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    PMR with improved writability and process controllability by double layer patterning
    1.
    发明申请
    PMR with improved writability and process controllability by double layer patterning 有权
    PMR具有改进的可编写性和工艺可控性，通过双层图案化

    公开(公告)号：US20080316644A1

    公开(公告)日：2008-12-25

    申请号：US11820962

    申请日：2007-06-21

    申请人： Jiun-Ting Lee ,  Shiwen Huang ,  Moris Dovek

    发明人： Jiun-Ting Lee ,  Shiwen Huang ,  Moris Dovek

    IPC分类号： G11B5/127 ,  G11B5/147 ,  B44C1/22

    CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3163 ,  Y10T29/49052

    摘要： Improved writability and a sharper neck transition are achieved in a PMR writer with a yoke that has essentially vertical sidewalls and a write pole that has sidewalls with a beveled angle. An alumina mold is made with a negative differential bevel angle by employing a two mask process. A first photoresist layer is patterned and etched to form a rectangular trench in an alumina layer. The trench extends beyond the intended ABS plane and in the opposite direction into the intended yoke area. A second photoresist layer is patterned into a yoke shape that is partially superimposed over the rectangular trench. After a second RIE process, the yoke opening adjoins the trench at a neck transition point along each long trench side. The volume of magnetic material in the yoke adjacent to the neck is thereby maximized. Dimension control of the main pole becomes independent of ABS positioning errors.

    摘要翻译： 在具有基本垂直侧壁的磁轭和具有倾斜角度的侧壁的写入极的PMR写入器中实现了改进的可写入性和更尖锐的颈部转变。 通过采用两个掩模工艺制造具有负微分斜角的氧化铝模具。 对第一光致抗蚀剂层进行图案化和蚀刻以在氧化铝层中形成矩形沟槽。 沟槽延伸超出预期的ABS平面并且在相反方向延伸到预期的轭区域中。 将第二光致抗蚀剂层图案化为部分地叠置在矩形沟槽上的磁轭形状。 在第二次RIE处理之后，磁轭开口在沿着每个长沟槽侧的颈部转变点处与沟槽相邻。 因此，与颈部相邻的磁轭中的磁性材料的体积最大化。 主极的尺寸控制变得与ABS定位误差无关。

    PMR with improved writability and process controllability by double layer patterning
    2.
    发明授权
    PMR with improved writability and process controllability by double layer patterning 有权
    PMR具有改进的可编写性和工艺可控性，通过双层图案化

    公开(公告)号：US08027125B2

    公开(公告)日：2011-09-27

    申请号：US11820962

    申请日：2007-06-21

    申请人： Jiun-Ting Lee ,  Shiwen Huang ,  Moris Dovek

    发明人： Jiun-Ting Lee ,  Shiwen Huang ,  Moris Dovek

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3163 ,  Y10T29/49052

    摘要： Improved writability and a sharper neck transition are achieved in a PMR writer with a yoke that has essentially vertical sidewalls and a write pole that has sidewalls with a beveled angle. An alumina mold is made with a negative differential bevel angle by employing a two mask process. A first photoresist layer is patterned and etched to form a rectangular trench in an alumina layer. The trench extends beyond the intended ABS plane and in the opposite direction into the intended yoke area. A second photoresist layer is patterned into a yoke shape that is partially superimposed over the rectangular trench. After a second RIE process, the yoke opening adjoins the trench at a neck transition point along each long trench side. The volume of magnetic material in the yoke adjacent to the neck is thereby maximized. Dimension control of the main pole becomes independent of ABS positioning errors.

    摘要翻译： 在具有基本垂直侧壁的磁轭和具有倾斜角度的侧壁的写入极的PMR写入器中实现了改进的可写入性和更尖锐的颈部转变。 通过采用两个掩模工艺制造具有负微分斜角的氧化铝模具。 对第一光致抗蚀剂层进行图案化和蚀刻以在氧化铝层中形成矩形沟槽。 沟槽延伸超出预期的ABS平面并且在相反方向延伸到预期的轭区域中。 将第二光致抗蚀剂层图案化为部分地叠置在矩形沟槽上的磁轭形状。 在第二次RIE处理之后，磁轭开口在沿着每个长沟槽侧的颈部转变点处与沟槽相邻。 因此，与颈部相邻的磁轭中的磁性材料的体积最大化。 主极的尺寸控制变得与ABS定位误差无关。

    PMR with improved writability and process controllability by double layer patterning
    3.
    发明申请
    PMR with improved writability and process controllability by double layer patterning 审中-公开
    PMR具有改进的可编写性和工艺可控性，通过双层图案化

    公开(公告)号：US20120008236A1

    公开(公告)日：2012-01-12

    申请号：US13200012

    申请日：2011-09-15

    申请人： Jiun-Ting Lee ,  Shiwen Huang ,  Moris Dovek

    发明人： Jiun-Ting Lee ,  Shiwen Huang ,  Moris Dovek

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3163 ,  Y10T29/49052

    摘要： Improved writability and a sharper neck transition are achieved in a PMR writer with a yoke that has essentially vertical sidewalls and a write pole that has sidewalls with a beveled angle. An alumina mold is made with a negative differential bevel angle by employing a two mask process. A first photoresist layer is patterned and etched to form a rectangular trench in an alumina layer. The trench extends beyond the intended ABS plane and in the opposite direction into the intended yoke area. A second photoresist layer is patterned into a yoke shape that is partially superimposed over the rectangular trench. After a second RIE process, the yoke opening adjoins the trench at a neck transition point along each long trench side. The volume of magnetic material in the yoke adjacent to the neck is thereby maximized. Dimension control of the main pole becomes independent of ABS positioning errors.

    摘要翻译： 在具有基本垂直侧壁的磁轭和具有倾斜角度的侧壁的写入极的PMR写入器中实现了改进的可写入性和更尖锐的颈部转变。 通过采用两个掩模工艺制造具有负微分斜角的氧化铝模具。 对第一光致抗蚀剂层进行图案化和蚀刻以在氧化铝层中形成矩形沟槽。 沟槽延伸超过预期的ABS平面并且在相反方向延伸到预期的轭区域中。 将第二光致抗蚀剂层图案化为部分地叠置在矩形沟槽上的磁轭形状。 在第二次RIE处理之后，磁轭开口在沿着每个长沟槽侧的颈部转变点处与沟槽相邻。 因此，与颈部相邻的磁轭中的磁性材料的体积最大化。 主极的尺寸控制变得与ABS定位误差无关。

    Magnetic write head with thin and thick portions for balancing writability and ate
    5.
    发明授权
    Magnetic write head with thin and thick portions for balancing writability and ate 有权
    磁性写头，薄而厚的部分，用于平衡书写和吃

    公开(公告)号：US08184399B2

    公开(公告)日：2012-05-22

    申请号：US12924416

    申请日：2010-09-27

    申请人： Yan Wu ,  Moris Dovek ,  Zhigang Bai ,  Cherng-Chyi Han ,  Jiun-Ting Lee ,  Po-Kang Wang

    发明人： Yan Wu ,  Moris Dovek ,  Zhigang Bai ,  Cherng-Chyi Han ,  Jiun-Ting Lee ,  Po-Kang Wang

    IPC分类号： G11B5/127

    CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/3163

    摘要： A perpendicular magnetic recording (PMR) head is fabricated with a tapered main pole having a variable thickness. The tapered portion of the pole is at the ABS tip and it can be formed by bevels at the leading or trailing edges or both. The taper terminates to form a region with a maximum thickness, t1, which extends for a certain distance proximally. Beyond this region of maximum thickness t1, the pole is then reduced to a constant minimum thickness t2. A yoke is attached to this region of constant minimum thickness. This pole design requires less flux because of the thinner region of the pole where it attaches to the yoke, but the thicker region just before the tapered ABS provides additional flux to drive the pole just before the ABS, so that high definition and field gain is achieved, yet fringing is significantly reduced.

    摘要翻译： 制造具有可变厚度的锥形主极的垂直磁记录（PMR）头。 极的锥形部分在ABS尖端处，并且其可以由前缘或后缘处的斜面或两者形成。 锥形终止形成最大厚度的区域t1，其向近处延伸一定距离。 超过该最大厚度的区域t1，然后将极减小到恒定的最小厚度t2。 磁轭连接到恒定最小厚度的区域。 这个极设计需要更少的通量，因为它附着在磁轭上的磁极的较薄区域，而刚好在锥形ABS之前较厚的区域提供额外的磁通来驱动刚好在ABS之前的极点，因此高清晰度和场增益是 实现了，但边缘明显减少。

    Method to make an integrated side shield PMR head with non conformal side gap
    10.
    发明授权
    Method to make an integrated side shield PMR head with non conformal side gap 有权
    制造具有非保形侧间隙的集成侧屏PMR头的方法

    公开(公告)号：US08031433B2

    公开(公告)日：2011-10-04

    申请号：US12231756

    申请日：2008-09-05

    申请人： Cherng-Chyi Yan ,  Feiyue Li ,  Shiwen Huang ,  Jiun-Ting Lee ,  Yoshitaka Sasaki

    发明人： Cherng-Chyi Yan ,  Feiyue Li ,  Shiwen Huang ,  Jiun-Ting Lee ,  Yoshitaka Sasaki

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3146 ,  G11B5/1278 ,  G11B5/1871 ,  G11B5/23 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163

    摘要： A non-conformal integrated side shield structure is disclosed for a PMR write head wherein the sidewalls of the side shield are not parallel to the pole tip sidewalls. Thus, the side gap distance between the leading pole tip edge and side shield is different than the side gap distance between the trailing pole tip edge and side shield. As a result, there is a reduced side fringing field and improved overwrite performance. The side gap distance is constant with increasing distance from the ABS along the main pole layer. A fabrication method is provided where the trailing shield and side shield are formed in the same step to afford a self-aligned shield structure. Adjacent track erasure induced by flux choking at the side shield and trailing shield interface can be eliminated by this design. The invention encompasses a tapered main pole layer in a narrow pole tip section.

    摘要翻译： 公开了一种用于PMR写头的不共形的集成侧屏蔽结构，其中侧屏蔽的侧壁不平行于极端侧壁。 因此，前导极端部边缘和侧面屏蔽件之间的侧面间隙距离不同于后部极端部边缘和侧面屏蔽之间的侧面间隙距离。 结果，边缘边缘减小，覆盖性能得到改善。 侧面间隙距离随着距离主电极层距离ABS的距离不断增加。 提供一种制造方法，其中在同一步骤中形成后屏蔽和侧屏蔽以提供自对准屏蔽结构。 通过这种设计可以消除由侧屏蔽和后屏蔽界面处的通量阻塞引起的相邻轨道擦除。 本发明包括窄极端部分中的锥形主极层。