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    Sample masking in ellipsometer and the like systems including detection of substrate backside reflections
    1.
    发明授权
    Sample masking in ellipsometer and the like systems including detection of substrate backside reflections 有权
    椭偏仪等样品系统中的样品掩蔽，包括衬底背面反射的检测

    公开(公告)号：US07477388B1

    公开(公告)日：2009-01-13

    申请号：US11439491

    申请日：2006-05-24

    申请人： Martin M. Liphardt ,  James D. Welch ,  Corey L. Bungay ,  John A. Woollam

    发明人： Martin M. Liphardt ,  James D. Welch ,  Corey L. Bungay ,  John A. Woollam

    IPC分类号： G01J4/00

    CPC分类号： G01N21/211

    摘要： A system and method of preventing substrate backside reflected components in a beam of electromagnetic radiation caused to reflect from the surface of a sample in an ellipsometer or polarimeter system, involving placing a mask adjacent to the surface of the sample which allows electromagnetic radiation to access the sample over only a limited area, wherein the mask can include detector elements for collecting electromagnetic radiation reflected from the sample backside.

    摘要翻译： 防止在电磁辐射束中的基板背面反射部件在椭圆光度计或偏振计系统中从样品的表面反射的系统和方法，包括将掩模放置在与样品表面相邻的位置，允许电磁辐射进入 仅在有限区域进行采样，其中掩模可以包括用于收集从样品背面反射的电磁辐射的检测器元件。

    Use of ellipsometry and surface plasmon resonance in monitoring thin film deposition or removal from a substrate surface
    9.
    发明授权
    Use of ellipsometry and surface plasmon resonance in monitoring thin film deposition or removal from a substrate surface 有权
    使用椭偏仪和表面等离子体共振来监测薄膜沉积或从基底表面去除

    公开(公告)号：US07283234B1

    公开(公告)日：2007-10-16

    申请号：US11014298

    申请日：2004-12-16

    申请人： John A. Woollam ,  Blaine D. Johs ,  Thomas E. Tiwald ,  Martin M. Liphardt ,  James D. Welch

    发明人： John A. Woollam ,  Blaine D. Johs ,  Thomas E. Tiwald ,  Martin M. Liphardt ,  James D. Welch

    IPC分类号： G01J4/00

    CPC分类号： G01N21/553 ,  G01N21/211 ,  G01N2021/213

    摘要： Improved methodology for monitoring deposition or removal of material to or from a process and/or wittness substrate which demonstrates a negative e1 at some wavelength. The method involves detection of changes in P-polarized electromagnetism ellipsometric DELTA at SPR Resonance Angle-of-Incidence (AOI) to monitor deposition of and/or removal of minute amounts of materials onto, or from, said process and/or witness substrate. The methodology can optionally monitor ellipsometric PSI, and involves simultaneously or sequentially applying non-P-polarized electromagnetism at the same angle of incidence, or electromagnetic radiation of any polarization at a different angle-of-incidence and wavelength to the process or wittness substrate and application of conventional ellipsometric analysis.

    摘要翻译： 改进的方法，用于监测沉积或去除过程和/或维持性底物的材料，其在一些波长处显示出负的e 1。 该方法涉及在SPR共振发光角（AOI）下检测P偏振电磁椭圆偏振ΔTA的变化，以监测微量材料沉积和/或去除所述工艺和/或可见底物上或从其上剥离。 该方法可以可选地监测椭偏测量的PSI，并且涉及以相同的入射角同时或顺序地施加非P偏振电磁体或将不同入射角和波长的任何偏振的电磁辐射施加到工艺或维护衬底，以及 常规椭圆分析的应用。