摘要:
A method of making a polarization insensitive optical waveguide structure. An optical core layer is formed on a substrate, wherein the optical core layer has a higher refractive index than the substrate. A mask is formed over the optical core layer. The unmasked areas of the optical core layer are then over-etched to define the core, wherein the over-etching removes the unmasked area of the optical core layer and a portion of the substrate disposed beneath the unmasked area, and defines the optical core. The mask is subsequently removed from the optical core. A cladding layer is then formed over the optical core and the substrate, the cladding layer having a lower refractive index than the optical core, to form a polarization insensitive optical waveguide structure. The amount of over-etching can be controlled to control an amount of substrate disposed beneath the unmasked area of the optical core layer that is removed. The amount of substrate removed, in turn, controls the polarization sensitivity of the optical waveguide structure. The amount of the portion of the substrate removed during the over-etching can be determined to minimize the polarization dependent wavelength shift and the polarization dependent loss of the optical waveguide structure. The amount of the portion of the substrate removed during the over-etching can be determined in accordance with a blanket stress of the cladding layer. The over-etching can be within a range between 7.5 percent and 30 percent.
摘要:
A product such as an x-ray sensor array includes, for each unit of cell circuitry, a capacitor with upper and lower electrodes. A conductive layer that includes highly conductive metal such as aluminum is patterned to include the upper electrode of the capacitor, the contact leads of a switching element, and the data lines of the array. The upper electrode has an exposed area due to an opening in an insulating layer over it. A conductive element, such as an ITO island, is formed over the insulating layer, contacting the exposed area of the upper electrode so that the conductive element is electrically connected to one of the contact leads of the switching element through the upper electrode. The conductive elements of adjacent units can be separated by the minimum spacing necessary to ensure isolation. Or each unit's conductive element can be offset slightly from the data and scan lines and can also be pulled back from the channel of the switching element, which can be a TFT.
摘要:
A process of producing a product such as an x-ray sensor array performs two etching operations on an insulating layer to expose different parts of a conductive layer. One etch exposes part of the conductive layer in each unit of cell circuitry in the array without exposing the contact pads at the array's periphery. Then, a conductive layer including ITO is deposited over the insulating layer and patterned to form a conductive element for each unit, with the conductive element contacting the exposed part of the conductive layer. Afterward, a second etch exposes contact pads at the periphery of the array. As a result, the contact pads have high quality surfaces, facilitating testing and wire bonding.