公开(公告)号：US20100026978A1

公开(公告)日：2010-02-04

申请号：US12539136

申请日：2009-08-11

申请人： Johannes Ruoff ,  Aurelian Dodoc

发明人： Johannes Ruoff ,  Aurelian Dodoc

IPC分类号： G03B27/54 ,  G02B5/30

CPC分类号： G03F7/70341 ,  G02B17/0804 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70966

摘要： The disclosure relates a projection objective of a microlithographic projection exposure apparatus, as well as a related microlithographic projection exposure apparatus and method. The projection objective can include a lens of a cubically crystalline material whose crystal orientation is oriented at an angle of at most 15° relative to the optical axis of the projection objective. The projection objective can also include a polarization correction element which has at least two subelements of birefringent, optically uniaxial material and having at least one respective aspheric surface. During use of the projection objective, the polarization correction element at least partially compensates for an intrinsic birefringence of the lens.

摘要翻译： 本公开涉及微光刻投影曝光装置的投影物镜，以及相关的微光刻投影曝光装置和方法。 投影物镜可包括立方结晶材料的透镜，其晶体取向相对于投影物镜的光轴以至多15°的角度取向。 投影物镜还可以包括偏振校正元件，该偏振校正元件具有至少两个双折射元件，光学单轴材料并具有至少一个相应的非球面表面。 在投影物镜的使用期间，偏振校正元件至少部分地补偿透镜的固有双折射。

公开(公告)号：US20120320358A1

公开(公告)日：2012-12-20

申请号：US13555785

申请日：2012-07-23

申请人： Johannes Ruoff

发明人： Johannes Ruoff

IPC分类号： G03B27/54

CPC分类号： G03F7/70283 ,  G03F7/705 ,  G03F7/70566 ,  G03F7/706

摘要： The disclosure relates to a method for adapting a projection exposure apparatus for microlithography to a mask having structures with different pitches and/or different structure widths in different structure directions. Wavefront aberrations induced by the mask are reduced by a manipulator of the projection exposure apparatus for microlithography.

摘要翻译： 本公开涉及一种用于将用于微光刻的投影曝光装置适配成具有在不同结构方向上具有不同间距和/或不同结构宽度的结构的掩模的方法。 通过用于微光刻的投影曝光装置的操纵器来减小由掩模引起的波前像差。

公开(公告)号：US07679831B2

公开(公告)日：2010-03-16

申请号：US11838995

申请日：2007-08-15

申请人： Daniel Kraehmer ,  Johannes Ruoff

发明人： Daniel Kraehmer ,  Johannes Ruoff

IPC分类号： G02B9/00

CPC分类号： G03F7/70966 ,  G02B13/143

摘要： Projection objectives of micro-lithographic projection exposure apparatuses, as well as related methods and components, are disclosed.

摘要翻译： 公开了微光刻投影曝光装置的投影目标，以及相关方法和组件。

公开(公告)号：US20090306921A1

公开(公告)日：2009-12-10

申请号：US12421996

申请日：2009-04-10

申请人： Michael Totzeck ,  Daniel Kraehmer ,  Ralf Mueller ,  Johannes Ruoff ,  Vladan Blahnik

发明人： Michael Totzeck ,  Daniel Kraehmer ,  Ralf Mueller ,  Johannes Ruoff ,  Vladan Blahnik

IPC分类号： G01M11/02 ,  G06F19/00

CPC分类号： G01M11/0257

摘要： The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.

摘要翻译： 本公开涉及通过使用取向泽尔尼克多项式的光学系统的规范，优化和匹配。 在一些实施例中，提供了一种用于评估微光刻投影曝光设备的光学系统的适用性的方法。 该方法可以包括确定光学系统的琼斯光瞳，至少近似地使用扩展到定向泽尔尼克多项式来描述琼斯光瞳，并且基于至少一个取向的膨胀系数来评估光学系统的适用性 Zernike多项式在扩展中。

公开(公告)号：US08674329B2

公开(公告)日：2014-03-18

申请号：US13805960

申请日：2011-06-24

申请人： Michael Budach ,  Tristan Bret ,  Klaus Edinger ,  Thorsten Hofmann ,  Heiko Feldmann ,  Johannes Ruoff

发明人： Michael Budach ,  Tristan Bret ,  Klaus Edinger ,  Thorsten Hofmann ,  Heiko Feldmann ,  Johannes Ruoff

IPC分类号： G21K5/04

CPC分类号： G01N21/95 ,  B82Y10/00 ,  B82Y40/00 ,  C23C14/48 ,  G03B27/68 ,  G03F1/24 ,  G03F1/72 ,  G03F1/74 ,  G03F1/84 ,  G03F7/705 ,  G03F7/7065 ,  G06F17/5009 ,  G06T7/0002 ,  G21K5/00

摘要： The invention relates to a method for analyzing a defect of a photolithographic mask for an extreme ultraviolet (EUV) wavelength range (EUV mask) comprising the steps of: (a) generating at least one focus stack relating to the defect using an EUV mask inspection tool, (b) determining a surface configuration of the EUV mask at a position of the defect, (c) providing model structures having the determined surface configuration which have different phase errors and generating the respective focus stacks, and (d) determining a three dimensional error structure of the EUV mask defect by comparing the at least one generated focus stack of the defect and the generated focus stacks of the model structures.

摘要翻译： 本发明涉及一种用于分析用于极紫外（EUV）波长范围（EUV掩模）的光刻掩模的缺陷的方法，包括以下步骤：（a）使用EUV掩模检查产生与缺陷有关的至少一个焦点叠层 工具，（b）在缺陷的位置确定EUV掩模的表面结构，（c）提供具有确定的表面配置的模型结构，其具有不同的相位误差并产生相应的焦点堆叠，以及（d）确定三维 通过比较所述缺陷的至少一个生成的焦点堆栈和所产生的模型结构的焦点堆栈，来确定EUV掩模缺陷的三维误差结构。

公开(公告)号：US08126669B2

公开(公告)日：2012-02-28

申请号：US12421996

申请日：2009-04-10

申请人： Michael Totzeck ,  Daniel Kraehmer ,  Ralf Mueller ,  Johannes Ruoff ,  Vladan Blahnik

发明人： Michael Totzeck ,  Daniel Kraehmer ,  Ralf Mueller ,  Johannes Ruoff ,  Vladan Blahnik

IPC分类号： G01D18/00 ,  G01B9/00

CPC分类号： G01M11/0257

摘要： The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.

摘要翻译： 本公开涉及通过使用取向泽尔尼克多项式的光学系统的规范，优化和匹配。 在一些实施例中，提供了一种用于评估微光刻投影曝光设备的光学系统的适用性的方法。 该方法可以包括确定光学系统的琼斯光瞳，至少近似地使用扩展到定向泽尔尼克多项式来描述琼斯光瞳，并且基于至少一个取向的膨胀系数来评估光学系统的适用性 Zernike多项式在扩展中。

公开(公告)号：US07408712B2

公开(公告)日：2008-08-05

申请号：US11206886

申请日：2005-08-18

申请人： Johannes Ruoff ,  Bernd Kleemann

发明人： Johannes Ruoff ,  Bernd Kleemann

IPC分类号： G02B5/18

CPC分类号： G03F7/70566 ,  G03F7/70316

摘要： A polarization-selectively blazed, diffractive optical element including multiple contiguous blaze structures extending along a given geometrical path. Each structure has a width perpendicular to direction of extension greater than the Wavelength of the electromagnetic radiation for which the element is designed. Each blaze structure multiple individual substructures arranged next to each other in the direction of extension according to a predetermined period. The substructures providing the blaze effect have the shape, when viewed from above, of a closed geometrical surface whose dimension parallel to the direction of extension varies perpendicular to the direction of extension, but is always smaller than the wavelength of the electromagnetic radiation, and whose maximum dimension perpendicular to the direction of extension is greater than the wavelength of the electromagnetic radiation. The filling ratio of the individual substructures in the direction of extension relative to the period is selected such that, as a function of the position perpendicular to the direction of extension, the blaze effect is optimized for one polarization condition.

摘要翻译： 偏振选择性闪耀的衍射光学元件，包括沿着给定的几何路径延伸的多个连续的火焰结构。 每个结构具有垂直于延伸方向的宽度大于设计元件的电磁辐射的波长。 每个火焰结构根据预定周期在延伸方向上彼此相邻布置的多个单独子结构。 提供火焰效应的子结构具有从上方观察到的与几何平行于延伸方向的尺寸垂直于延伸方向的尺寸变化的封闭几何表面的形状，但总是小于电磁辐射的波长，并且其 垂直于延伸方向的最大尺寸大于电磁辐射的波长。 选择各个子结构相对于周期的延伸方向的填充率，使得作为垂直于延伸方向的位置的函数，针对一个偏振条件优化了火焰效应。

公开(公告)号：US20060039072A1

公开(公告)日：2006-02-23

申请号：US11206886

申请日：2005-08-18

申请人： Johannes Ruoff ,  Bernd Kleemann

发明人： Johannes Ruoff ,  Bernd Kleemann

IPC分类号： G02B5/18

CPC分类号： G03F7/70566 ,  G03F7/70316

摘要： A polarization-selectively blazed, diffractive optical element is provided, comprising a plurality of contiguous blaze structures, which extend along a given geometrical path and each have a width (g1, g2, g3) perpendicular to their direction of extension (R1, R2, R3), said width being greater than the wavelength (X) of the electromagnetic radiation for which the diffractive optical element is designed, and each of said blaze structures comprising a plurality of individual substructures, which are arranged next to each other in the direction of extension (R1, R2, R3) according to a predetermined period (sg), said substructures providing the blaze effect and each having the shape, when viewed from above, of a closed geometrical surface whose dimension parallel to the direction of extension (R1, R2, R3) varies perpendicular to the direction of extension (R1, R2, R3), but is always smaller than the wavelength (X) of the electromagnetic radiation, and whose maximum dimension perpendicular to the direction of extension (R1, R2, R3) is greater than the wavelength (X) of the electromagnetic radiation, wherein the filling ratio (f) of the individual substructures in the direction of extension (R1, R2, R3) relative to the period (sg) is selected such, as a function of the position perpendicular to the direction of extension (R1, R2, R3), that the blaze effect is optimized for one of two mutually orthogonal polarization conditions of the electromagnetic radiation.

摘要翻译： 提供了偏振选择性闪耀的衍射光学元件，其包括多个连续的火焰结构，其沿着给定的几何路径延伸并且各自具有垂直于它们的延伸方向（R）的宽度（g 1，g 2，g 3） 1，R 2，R 3），所述宽度大于设计衍射光学元件的电磁辐射的波长（X），并且每个所述火焰结构包括多个单独的子结构， 在规定的周期（sg）下，沿着延伸方向（R 1，R 2，R 3）彼此相对，所述子结构提供火焰效应，并且每个具有从上方观察时的形状，其封闭几何表面的尺寸 平行于延伸方向（R 1，R 2，R 3）垂直于延伸方向（R 1，R 2，R 3）变化，但总是小于电磁辐射的波长（X）， 最大 垂直于延伸方向（R 1，R 2，R 3）的尺寸大于电磁辐射的波长（X），其中各个子结构在延伸方向上的填充率（f）（R 1， R 2，R 3）相对于周期（sg）被选择为垂直于延伸方向（R 1，R 2，R 3）的位置的函数，对于两个中的一个 相互正交的电磁辐射极化条件。

公开(公告)号：US09041908B2

公开(公告)日：2015-05-26

申请号：US13555785

申请日：2012-07-23

申请人： Johannes Ruoff

发明人： Johannes Ruoff

IPC分类号： G03B27/68 ,  G03B27/32 ,  G03F7/20

CPC分类号： G03F7/70283 ,  G03F7/705 ,  G03F7/70566 ,  G03F7/706

摘要： The disclosure relates to a method for adapting a projection exposure apparatus for microlithography to a mask having structures with different pitches and/or different structure widths in different structure directions. Wavefront aberrations induced by the mask are reduced by a manipulator of the projection exposure apparatus for microlithography.

摘要翻译： 本公开涉及一种用于将用于微光刻的投影曝光装置适配成具有在不同结构方向上具有不同间距和/或不同结构宽度的结构的掩模的方法。 通过用于微光刻的投影曝光装置的操纵器来减小由掩模引起的波前像差。

公开(公告)号：US08681184B2

公开(公告)日：2014-03-25

申请号：US12598755

申请日：2008-03-07

申请人： Markus Seesselberg ,  Johannes Ruoff

发明人： Markus Seesselberg ,  Johannes Ruoff

IPC分类号： G09G1/28 ,  G09G5/00 ,  G09G3/28 ,  H04N9/47 ,  H04N5/225 ,  H04N5/64 ,  G02F1/1335 ,  G02F1/1333 ,  G02F1/13 ,  G03B21/00 ,  G02B5/32 ,  G02B27/02 ,  G02B27/64 ,  G02B27/42 ,  G02B27/30

CPC分类号： G02B27/0172 ,  G02B5/30 ,  G02B6/0038 ,  G02B6/0076 ,  G02B27/0081 ,  G02B27/2264

摘要： A display unit for binocular representation of a multicolor image including a control unit triggering an imaging element such that the imaging element generates in a temporal successive manner the image to be displayed for a first beam path and a second beam path as a first image and second image, respectively. The images are generated in a pre-distorted manner, opposite of the chromatic aberration of the respective beam path, such that the chromatic aberration generated in the respective beam path is compensated when the first and second image is displayed. The display unit includes a switching module which operates in temporal synchrony with the first and second image being generated, such that a user can see the first image only via the first beam path and the second image only via the second beam path.

摘要翻译： 一种用于双色图像的显示单元，包括触发成像元件的控制单元，使得成像元件以时间连续的方式产生要作为第一光束路径和第二光束路径显示的图像作为第一图像和第二图像 图像。 图像以预失真的方式产生，与各个光束路径的色差相反，使得当显示第一和第二图像时补偿在各个光束路径中产生的色像差。 显示单元包括切换模块，其与正在生成的第一和第二图像的时间同步操作，使得用户仅能够经由第一光束路径和第二图像仅经由第二光束路径来看到第一图像。