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    Array substrate for liquid crystal display device and method of manufacturing the same
    1.
    发明授权
    Array substrate for liquid crystal display device and method of manufacturing the same 有权
    液晶显示装置用阵列基板及其制造方法

    公开(公告)号：US08456601B2

    公开(公告)日：2013-06-04

    申请号：US13193384

    申请日：2011-07-28

    申请人： Joo-Soo Lim ,  Hyo-Uk Kim ,  Hee-Young Kwack ,  Hyun-Seok Hong ,  Byung-Chul Ahn ,  Byoung-Ho Lim

    发明人： Joo-Soo Lim ,  Hyo-Uk Kim ,  Hee-Young Kwack ,  Hyun-Seok Hong ,  Byung-Chul Ahn ,  Byoung-Ho Lim

    IPC分类号： G02F1/134363

    CPC分类号： H01L27/1288 ,  G02F1/134363 ,  G02F2001/136231 ,  H01L27/1214

    摘要： An array substrate for a liquid crystal display device includes a substrate, a gate line on the substrate, a thin film transistor including a gate electrode of the gate line, a gate insulating layer over the gate electrode, an active layer on the gate insulating layer and ohmic contact layers on the active layer, and source and drain electrodes over the ohmic contact layers, a pixel electrode electrically connected to the drain electrode, a data line electrically connected to the source electrode and crossing the gate line, a common electrode spaced apart from the pixel electrode, and a passivation layer directly between the pixel electrode and the common electrode and directly between the source and drain electrodes.

    摘要翻译： 液晶显示装置用阵列基板包括基板，基板上的栅极线，包括栅极线的栅电极的薄膜晶体管，栅极上的栅极绝缘层，栅极绝缘层上的有源层 和有源层上的欧姆接触层，欧姆接触层上的源电极和漏电极，电连接到漏电极的像素电极，与源电极电连接并与栅极线交叉的数据线，间隔开的公共电极 从像素电极和直接在像素电极和公共电极之间直接在源电极和漏电极之间的钝化层。

    Array Substrate for Liquid Crystal Display Device and Method of Manufacturing the Same
    2.
    发明申请
    Array Substrate for Liquid Crystal Display Device and Method of Manufacturing the Same 有权
    液晶显示装置用阵列基板及其制造方法

    公开(公告)号：US20110281386A1

    公开(公告)日：2011-11-17

    申请号：US13193384

    申请日：2011-07-28

    申请人： Joo-Soo Lim ,  Hyo-Uk Kim ,  Hee-Young Kwack ,  Hyun-Seok Hong ,  Byung-Chul Ahn ,  Byoung-Ho Lim

    发明人： Joo-Soo Lim ,  Hyo-Uk Kim ,  Hee-Young Kwack ,  Hyun-Seok Hong ,  Byung-Chul Ahn ,  Byoung-Ho Lim

    IPC分类号： H01L33/08

    CPC分类号： H01L27/1288 ,  G02F1/134363 ,  G02F2001/136231 ,  H01L27/1214

    摘要： An array substrate for a liquid crystal display device includes a substrate, a gate line on the substrate, a thin film transistor including a gate electrode of the gate line, a gate insulating layer over the gate electrode, an active layer on the gate insulating layer and ohmic contact layers on the active layer, and source and drain electrodes over the ohmic contact layers, a pixel electrode electrically connected to the drain electrode, a data line electrically connected to the source electrode and crossing the gate line, a common electrode spaced apart from the pixel electrode, and a passivation layer directly between the pixel electrode and the common electrode and directly between the source and drain electrodes.

    摘要翻译： 液晶显示装置用阵列基板包括基板，基板上的栅极线，包括栅极线的栅电极的薄膜晶体管，栅极上的栅极绝缘层，栅极绝缘层上的有源层 和有源层上的欧姆接触层，欧姆接触层上的源电极和漏电极，电连接到漏电极的像素电极，与源电极电连接并与栅极线交叉的数据线，间隔开的公共电极 从像素电极和直接在像素电极和公共电极之间直接在源电极和漏电极之间的钝化层。

    Array substrate for liquid crystal display device and method of manufacturing the same
    3.
    发明授权
    Array substrate for liquid crystal display device and method of manufacturing the same 有权
    液晶显示装置用阵列基板及其制造方法

    公开(公告)号：US08031312B2

    公开(公告)日：2011-10-04

    申请号：US11806214

    申请日：2007-05-30

    申请人： Joo-Soo Lim ,  Hyo-Uk Kim ,  Hee-Young Kwack ,  Hyun-Seok Hong ,  Byung-Chul Ahn ,  Byoung-Ho Lim

    发明人： Joo-Soo Lim ,  Hyo-Uk Kim ,  Hee-Young Kwack ,  Hyun-Seok Hong ,  Byung-Chul Ahn ,  Byoung-Ho Lim

    IPC分类号： G02F1/1333

    CPC分类号： H01L27/1288 ,  G02F1/134363 ,  G02F2001/136231 ,  H01L27/1214

    摘要： An array substrate for a liquid crystal display device includes a substrate, a gate line on the substrate, a thin film transistor including a gate electrode of the gate line, a gate insulating layer over the gate electrode, an active layer on the gate insulating layer and ohmic contact layers on the active layer, and source and drain electrodes over the ohmic contact layers, a pixel electrode electrically connected to the drain electrode, a data line electrically connected to the source electrode and crossing the gate line, a common electrode spaced apart from the pixel electrode, and a passivation layer directly between the pixel electrode and the common electrode and directly between the source and drain electrodes.

    摘要翻译： 液晶显示装置用阵列基板包括基板，基板上的栅极线，包括栅极线的栅电极的薄膜晶体管，栅极上的栅极绝缘层，栅极绝缘层上的有源层 和有源层上的欧姆接触层，欧姆接触层上的源电极和漏电极，电连接到漏电极的像素电极，与源电极电连接并与栅极线交叉的数据线，间隔开的公共电极 从像素电极和直接在像素电极和公共电极之间直接在源电极和漏电极之间的钝化层。

    Method of lifting off and fabricating array substrate for liquid crystal display device using the same
    8.
    发明申请
    Method of lifting off and fabricating array substrate for liquid crystal display device using the same 有权
    提出并制造使用其的液晶显示装置的阵列基板的方法

    公开(公告)号：US20090021687A1

    公开(公告)日：2009-01-22

    申请号：US12219306

    申请日：2008-07-18

    申请人： Hee-Young Kwack ,  Hyun-Seok Hong ,  Joo-Soo Lim ,  Hong-Sik Kim

    发明人： Hee-Young Kwack ,  Hyun-Seok Hong ,  Joo-Soo Lim ,  Hong-Sik Kim

    IPC分类号： H01L21/28 ,  H01L33/00 ,  G02F1/1333

    CPC分类号： H01L27/1288 ,  G02F1/1368 ,  G02F2001/13625 ,  H01L27/1214 ,  H01L27/124

    摘要： A method of lifting off includes forming a first material layer on a substrate; forming a photoresist pattern including first and second holes and on the first material layer; patterning the first material layer using the photoresist pattern as a patterning mask to form a material pattern having first and second grooves within the material pattern, the first and second grooves corresponding to the first and second holes, respectively; forming a second material layer on an entire surface of the substrate including the photoresist pattern and the first and second grooves; and removing the photoresist pattern and the second material layer on the photoresist pattern at the same time, wherein a portion of the material pattern between the first and second grooves and portions of the material pattern at sides of the first and second grooves constitute a line as a whole.

    摘要翻译： 剥离方法包括在基材上形成第一材料层; 形成包括第一和第二孔的光致抗蚀剂图案，并在第一材料层上形成; 使用光致抗蚀剂图案作为图案掩模来图案化第一材料层，以形成在材料图案内具有第一和第二凹槽的材料图案，第一和第二凹槽分别对应于第一和第二孔; 在包括光致抗蚀剂图案和第一和第二凹槽的基板的整个表面上形成第二材料层; 并且同时去除光致抗蚀剂图案上的光致抗蚀剂图案和第二材料层，其中在第一和第二槽之间的材料图案的一部分和材料图案的部分在第一和第二槽的侧面构成一条直线， 整个。

    METHOD OF LIFTING OFF AND FABRICATING ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME
    9.
    发明申请
    METHOD OF LIFTING OFF AND FABRICATING ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME 有权
    使用该液晶显示装置提升关闭和制造阵列基板的方法

    公开(公告)号：US20110250532A1

    公开(公告)日：2011-10-13

    申请号：US13165466

    申请日：2011-06-21

    申请人： Hee-Young Kwack ,  Hyun-Seok Hong ,  Joo-Soo Lim ,  Hong-Sik Kim

    发明人： Hee-Young Kwack ,  Hyun-Seok Hong ,  Joo-Soo Lim ,  Hong-Sik Kim

    IPC分类号： G03F7/20

    CPC分类号： H01L27/1288 ,  G02F1/1368 ,  G02F2001/13625 ,  H01L27/1214 ,  H01L27/124

    摘要： A method of lifting off includes forming a first material layer on a substrate; forming a photoresist pattern including first and second holes and on the first material layer; patterning the first material layer using the photoresist pattern as a patterning mask to form a material pattern having first and second grooves within the material pattern, the first and second grooves corresponding to the first and second holes, respectively; forming a second material layer on an entire surface of the substrate including the photoresist pattern and the first and second grooves; and removing the photoresist pattern and the second material layer on the photoresist pattern at the same time, wherein a portion of the material pattern between the first and second grooves and portions of the material pattern at sides of the first and second grooves constitute a line as a whole.

    摘要翻译： 剥离方法包括在基材上形成第一材料层; 形成包括第一和第二孔的光致抗蚀剂图案，并在第一材料层上形成; 使用光致抗蚀剂图案作为图案掩模来图案化第一材料层，以形成在材料图案内具有第一和第二凹槽的材料图案，第一和第二凹槽分别对应于第一和第二孔; 在包括光致抗蚀剂图案和第一和第二凹槽的基板的整个表面上形成第二材料层; 并且同时去除光致抗蚀剂图案上的光致抗蚀剂图案和第二材料层，其中在第一和第二槽之间的材料图案的一部分和材料图案的部分在第一和第二槽的侧面构成一条直线， 整个。

    Method of lifting off and fabricating array substrate for liquid crystal display device using the same
    10.
    发明授权
    Method of lifting off and fabricating array substrate for liquid crystal display device using the same 有权
    提出并制造使用其的液晶显示装置的阵列基板的方法

    公开(公告)号：US07988871B2

    公开(公告)日：2011-08-02

    申请号：US12219306

    申请日：2008-07-18

    申请人： Hee-Young Kwack ,  Hyun-Seok Hong ,  Joo-Soo Lim ,  Hong-Sik Kim

    发明人： Hee-Young Kwack ,  Hyun-Seok Hong ,  Joo-Soo Lim ,  Hong-Sik Kim

    IPC分类号： C23F1/00

    CPC分类号： H01L27/1288 ,  G02F1/1368 ,  G02F2001/13625 ,  H01L27/1214 ,  H01L27/124

    摘要： A method of lifting off includes forming a first material layer on a substrate; forming a photoresist pattern including first and second holes and on the first material layer; patterning the first material layer using the photoresist pattern as a patterning mask to form a material pattern having first and second grooves within the material pattern, the first and second grooves corresponding to the first and second holes, respectively; forming a second material layer on an entire surface of the substrate including the photoresist pattern and the first and second grooves; and removing the photoresist pattern and the second material layer on the photoresist pattern at the same time, wherein a portion of the material pattern between the first and second grooves and portions of the material pattern at sides of the first and second grooves constitute a line as a whole.

    摘要翻译： 剥离方法包括在基材上形成第一材料层; 形成包括第一和第二孔的光致抗蚀剂图案，并在第一材料层上形成; 使用光致抗蚀剂图案作为图案掩模来图案化第一材料层，以形成在材料图案内具有第一和第二凹槽的材料图案，第一和第二凹槽分别对应于第一和第二孔; 在包括光致抗蚀剂图案和第一和第二凹槽的基板的整个表面上形成第二材料层; 并且同时去除光致抗蚀剂图案上的光致抗蚀剂图案和第二材料层，其中在第一和第二槽之间的材料图案的一部分和材料图案的部分在第一和第二槽的侧面构成一条直线， 整个。