Method for evaluating sample system anisotropic refractive indices and orientations thereof in multiple dimensions
    2.
    发明授权
    Method for evaluating sample system anisotropic refractive indices and orientations thereof in multiple dimensions 有权
    用于评估多个维度的样品系统各向异性折射率及其取向的方法

    公开(公告)号:US06441902B1

    公开(公告)日:2002-08-27

    申请号:US09474318

    申请日:1999-12-29

    IPC分类号: G01J400

    CPC分类号: G01N21/211

    摘要: Disclosed is a method of evaluating sample system anisotropic refractive indices, and orientations thereof with respect to an alignment surface, in multiple dimensions. The preferred method involves a sequence of steps which allows overcoming mathematical model parameter correlation during mathematical regression parameter evaluation, even though individually, steps of the present invention method wherein anisotropic refractive indices, or differences therebetween, are evaluated, require that only a relatively simple one dimensional data set be acquired.

    摘要翻译: 公开了一种在多个维度上评估样品系统各向异性折射率及其相对于对准表面的取向的方法。 优选的方法包括一系列步骤,其允许在数学回归参数评估期间克服数学模型参数相关性,即使单独地评估其中各向异性折射率或其间的差异的本发明方法的步骤仅需要相对简单的一个 获取二维数据集。

    Sample masking in ellipsometer and the like systems including detection of substrate backside reflections
    3.
    发明授权
    Sample masking in ellipsometer and the like systems including detection of substrate backside reflections 有权
    椭偏仪等样品系统中的样品掩蔽,包括衬底背面反射的检测

    公开(公告)号:US07477388B1

    公开(公告)日:2009-01-13

    申请号:US11439491

    申请日:2006-05-24

    IPC分类号: G01J4/00

    CPC分类号: G01N21/211

    摘要: A system and method of preventing substrate backside reflected components in a beam of electromagnetic radiation caused to reflect from the surface of a sample in an ellipsometer or polarimeter system, involving placing a mask adjacent to the surface of the sample which allows electromagnetic radiation to access the sample over only a limited area, wherein the mask can include detector elements for collecting electromagnetic radiation reflected from the sample backside.

    摘要翻译: 防止在电磁辐射束中的基板背面反射部件在椭圆光度计或偏振计系统中从样品的表面反射的系统和方法,包括将掩模放置在与样品表面相邻的位置,允许电磁辐射进入 仅在有限区域进行采样,其中掩模可以包括用于收集从样品背面反射的电磁辐射的检测器元件。