公开(公告)号：US20110147983A1

公开(公告)日：2011-06-23

申请号：US12641959

申请日：2009-12-18

申请人： Joy CHENG ,  William D. HINSBERG ,  Hiroshi ITO ,  Atsuko Ito ,  Ho-Cheol KIM ,  Young-Hye NA ,  Daniel P. SANDERS ,  Linda Karin SUNDBERG ,  Hoa D. TRUONG ,  Gregory Michael WALLRAFF

发明人： Joy CHENG ,  William D. HINSBERG ,  Hiroshi ITO ,  Atsuko Ito ,  Ho-Cheol KIM ,  Young-Hye NA ,  Daniel P. SANDERS ,  Linda Karin SUNDBERG ,  Hoa D. TRUONG ,  Gregory Michael WALLRAFF

IPC分类号： B28B1/14

CPC分类号： B82Y40/00 ,  B81C1/00031 ,  B81C2201/0149 ,  G03F7/0392 ,  G03F7/09 ,  G03F7/091 ,  G03F7/165 ,  G03F7/325 ,  G03F7/327 ,  G03F7/40

摘要： A method of forming a layered structure comprising a domain pattern of a self-assembled material comprises: disposing on a substrate a photoresist layer comprising a non-crosslinking photoresist; optionally baking the photoresist layer; pattern-wise exposing the photoresist layer to first radiation; optionally baking the exposed photoresist layer; and developing the exposed photoresist layer with a non-alkaline developer to form a negative-tone patterned photoresist layer comprising non-crosslinked developed photoresist; wherein the developed photoresist is not soluble in a given organic solvent suitable for casting a given material capable of self-assembly, and the developed photoresist is soluble in an aqueous alkaline developer and/or a second organic solvent. A solution comprising the given material capable of self-assembly dissolved in the given organic solvent is casted on the patterned photoresist layer, and the given organic solvent is removed. The casted given material is allowed to self-assemble while optionally heating and/or annealing the casted given material, thereby forming the layered structure comprising the domain pattern of the self-assembled given material.

摘要翻译： 形成包括自组装材料的畴图案的层状结构的方法包括：在基底上设置包含非交联光致抗蚀剂的光致抗蚀剂层; 任选地烘烤光致抗蚀剂层; 将光致抗蚀剂层图案化地暴露于第一辐射; 任选地烘烤曝光的光致抗蚀剂层; 以及用非碱性显影剂显影曝光的光致抗蚀剂层以形成包含非交联显影光致抗蚀剂的负色图案光刻胶层; 其中显影的光致抗蚀剂不溶于适于铸造能够自组装的给定材料的给定有机溶剂中，并且显影的光致抗蚀剂可溶于碱性显影液和/或第二有机溶剂。 将包含溶解在给定有机溶剂中的能够自组装的给定材料的溶液浇铸在图案化的光致抗蚀剂层上，并且除去给定的有机溶剂。 铸造的给定材料允许自组装，同时任选地加热和/或退火铸造的给定材料，从而形成包括自组装给定材料的畴图案的分层结构。

公开(公告)号：US20110147984A1

公开(公告)日：2011-06-23

申请号：US12642018

申请日：2009-12-18

申请人： Joy CHENG ,  Matthew E. COLBURN ,  Stefan HARRER ,  William D. HINSBERG ,  Steven J. HOLMES ,  Ho-Cheol KIM ,  Daniel Paul SANDERS

发明人： Joy CHENG ,  Matthew E. COLBURN ,  Stefan HARRER ,  William D. HINSBERG ,  Steven J. HOLMES ,  Ho-Cheol KIM ,  Daniel Paul SANDERS

IPC分类号： B29C39/00 ,  G03F7/20

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A method of forming a layered structure comprising a self-assembled material comprises: disposing a non-crosslinking photoresist layer on a substrate; pattern-wise exposing the photoresist layer to first radiation; optionally heating the exposed photoresist layer; developing the exposed photoresist layer in a first development process with an aqueous alkaline developer, forming an initial patterned photoresist layer; treating the initial patterned photoresist layer photochemically, thermally and/or chemically, thereby forming a treated patterned photoresist layer comprising non-crosslinked treated photoresist disposed on a first substrate surface; casting a solution of an orientation control material in a first solvent on the treated patterned photoresist layer, and removing the first solvent, forming an orientation control layer; heating the orientation control layer to effectively bind a portion of the orientation control material to a second substrate surface; removing at least a portion of the treated photoresist and, optionally, any non-bound orientation control material in a second development process, thereby forming a pre-pattern for self-assembly; optionally heating the pre-pattern; casting a solution of a material capable of self-assembly dissolved in a second solvent on the pre-pattern and removing the second solvent; and allowing the casted material to self-assemble with optional heating and/or annealing, thereby forming the layered structure comprising the self-assembled material.

摘要翻译： 形成包括自组装材料的层状结构的方法包括：在基底上设置非交联光致抗蚀剂层; 将光致抗蚀剂层图案化地暴露于第一辐射; 可选地加热曝光的光致抗蚀剂层; 在第一显影工艺中用含水碱性显影剂显影曝光的光致抗蚀剂层，形成初始图案化的光致抗蚀剂层; 以光学，光学和/或化学方式处理初始图案化的光致抗蚀剂层，从而形成经处理的图案化的光刻胶层，其包含设置在第一衬底表面上的非交联处理的光致抗蚀剂; 在经处理​​的图案化光刻胶层上浇铸取向控制材料在第一溶剂中的溶液，并除去第一溶剂，形成取向控制层; 加热所述取向控制层以有效地将所述取向控制材料的一部分结合到第二基板表面; 在第二显影过程中除去至少一部分经处理的光致抗蚀剂和任选的任何未结合的取向控制材料，从而形成用于自组装的预图案; 可选地加热预图案; 将能够自组装的溶解在第二溶剂中的材料的溶液浇铸在预图案上并除去第二溶剂; 并且允许铸造材料通过任选的加热和/或退火自组装，从而形成包括自组装材料的层状结构。

公开(公告)号：US20110147985A1

公开(公告)日：2011-06-23

申请号：US12641987

申请日：2009-12-18

申请人： Joy CHENG ,  William D. HINSBERG ,  Charles Thomas RETTNER ,  Daniel P. Sanders

发明人： Joy CHENG ,  William D. HINSBERG ,  Charles Thomas RETTNER ,  Daniel P. Sanders

IPC分类号： B29C33/42

CPC分类号： G03F7/0392 ,  G03F7/091 ,  G03F7/165 ,  G03F7/2041 ,  G03F7/40

摘要： Methods are disclosed for forming a layered structure comprising a self-assembled material. A method comprises disposing a photoresist layer comprising a non-crosslinking, positive-tone photoresist on a surface of a substrate; optionally baking the photoresist layer; pattern-wise exposing the photoresist layer to first radiation; optionally baking the exposed photoresist layer; developing the exposed photoresist layer with an aqueous alkaline developer to form an initial patterned photoresist layer. The initial patterned photoresist layer is treated photochemically, thermally, and/or chemically to form a treated patterned photoresist layer comprising non-crosslinked treated photoresist, wherein the treated photoresist is insoluble in a given organic solvent suitable for casting a given material capable of self-assembly, and the treated photoresist is soluble in the aqueous alkaline developer and/or a second organic solvent. A solution comprising the given material capable of self-assembly dissolved in the given organic solvent is casted on the treated patterned photoresist layer, and the given organic solvent is removed. The casted given material is allowed to self-assemble while optionally heating and/or annealing the casted material, thereby forming the layered structure comprising the self-assembled material.

摘要翻译： 公开了用于形成包括自组装材料的层状结构的方法。 一种方法包括在衬底的表面上设置包含非交联正色光刻胶的光致抗蚀剂层; 任选地烘烤光致抗蚀剂层; 将光致抗蚀剂层图案化地暴露于第一辐射; 任选地烘烤曝光的光致抗蚀剂层; 用含水碱性显影剂显影曝光的光致抗蚀剂层以形成初始图案化的光致抗蚀剂层。 光化学，热和/或化学处理初始图案化的光致抗蚀剂层以形成包含非交联处理的光致抗蚀剂的经处理的图案化光刻胶层，其中经处理的光致抗蚀剂不溶于给定的有机溶剂中， 并且经处理的光致抗蚀剂可溶于含水碱性显影剂和/或第二有机溶剂中。 将包含溶解在给定有机溶剂中的能够自组装的给定材料的溶液浇铸在经处理的图案化光致抗蚀剂层上，并且除去给定的有机溶剂。 铸造的给定材料允许自组装，同时任选地加热和/或退火铸造材料，从而形成包括自组装材料的层状结构。