第一层,其中n1 <1.4,光学厚度为(0.25±5%)λonm; 与第一层相邻的第二层,第二层具有折射率n2,其中n2≥1.8,光学厚度为(0.5±5%)λonm; 与第二层相邻的第三层,第三层具有折射率n3,其中1.4&nlE; n3 <1.6,光学厚度为(0.1±5%)λonm; 和与第三层相邻的第四层,第四层具有折射率n4,其中n4≥1.8,光学厚度为(0.05±10%)λonm; 其中λo是可见光范围内的波长。

    Solderable thin film
    7.
    发明授权
    Solderable thin film 失效
    可焊接薄膜

    公开(公告)号:US06347175B1

    公开(公告)日:2002-02-12

    申请号:US09354361

    申请日:1999-07-14

    IPC分类号: G02B602

    摘要: A copper-gallium alloy is deposited on a nonconductive substrate, such as glass, ceramic, or polymeric material, to provide a conductor to which solder will readily adhere, such that electrical contacts to photonic and electrical components can be made. The copper-gallium thin film can also be used to provide a surface for solder sealing a component within a hermetically sealed enclosure. In a preferred embodiment, the copper-gallium alloy was from about 1 to about 40 percent gallium to about 99 to about 60 percent copper and was deposited to a thickness of from about 400 nanometers to about 3 microns. The copper-gallium film is deposited utilizing sputtering or electron beam deposition equipment.

    摘要翻译: 铜 - 镓合金沉积在诸如玻璃,陶瓷或聚合物材料的非导电基底上,以提供导体,焊料将容易地粘附到该导体上,使得可以制造与光子和电气部件的电接触。 铜镓薄膜也可用于提供用于焊接密封密封外壳内的部件的表面。 在优选的实施方案中,铜 - 镓合金是约1-约40%的镓 - 约99-约60%的铜,并沉积到约400纳米至约3微米的厚度。 使用溅射或电子束沉积设备沉积铜 - 镓膜。