公开(公告)号：US08071197B2

公开(公告)日：2011-12-06

申请号：US11829795

申请日：2007-07-27

申请人： Joerg Adler ,  Hans-Juergen Richter ,  Reinhard Lenk ,  Uwe Petasch ,  Claus Holdschuh ,  Thomas Rahn ,  Hans-Joerg Rembor

发明人： Joerg Adler ,  Hans-Juergen Richter ,  Reinhard Lenk ,  Uwe Petasch ,  Claus Holdschuh ,  Thomas Rahn ,  Hans-Joerg Rembor

IPC分类号： B32B3/12 ,  B01D39/06 ,  B01D50/00 ,  B01D45/00

CPC分类号： B01D46/2429 ,  B01D46/2425 ,  B01D46/2451 ,  B01D46/2455 ,  B01D46/2459 ,  B01D46/2466 ,  B01D46/247 ,  B01D46/2474 ,  B01D2046/2477 ,  B01D2046/2481 ,  B01D2046/2492 ,  Y10T428/24149

摘要： An assembled honeycomb structure includes at least two prismatic honeycomb segments. An outer cross section of each of the at least two prismatic honeycomb segments perpendicular to a flow direction in an interior of the assembled honeycomb structure is a quadrangle with included angles of one of: (i) about 60° and about 120°, or (ii) about 60°, about 90° and about 120°.

摘要翻译： 组装的蜂窝结构包括至少两个棱柱形蜂窝段。 所述至少两个棱柱形蜂窝片段中的每一个垂直于所述组装的蜂巢结构内部的流动方向的外截面是具有以下之一的夹角的四边形：（i）约60°至约120°，或（ ii）约60°，约90°和约120°。

公开(公告)号：US09683598B2

公开(公告)日：2017-06-20

申请号：US14130855

申请日：2012-06-29

申请人： Christopher Gusek ,  Frank Eisner ,  Joachim Huelstrung ,  Fred Jindra ,  Bert-Heiner Willeke ,  Marc Blumenau ,  Markus Kovac ,  Gerd Jendrischik ,  Alfred Peitz ,  Rudolf Schoenenberg ,  Joerg Adler ,  Heike Heymer

发明人： Christopher Gusek ,  Frank Eisner ,  Joachim Huelstrung ,  Fred Jindra ,  Bert-Heiner Willeke ,  Marc Blumenau ,  Markus Kovac ,  Gerd Jendrischik ,  Alfred Peitz ,  Rudolf Schoenenberg ,  Joerg Adler ,  Heike Heymer

IPC分类号： F16C13/02 ,  C23C2/00 ,  F16C13/00 ,  F16C33/34

CPC分类号： F16C13/02 ,  C23C2/003 ,  F16C13/00 ,  F16C33/34

摘要： The invention relates to the field of materials science and to a device for reducing pressure in cavities in media at higher temperatures, such as those devices which can be used for devices for hot-dip coating metal materials in the metal processing industry for example. The aim of the invention is to provide a device by means of which pressure can be reduced in the cavity of the hollow bodies in a reliable and controlled manner and simultaneously the penetration of the media can be delayed or completely prevented at the higher temperatures. This is achieved by a device for reducing pressure in hollow bodies in media at higher temperatures, wherein at least one opening to the cavity of the hollow body is provided in hollow body regions which are not used for the intended application, said opening being closed from the medium surrounding the hollow body by at least one component made of a gas-permeable metal or ceramic material.

公开(公告)号：US20100252526A1

公开(公告)日：2010-10-07

申请号：US12417100

申请日：2009-04-02

申请人： Sandra Obernhuber ,  Christof Jalics ,  Joerg Adler ,  Uwe Hoeckele ,  Walter Preis ,  Reinhard Goellner ,  Tanja Schest ,  Patricia Nickut

发明人： Sandra Obernhuber ,  Christof Jalics ,  Joerg Adler ,  Uwe Hoeckele ,  Walter Preis ,  Reinhard Goellner ,  Tanja Schest ,  Patricia Nickut

IPC分类号： C23F1/00

CPC分类号： H01L41/297 ,  H03H3/04

摘要： A method for manufacturing a device on a substrate includes forming a layer structure on the substrate, forming an auxiliary layer on the layer structure, forming a planarization layer on the auxiliary layer and on the substrate, exposing the auxiliary layer by a chemical mechanical polishing process and removing at least partly the auxiliary layer to form a planar surface of the remaining auxiliary layer or of the layer structure and the planarization layer. The chemical mechanical polishing process has a first removal rate with respect to the planarization layer and a second removal rate with respect to the auxiliary layer and the first removal rate is greater than the second removal rate.

摘要翻译： 在衬底上制造器件的方法包括在衬底上形成层结构，在层结构上形成辅助层，在辅助层和衬底上形成平坦化层，通过化学机械抛光工艺使辅助层露出 以及至少部分去除所述辅助层以形成剩余辅助层或所述层结构和所述平坦化层的平坦表面。 化学机械抛光工艺相对于平坦化层具有第一去除速率，相对于辅助层具有第二去除速率，并且第一去除速率大于第二去除速率。

公开(公告)号：US20080131684A1

公开(公告)日：2008-06-05

申请号：US11813532

申请日：2006-01-09

申请人： Joerg Adler ,  Gisela Standke ,  Daniela Kopejzny ,  Guenter Stephani ,  Kerstin Kuemmel ,  Wieland Beckert

发明人： Joerg Adler ,  Gisela Standke ,  Daniela Kopejzny ,  Guenter Stephani ,  Kerstin Kuemmel ,  Wieland Beckert

IPC分类号： F16L59/08

CPC分类号： F27D1/0006 ,  B22F5/006 ,  B22F2998/00 ,  F16L59/08 ,  F27D1/0033 ,  Y10T428/24997 ,  B22F3/1125 ,  B22F3/1137

摘要： The invention relates to the field of mechanical engineering and refers to a radiation protective shield for vacuum furnaces and protective atmosphere furnaces, which shield is used for the best possible shielding from thermal radiation. The object of the present invention is to disclose thermal radiation protective shields of reduced weight with identical or lower effective emissivity. The object is attained by a thermal radiation protective shield for vacuum furnaces and protective atmosphere furnaces, composed of at least one porous ceramic and/or metallic material that has high thermal radiation-reflecting properties at least on a surface in the direction of the heat source.

摘要翻译： 本发明涉及机械工程领域，是指用于真空炉和保护气氛炉的辐射防护罩，该屏蔽用于尽可能最好地屏蔽热辐射。 本发明的目的是公开具有相同或更低有效发射率的减重重量的热辐射防护罩。 该目的通过用于真空炉和保护气氛炉的热辐射防护罩来实现，该保护气氛炉由至少一个多孔陶瓷和/或金属材料构成，其至少在热源的方向上的表面上具有高热辐射反射特性 。

公开(公告)号：US20140341493A1

公开(公告)日：2014-11-20

申请号：US14130855

申请日：2012-06-29

申请人： Christopher Gusek ,  Frank Eisner ,  Joachim HUELSTRUNG ,  Fred Jindra ,  Bert-Heiner Willeke ,  Marc Blumenau ,  Markus Kovac ,  Gerd Jendrischik ,  Alfred Peitz ,  Rudolf Schoenenberg ,  Joerg Adler ,  Heike Heymer

发明人： Christopher Gusek ,  Frank Eisner ,  Joachim HUELSTRUNG ,  Fred Jindra ,  Bert-Heiner Willeke ,  Marc Blumenau ,  Markus Kovac ,  Gerd Jendrischik ,  Alfred Peitz ,  Rudolf Schoenenberg ,  Joerg Adler ,  Heike Heymer

IPC分类号： F16C13/02 ,  F16C33/34 ,  C23C2/00

CPC分类号： F16C13/02 ,  C23C2/003 ,  F16C13/00 ,  F16C33/34

摘要： The invention relates to the field of materials science and to a device for reducing pressure in cavities in media at higher temperatures, such as those devices which can be used for devices for hot-dip coating metal materials in the metal processing industry for example. The aim of the invention is to provide a device by means of which pressure can be reduced in the cavity of the hollow bodies in a reliable and controlled manner and simultaneously the penetration of the media can be delayed or completely prevented at the higher temperatures. This is achieved by a device for reducing pressure in hollow bodies in media at higher temperatures, wherein at least one opening to the cavity of the hollow body is provided in hollow body regions which are not used for the intended application, said opening being closed from the medium surrounding the hollow body by at least one component made of a gas-permeable metal or ceramic material.

摘要翻译： 本发明涉及材料科学领域以及用于在较高温度下降低介质中的空腔压力的装置，例如可用于例如在金属加工工业中热浸镀金属材料的装置的装置。 本发明的目的是提供一种装置，通过该装置可以以可靠和可控的方式在中空体的空腔中降低压力，并且同时可以在较高温度下延迟或完全防止介质的穿透。 这通过用于在较高温度下减小介质中的空心体的压力的装置来实现，其中至少一个中空体的空腔的开口设置在不用于预期应用的中空体区域中，所述开口从 通过由气体可渗透的金属或陶瓷材料制成的至少一个部件围绕中空体的介质。

公开(公告)号：US08597531B2

公开(公告)日：2013-12-03

申请号：US12417100

申请日：2009-04-02

申请人： Sandra Obernhuber ,  Christof Jalics ,  Joerg Adler ,  Uwe Hoeckele ,  Walter Preis ,  Reinhard Goellner ,  Tanja Schest ,  Patricia Nickut

发明人： Sandra Obernhuber ,  Christof Jalics ,  Joerg Adler ,  Uwe Hoeckele ,  Walter Preis ,  Reinhard Goellner ,  Tanja Schest ,  Patricia Nickut

IPC分类号： C03C15/00

CPC分类号： H01L41/297 ,  H03H3/04

摘要： A method for manufacturing a device on a substrate includes forming a layer structure on the substrate, forming an auxiliary layer on the layer structure, forming a planarization layer on the auxiliary layer and on the substrate, exposing the auxiliary layer by a chemical mechanical polishing process and removing at least partly the auxiliary layer to form a planar surface of the remaining auxiliary layer or of the layer structure and the planarization layer. The chemical mechanical polishing process has a first removal rate with respect to the planarization layer and a second removal rate with respect to the auxiliary layer and the first removal rate is greater than the second removal rate.

公开(公告)号：US06635339B1

公开(公告)日：2003-10-21

申请号：US09194697

申请日：1999-05-24

申请人： Joerg Adler ,  Michael Teichgraeber ,  Gisela Standke ,  Helmut Jaunich ,  Heike Stoever ,  Reinhard Stoetzel

发明人： Joerg Adler ,  Michael Teichgraeber ,  Gisela Standke ,  Helmut Jaunich ,  Heike Stoever ,  Reinhard Stoetzel

IPC分类号： B32B514

CPC分类号： C04B41/85 ,  B01D39/2093 ,  C04B41/009 ,  C04B41/50 ,  F28F21/04 ,  Y10T428/249957 ,  Y10T428/249969 ,  C04B41/4523 ,  C04B41/4535 ,  C04B38/0615

摘要： The disclosed invention relates to the field of ceramics and concerns an open-cell expanded ceramic which may be used in the form of a deep-bed filter, and a process for the production thereof. The primary object is to produce an open-cell expanded ceramic by a simple and economical process. This object is attained by an open-cell expanded ceramic in which the inner cavities, cracks and the porosity of the ceramic members are filled partially or completely by one or a plurality of metal and/or ceramic phases and/or glass phases. The open-cell expanded ceramic is also produced in that during or after sintering the cavities, cracks and the porosity of the ceramic members are partially or completely filled with a melt or a suspension which melt below the melting temperature of the expanded ceramic, have a coefficient of expansion similar to the coefficient of expansion of the expanded ceramic, and a very good wetting capacity, and only react partially or not at all with constituents of the expanded ceramic.

摘要翻译： 所公开的发明涉及陶瓷领域，并且涉及可以深床过滤器形式使用的开孔膨胀陶瓷及其生产方法。 主要目的是通过简单经济的工艺生产开孔膨胀陶瓷。 该目的通过开孔扩展陶瓷来实现，其中陶瓷构件的内腔，裂纹和孔隙率部分地或完全地被一个或多个金属和/或陶瓷相和/或玻璃相填充。 开孔膨胀陶瓷的制造也就是在烧结过程中或之后，空腔，裂纹和陶瓷构件的孔隙率部分或完全填充熔融物或悬浮液，其熔化到膨胀陶瓷的熔融温度以下，具有 膨胀系数与膨胀陶瓷的膨胀系数相似，并且具有非常好的润湿能力，并且仅部分或根本不与膨胀陶瓷的成分反应。