公开(公告)号：US20090167963A1

公开(公告)日：2009-07-02

申请号：US11994816

申请日：2006-06-26

申请人： O-Deuk Kwon ,  Koeng Su Lim ,  Joon-Yong Choi ,  Dae-Hyun Kim ,  Jun-Bo Yoon ,  Jin-Wan Jeon

发明人： O-Deuk Kwon ,  Koeng Su Lim ,  Joon-Yong Choi ,  Dae-Hyun Kim ,  Jun-Bo Yoon ,  Jin-Wan Jeon

IPC分类号： H04N9/31

CPC分类号： H04N5/7458

摘要： A projection display apparatus using a microlens array and a micromirror array comprises a substrate, multiple micromirror arrays and multiple microlens arrays. The substrate is disposed apart with a predetermined distance from a light source. The multiple micromirror arrays are disposed over the substrate to be assembled together to have a predetermined incidence angle with respect to the incident rays. The multiple microlens arrays are configured to correspond to the micromirror arrays. More specifically, a first microlens array is disposed in a predetermined region between the light source and the substrate and comprises multiple microlenses. A second microlens array is disposed in a light path of reflection rays reflected from the micromirrors.

摘要翻译： 使用微透镜阵列和微镜阵列的投影显示装置包括基板，多个微镜阵列和多个微透镜阵列。 基板与光源隔开预定的距离。 多个微镜阵列设置在基板上以组装在一起以具有相对于入射光线的预定入射角。 多个微透镜阵列被配置为对应于微镜阵列。 更具体地，第一微透镜阵列设置在光源和衬底之间的预定区域中，并且包括多个微透镜。 第二微透镜阵列设置在从微反射镜反射的反射光线的光路中。

公开(公告)号：US08278028B2

公开(公告)日：2012-10-02

申请号：US12098180

申请日：2008-04-04

申请人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

发明人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

IPC分类号： G03F7/20

CPC分类号： C09K19/544 ,  Y10T428/24802

摘要： The present invention relates to a material pattern, and mold using thereof, metal thin-film pattern, metal pattern, and method of forming the sames. A method of forming the material pattern according to the present invention comprises the steps of; (a) forming a photo-sensitive material film by coating a photo-sensitive material on a substrate; (b) deciding an exposure section on the photo-sensitive material film; (c) disposing a light refraction film and a light diffusion film at a route of light exposed on the photo-sensitive material film; and (d) forming a pattern on the photo-sensitive material film, by projecting a light on the exposure section of the photo-sensitive material film, wherein the light transmits the light refraction film and the light diffusion film.A method of forming the material pattern according to the present invention can form the material pattern of three-dimensional asymmetric structure having various inclinations and shapes and can form simply mold, metal thin-film and metal pattern using thereof.

摘要翻译： 本发明涉及一种材料图案及其使用的模具，金属薄膜图案，金属图案以及形成游丝的方法。 根据本发明的形成材料图案的方法包括以下步骤： （a）通过在基板上涂布感光材料来形成感光材料膜; （b）决定感光材料薄膜的曝光部分; （c）在曝光在感光材料膜上的光线路上设置光折射膜和光漫射膜; 以及（d）通过将光投射到感光材料膜的曝光部分上，在光敏材料膜上形成图案，其中光透射光折射膜和光漫射膜。 根据本发明的形成材料图案的方法可以形成具有各种倾斜和形状的三维不对称结构的材料图案，并且可以使用它们简单地形成模具，金属薄膜和金属图案。

公开(公告)号：US20080248264A1

公开(公告)日：2008-10-09

申请号：US12098180

申请日：2008-04-04

申请人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

发明人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

IPC分类号： G03F7/00 ,  C09K19/00 ,  B32B5/00

CPC分类号： C09K19/544 ,  Y10T428/24802

摘要： The present invention relates to a material pattern, and mold using thereof, metal thin-film pattern, metal pattern, and method of forming the sames. A method of forming the material pattern according to the present invention comprises the steps of; (a) forming a photo-sensitive material film by coating a photo-sensitive material on a substrate; (b) deciding an exposure section on the photo-sensitive material film; (c) disposing a light refraction film and a light diffusion film at a route of light exposed on the photo-sensitive material film; and (d) forming a pattern on the photo-sensitive material film, by projecting a light on the exposure section of the photo-sensitive material film, wherein the light transmits the light refraction film and the light diffusion film.A method of forming the material pattern according to the present invention can form the material pattern of three-dimensional asymmetric structure having various inclinations and shapes and can form simply mold, metal thin-film and metal pattern using thereof.

摘要翻译： 本发明涉及一种材料图案及其使用的模具，金属薄膜图案，金属图案以及形成游丝的方法。 根据本发明的形成材料图案的方法包括以下步骤： （a）通过在基板上涂布感光材料来形成感光材料膜; （b）决定感光材料薄膜的曝光部分; （c）在曝光在感光材料膜上的光线路上设置光折射膜和光漫射膜; 以及（d）通过将光投射到感光材料膜的曝光部分上，在光敏材料膜上形成图案，其中光透射光折射膜和光漫射膜。 根据本发明的形成材料图案的方法可以形成具有各种倾斜和形状的三维不对称结构的材料图案，并且可以使用它们形成简单的模具，金属薄膜和金属图案。

公开(公告)号：US07989154B2

公开(公告)日：2011-08-02

申请号：US11911897

申请日：2006-11-06

申请人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

发明人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

IPC分类号： G03F7/26

CPC分类号： G03F7/201 ,  G03F7/70291 ,  G03F7/70308 ,  G03F7/7035 ,  G03F7/70383 ,  Y10T428/24802

摘要： A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a light adjusting layer in an optical path of light shone on the polymer or resist layer, and adjusting the light adjusting layer to adjust a direction or intensity of the light shone on the polymer or resist layer. Based on the method, it is easy to fabricate a polymer or resist pattern, a metal film pattern, metal pattern structure, and a polymer mold, each having three-dimensional structures with various slopes or shapes by adjusting a direction or intensity of incident light when performing a lithography process.

摘要翻译： 在衬底上制造聚合物或抗蚀剂图案的方法包括在衬底上涂覆光敏聚合物或抗蚀剂以形成聚合物或抗蚀剂层，确定要暴露于光的聚合物或抗蚀剂层的一部分，将光调节层 在光聚合物或抗蚀剂层上照射的光路中，并且调整光调节层以调节聚合物或抗蚀剂层上的光照的方向或强度。 基于该方法，通过调节入射光的方向或强度，容易制造聚合物或抗蚀剂图案，金属膜图案，金属图案结构和聚合物模具，每个具有各种斜率或形状的三维结构 当进行光刻工艺时。

公开(公告)号：US20080182081A1

公开(公告)日：2008-07-31

申请号：US11911897

申请日：2006-11-06

申请人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

发明人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

IPC分类号： G03F7/30 ,  G03F7/40 ,  B32B3/00

CPC分类号： G03F7/201 ,  G03F7/70291 ,  G03F7/70308 ,  G03F7/7035 ,  G03F7/70383 ,  Y10T428/24802

摘要： A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a light adjusting layer in an optical path of light shone on the polymer or resist layer, and adjusting the light adjusting layer to adjust a direction or intensity of the light shone on the polymer or resist layer. Based on the method, it is easy to fabricate a polymer or resist pattern, a metal film pattern, metal pattern structure, and a polymer mold, each having three-dimensional structures with various slopes or shapes by adjusting a direction or intensity of incident light when performing a lithography process.

摘要翻译： 在衬底上制造聚合物或抗蚀剂图案的方法包括在衬底上涂覆光敏聚合物或抗蚀剂以形成聚合物或抗蚀剂层，确定要暴露于光的聚合物或抗蚀剂层的一部分，将光调节层 在光聚合物或抗蚀剂层上照射的光路中，并且调整光调节层以调节聚合物或抗蚀剂层上的光照的方向或强度。 基于该方法，通过调节入射光的方向或强度，容易制造聚合物或抗蚀剂图案，金属膜图案，金属图案结构和聚合物模具，每个具有各种斜率或形状的三维结构 当进行光刻工艺时。

公开(公告)号：US07081872B2

公开(公告)日：2006-07-25

申请号：US10105281

申请日：2002-03-26

申请人： Koeng Su Lim ,  Jun-Bo Yoon ,  Jin-Wan Jeon

发明人： Koeng Su Lim ,  Jun-Bo Yoon ,  Jin-Wan Jeon

IPC分类号： G09G3/34 ,  G02B26/00

CPC分类号： G02B26/0841 ,  B81B3/0051 ,  B81B2201/042 ,  B81B2203/058 ,  Y10S359/904

摘要： Disclosed are a micromirror device made in a simple structure using interdigitated cantilevers and having two stable rotational states, and applications thereof. The micromirror device comprises: (a) a substrate; (b) at least two protruded support posts arranged protrudedly in two columns of left and right sides on the substrate and apart by a predetermined interval from each other; (c) multiple cantilevers formed in parallel with the substrate, each having one end attached at the upper end portion of the respective protruded support posts and made in a thin strip having an elastic restoring force, wherein the cantilevers adjacent to each other are arranged to be parallel and interdigitated; (d) mirror support posts coupled to upper portions of the other ends of the cantilevers; (e) a mirror attached on upper portions of the whole mirror support posts and supported by the mirror support posts; and (f) two electrodes formed at left and right sides on the substrate, for providing an electrostatic force to the mirror, wherein the micromirror device reflects light incident into the mirror in different directions from each other by using an electrostatic force due to a voltage applied between the electrodes and the mirror, and the elastic restoring force of the cantilevers. The micromirror device can drive the mirror in two directions and adjust a rotational angle of the mirror using the electrostatic force due to a potential difference between the electrodes and the mirror for reflecting incident light, and the elastic restoring force of the cantilevers.

公开(公告)号：US07927497B2

公开(公告)日：2011-04-19

申请号：US11908826

申请日：2006-03-16

申请人： Koeng Su Lim ,  Seong Won Kwon ,  Jeong Hwan Kwak ,  Sang Il Park ,  Jun-Bo Yoon ,  Gun-Woo Moon

发明人： Koeng Su Lim ,  Seong Won Kwon ,  Jeong Hwan Kwak ,  Sang Il Park ,  Jun-Bo Yoon ,  Gun-Woo Moon

IPC分类号： H01L31/04 ,  H01L31/18

CPC分类号： H01L31/1884 ,  H01L31/022466 ,  H01L31/046 ,  H01L31/0463 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

摘要： The present invention relates to integrated thin film solar cells, and more particularly, to integrated thin film solar cells, which minimize the loss of integrated solar cells caused at the time of a manufacturing process and become available at a low cost process, and a method of manufacturing thereof, a processing method of a transparent electrode for integrated thin film solar cells, which widens an effective area and reduces manufacturing costs by minimizing a (insulating) gap between unit cells of the integrated thin film solar cells, and a structure thereof, and a transparent substrate having the transparent electrode. The method of manufacturing integrated thin film solar cells, comprising the steps of: (a) forming a transparent electrode pattern separately over a transparent substrate; (b) forming a solar cell (semiconductor) layer over the substrate of the step (a); (c) forming a first back electrode by obliquely depositing a conductive material over the solar cell (semiconductor) layer; (d) etching the solar cell (semiconductor) layer by using the first back electrode as a mask; and (e) forming a second back electrode so that the transparent electrode and the first back electrode are electrically connected by obliquely depositing a metal over the substrate of the step (d).

摘要翻译： 本发明涉及集成薄膜太阳能电池，更具体地说，涉及一体化薄膜太阳能电池，其使得在制造过程中引起的集成太阳能电池的损耗最小化并且以低成本的方法可用，以及一种方法 制造该集成薄膜太阳能电池的透明电极的处理方法及其结构，其通过使集成薄膜太阳能电池的单元电池之间的（绝缘）间隙最小化来扩大有效面积并降低制造成本， 以及具有透明电极的透明基板。 一种制造集成薄膜太阳能电池的方法，包括以下步骤：（a）在透明基板上分开形成透明电极图案; （b）在步骤（a）的衬底上形成太阳能电池（半导体）层; （c）通过在太阳能电池（半导体）层上倾斜地沉积导电材料来形成第一背电极; （d）通过使用第一背面电极作为掩模蚀刻太阳能电池（半导体）层; 和（e）形成第二背电极，使得透明电极和第一背电极通过在步骤（d）的衬底上倾斜沉积金属而电连接。

公开(公告)号：US20090097099A1

公开(公告)日：2009-04-16

申请号：US12251912

申请日：2008-10-15

申请人： Jun-Bo Yoon ,  Dae-Hyun Kim ,  Min-Woo Kim ,  Jin-Wan Jeon

发明人： Jun-Bo Yoon ,  Dae-Hyun Kim ,  Min-Woo Kim ,  Jin-Wan Jeon

IPC分类号： G02B26/00

CPC分类号： G02B26/0841

摘要： Disclosed are a micro mirror and a micro mirror array using the same. The micro mirror includes: an insulation substrate; an address electrode formed on the insulation substrate; a charging unit electrically insulated from the address electrode; and a reflecting body rotatably provided on the insulation to reflect incident light and spaced apart from the address electrode and the charging unit

摘要翻译： 公开了使用其的微反射镜和微镜阵列。 微镜包括：绝缘基板; 形成在所述绝缘基板上的寻址电极; 与寻址电极电绝缘的充电单元; 以及可旋转地设置在所述绝缘体上以反射入射光并与所述寻址电极和所述充电单元间隔开的反射体

公开(公告)号：US20070199823A1

公开(公告)日：2007-08-30

申请号：US11363846

申请日：2006-02-28

申请人： Jin-Wan Jeon ,  Dae-Hyun Kim ,  Jun-Bo Yoon ,  Koeng Lim

发明人： Jin-Wan Jeon ,  Dae-Hyun Kim ,  Jun-Bo Yoon ,  Koeng Lim

IPC分类号： C25D1/10

CPC分类号： C25D5/022 ,  C25D5/48 ,  C25D7/08

摘要： An embodiment of the present invention relates to a digital micromirror device. More particularly, an embodiment of the present invention relates to a method of manufacturing a digital micromirror device having a perfectly flat mirror surface, wherein a hole of a mirror surface from which light is reflected is obviated by forming a mirror support post portion using an electro-plating process, unlike the related art digital micromirror device in which the hole is formed at the center of the mirror surface, thereby degrading the reflection efficiency of light.

摘要翻译： 本发明的实施例涉及一种数字微镜装置。 更具体地说，本发明的一个实施例涉及一种制造具有完全平坦的镜面的数字微镜器件的方法，其中通过使用电子反射镜形成反射镜支撑柱部分来消除反射光的反射镜表面的孔 与现有技术的数字微镜装置不同，其中孔形成在镜面的中心，从而降低了光的反射效率。

公开(公告)号：US08289612B2

公开(公告)日：2012-10-16

申请号：US12251912

申请日：2008-10-15

申请人： Jun-Bo Yoon ,  Dae-Hyun Kim ,  Min-Woo Kim ,  Jin-Wan Jeon

发明人： Jun-Bo Yoon ,  Dae-Hyun Kim ,  Min-Woo Kim ,  Jin-Wan Jeon

IPC分类号： G02B26/00

CPC分类号： G02B26/0841

摘要： Disclosed are a micro mirror and a micro mirror array using the same. The micro mirror includes: an insulation substrate; an address electrode formed on the insulation substrate; a charging unit electrically insulated from the address electrode; and a reflecting body rotatably provided on the insulation to reflect incident light and spaced apart from the address electrode and the charging unit.

摘要翻译： 公开了使用其的微反射镜和微镜阵列。 微镜包括：绝缘基板; 形成在所述绝缘基板上的寻址电极; 与寻址电极电绝缘的充电单元; 以及可旋转地设置在所述绝缘体上以反射入射光并与所述寻址电极和所述充电单元间隔开的反射体。