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1.发明申请公开(公告)号：US20100026978A1
公开(公告)日：2010-02-04
申请号：US12539136
申请日：2009-08-11
申请人： Johannes Ruoff , Aurelian Dodoc
发明人： Johannes Ruoff , Aurelian Dodoc
CPC分类号： G03F7/70341 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G03F7/70966
摘要： The disclosure relates a projection objective of a microlithographic projection exposure apparatus, as well as a related microlithographic projection exposure apparatus and method. The projection objective can include a lens of a cubically crystalline material whose crystal orientation is oriented at an angle of at most 15° relative to the optical axis of the projection objective. The projection objective can also include a polarization correction element which has at least two subelements of birefringent, optically uniaxial material and having at least one respective aspheric surface. During use of the projection objective, the polarization correction element at least partially compensates for an intrinsic birefringence of the lens.
摘要翻译： 本公开涉及微光刻投影曝光装置的投影物镜，以及相关的微光刻投影曝光装置和方法。 投影物镜可包括立方结晶材料的透镜，其晶体取向相对于投影物镜的光轴以至多15°的角度取向。 投影物镜还可以包括偏振校正元件，该偏振校正元件具有至少两个双折射元件，光学单轴材料并具有至少一个相应的非球面表面。 在投影物镜的使用期间，偏振校正元件至少部分地补偿透镜的固有双折射。
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公开(公告)号：US09182578B2
公开(公告)日：2015-11-10
申请号：US13326516
申请日：2011-12-15
申请人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Marco Pretorius , Christoph Menke , Wilhelm Ulrich , Martin Endres
发明人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Marco Pretorius , Christoph Menke , Wilhelm Ulrich , Martin Endres
CPC分类号： G02B17/0663 , G02B27/0905 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors, which image an object field in an object plane into an image field in an image plane. A reflection face of at least one of the mirrors is configured as a free form face which cannot be described by a rotationally symmetrical function. The object field has an aspect ratio greater than 1. A ratio of a minimal and a maximal transverse dimension of the object field can be less than 0.9.
摘要翻译： 成像光学系统具有多个反射镜，其将物平面中的对象场成像到图像平面中的图像场。 至少一个反射镜的反射面构成为不能用旋转对称的功能描述的自由表面。 物体场的纵横比大于1.物体场的最小和最大横向尺寸的比可以小于0.9。
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公开(公告)号：US08730572B2
公开(公告)日：2014-05-20
申请号：US13470956
申请日：2012-05-14
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），并且其中条件COMP1 <10成立。
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公开(公告)号：US08416490B2
公开(公告)日：2013-04-09
申请号：US12816863
申请日：2010-06-16
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），并且其中条件COMP1 <10成立。
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公开(公告)号：US08289619B2
公开(公告)日：2012-10-16
申请号：US13153544
申请日：2011-06-06
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
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公开(公告)号：US08208198B2
公开(公告)日：2012-06-26
申请号：US11653366
申请日：2007-01-16
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
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公开(公告)号：US08208127B2
公开(公告)日：2012-06-26
申请号：US12173595
申请日：2008-07-15
CPC分类号： G03F7/70941 , G02B5/005 , G02B17/0657 , G03F7/70233 , G03F7/7025
摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.
摘要翻译： 本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。 投影装置包括反射元件，通过该反射元件定义光线路径。 光束路径中的光瞳组合停止。 组合止动件具有用作孔径光阑的第一开口（孔口）。 组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。 此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。
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公开(公告)号：US08068276B2
公开(公告)日：2011-11-29
申请号：US12899297
申请日：2010-10-06
IPC分类号： G02B17/08
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译： 在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。 该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在 在光瞳平面或场平面上不光学的区域。
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公开(公告)号：US20110235167A1
公开(公告)日：2011-09-29
申请号：US13153544
申请日：2011-06-06
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。 该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。
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公开(公告)号：US07835073B2
公开(公告)日：2010-11-16
申请号：US12014496
申请日：2008-01-15
IPC分类号： G02B17/08
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译： 在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。 该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在 在光瞳平面或场平面上不光学的区域。
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