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1.发明申请METHOD OF USE OF EPOXY-CONTAINING CYCLOALIPHATIC ACRYLIC POLYMERS AS ORIENTATION CONTROL LAYERS FOR BLOCK COPOLYMER THIN FILMS 有权使用环氧基丙烯酸聚合物作为块状共聚物薄膜的方向控制层的方法公开(公告)号：US20090179001A1
公开(公告)日：2009-07-16
申请号：US12013444
申请日：2008-01-12
申请人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
发明人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
CPC分类号： B05D5/00 , B05D7/14 , B05D7/52 , C08L53/00 , C09D125/14 , C09D153/00
摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.
摘要翻译： 本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联 取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。 取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。 在另外的实施方案中，公开了双层和三层成像方案。
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2.发明授权Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films 有权使用含环氧基的脂环族丙烯酸聚合物作为嵌段共聚物薄膜的取向控制层的方法公开(公告)号：US07521090B1
公开(公告)日：2009-04-21
申请号：US12060500
申请日：2008-04-01
申请人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
发明人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
IPC分类号： B05D5/00
CPC分类号： B05D5/00 , B05D7/14 , B05D7/52 , C08L53/00 , C09D125/14 , C09D153/00
摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.
摘要翻译： 本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联 取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。 取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。 在另外的实施方案中，公开了双层和三层成像方案。
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3.发明授权Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films 有权使用含环氧基的脂环族丙烯酸聚合物作为嵌段共聚物薄膜的取向控制层的方法公开(公告)号：US07989026B2
公开(公告)日：2011-08-02
申请号：US12013444
申请日：2008-01-12
申请人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
发明人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
IPC分类号： B05D5/00
CPC分类号： B05D5/00 , B05D7/14 , B05D7/52 , C08L53/00 , C09D125/14 , C09D153/00
摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.
摘要翻译： 本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联 取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。 取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。 在另外的实施方案中，公开了双层和三层成像方案。
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4.发明申请公开(公告)号：US20120135146A1
公开(公告)日：2012-05-31
申请号：US12957008
申请日：2010-11-30
IPC分类号： B05D3/12
CPC分类号： B81C1/00031 , B81C2201/0149 , H01L21/0337 , H01L21/0338
摘要： Methods are disclosed for forming topographical features. In one method, a pre-patterned structure is provided which comprises i) a support member having a surface and ii) an element for topographically guiding segregation of a polymer mixture including a first polymer and a second polymer, the element comprising a feature having a sidewall adjoined to the surface. The polymer mixture is disposed on the pre-patterned structure, wherein the disposed polymer mixture has contact with the sidewall and the surface. The first polymer and the second polymer are segregated in a plane parallel to the surface, thereby forming a segregated structure comprising a first polymer domain and a second polymer domain. The first polymer domain and/or the second polymer domain are lithographically patterned, thereby forming topographical features comprising at least one of i) a first feature comprising a lithographically patterned first polymer domain and ii) a second feature comprising a lithographically patterned second polymer domain.
摘要翻译： 公开了形成形貌特征的方法。 在一种方法中，提供预先图案化的结构，其包括i）具有表面的支撑构件和ii）用于拓扑地引导包括第一聚合物和第二聚合物的聚合物混合物的偏析的元件，所述元件包括具有 侧壁与表面相邻。 聚合物混合物设置在预图案化结构上，其中所设置的聚合物混合物与侧壁和表面接触。 第一聚合物和第二聚合物在平行于表面的平面中分离，从而形成包含第一聚合物结构域和第二聚合物结构域的分离结构。 第一聚合物结构域和/或第二聚合物结构域被光刻图案化，从而形成包括以下至少一个的拓扑特征：i）包含光刻图案化的第一聚合物结构域的第一特征和ii）包含光刻图案化的第二聚合物结构域的第二特征。
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5.发明授权Method of forming polymer features by directed self-assembly of block copolymers 有权通过嵌段共聚物的定向自组装形成聚合物特征的方法公开(公告)号：US07521094B1
公开(公告)日：2009-04-21
申请号：US12013957
申请日：2008-01-14
IPC分类号： B05D3/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Disclosed herein is a method of forming polymer structures comprising applying a solution of a diblock copolymer assembly comprising at least one diblock copolymer that forms lamellae, to a neutral surface of a substrate having a chemical pattern thereon, the chemical pattern comprising alternating pinning and neutral regions that are chemically distinct and which have a chemical pattern spatial frequency given by the number of paired sets of pinning and neutral regions along a given direction on the substrate; and forming domains comprising blocks of the diblock copolymer. The domains form by lateral segregation of the blocks. At least one domain has an affinity for the pinning regions and forms on the pinning region, the domains so formed on the pinning region are aligned with the underlying chemical pattern, and domains that do not form on the pinning region form adjacent to and are aligned with the domains formed on the pinning regions. In this way, a structure comprising repeating sets of domains is formed on the chemical pattern with a spatial frequency given by the number of repeating sets of domains in the given direction, that is at least twice that of the chemical pattern spatial frequency. Methods of forming the chemical patterns, and pattern transfer methods using patterned domains, are also disclosed.
摘要翻译： 本文公开了形成聚合物结构的方法，包括将包含至少一种形成薄片的二嵌段共聚物的二嵌段共聚物组合物的溶液施加到其上具有化学图案的基材的中性表面上，所述化学图案包括交替的钉扎和中性区域 其在化学上是不同的，并且具有由沿着衬底上的给定方向的成套组的钉扎和中性区域的数量给出的化学图案空间频率; 以及形成包含二嵌段共聚物嵌段的畴。 这些区域由块的横向偏析形成。 至少一个结构域对钉扎区域的钉扎区域和形成具有亲和性，因此形成在钉扎区域上的区域与下面的化学图案对准，并且不在钉扎区域上形成的区域形成为邻近并对齐 其中所述域形成在钉扎区域上。 以这种方式，在化学图案上形成包括重复的畴集合的结构，其空间频率由给定方向上的重复域集合的数量给出，即至少是化学图案空间频率的两倍。 还公开了形成化学图案的方法和使用图案域的图案转印方法。
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6.发明申请METHOD OF FORMING POLYMER FEATURES BY DIRECTED SELF-ASSEMBLY OF BLOCK COPOLYMERS 有权通过方向自组装块状共聚物形成聚合物特征的方法公开(公告)号：US20090179002A1
公开(公告)日：2009-07-16
申请号：US12061693
申请日：2008-04-03
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Disclosed are methods of forming polymer structures comprising: applying a solution of a block copolymer assembly comprising at least one block copolymer to a neutral substrate having a chemical pattern thereon, the chemical pattern comprising alternating pinning and neutral regions that are chemically distinct and have a first spatial frequency given by the number of paired sets of pinning and neutral regions along a given direction on the substrate; and forming domains of the block copolymer that form by lateral segregation of the blocks in accordance with the underlying chemical pattern, wherein at least one domain of the block copolymer assembly has an affinity for the pinning regions, wherein a structure extending across the chemical pattern is produced, the structure having a uniform second spatial frequency given by the number of repeating sets of domains along the given direction that is at least twice that of the first spatial frequency.
摘要翻译： 公开了形成聚合物结构的方法，包括：将包含至少一种嵌段共聚物的嵌段共聚物组合物溶液施加到其上具有化学图案的中性衬底上，所述化学图案包括化学上不同的交替的钉扎和中性区域，并且具有第一 空间频率由衬底上沿着给定方向的成套组钉扎和中性区域的数量给出; 以及通过根据下面的化学图案横向分离块而形成嵌段共聚物的结构域，其中嵌段共聚物组合物的至少一个结构域对于钉扎区域具有亲和力，其中横跨化学图案延伸的结构是 所述结构具有由给定方向上的至少是第一空间频率的两倍的畴的重复集合的数量给出的统一的第二空间频率。
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7.发明授权Method of forming polymer features by directed self-assembly of block copolymers 有权通过嵌段共聚物的定向自组装形成聚合物特征的方法公开(公告)号：US08226838B2
公开(公告)日：2012-07-24
申请号：US12061693
申请日：2008-04-03
IPC分类号： C03C15/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Disclosed are methods of forming polymer structures comprising: applying a solution of a block copolymer assembly comprising at least one block copolymer to a neutral substrate having a chemical pattern thereon, the chemical pattern comprising alternating pinning and neutral regions that are chemically distinct and have a first spatial frequency given by the number of paired sets of pinning and neutral regions along a given direction on the substrate; and forming domains of the block copolymer that form by lateral segregation of the blocks in accordance with the underlying chemical pattern, wherein at least one domain of the block copolymer assembly has an affinity for the pinning regions, wherein a structure extending across the chemical pattern is produced, the structure having a uniform second spatial frequency given by the number of repeating sets of domains along the given direction that is at least twice that of the first spatial frequency.
摘要翻译： 公开了形成聚合物结构的方法，包括：将包含至少一种嵌段共聚物的嵌段共聚物组合物溶液施加到其上具有化学图案的中性衬底上，所述化学图案包括化学上不同的交替的钉扎和中性区域，并且具有第一 空间频率由衬底上沿着给定方向的成套组钉扎和中性区域的数量给出; 以及通过根据下面的化学图案横向分离块而形成嵌段共聚物的结构域，其中嵌段共聚物组合物的至少一个结构域对于钉扎区域具有亲和力，其中横跨化学图案延伸的结构是 所述结构具有由给定方向上的至少是第一空间频率的两倍的畴的重复集合的数量给出的统一的第二空间频率。
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8.发明申请Method of Forming Self-Assembled Patterns Using Block Copolymers, and Articles Thereof 有权使用嵌段共聚物形成自组装图案的方法及其制品公开(公告)号：US20110059299A1
公开(公告)日：2011-03-10
申请号：US12554175
申请日：2009-09-04
申请人： Ho-Cheol Kim , Sang-min Park , Charles T. Rettner
发明人： Ho-Cheol Kim , Sang-min Park , Charles T. Rettner
CPC分类号： H01L29/0657 , B81C1/00031 , B81C2201/0149 , G03F7/0002 , Y10T428/24479 , Y10T428/24521 , Y10T428/2457 , Y10T428/24612 , Y10T428/24802
摘要： A method of forming a block copolymer pattern comprises providing a substrate comprising a topographic pre-pattern comprising a ridge surface separated by a height, h, greater than 0 nanometers from a trench surface; disposing a block copolymer comprising two or more block components on the topographic pre-pattern to form a layer having a thickness of more than 0 nanometers over the ridge surface and the trench surface; and annealing the layer to form a block copolymer pattern having a periodicity of the topographic pre-pattern, the block copolymer pattern comprising microdomains of self-assembled block copolymer disposed on the ridge surface and the trench surface, wherein the microdomains disposed on the ridge surface have a different orientation compared to the microdomains disposed on the trench surface.
摘要翻译： 形成嵌段共聚物图案的方法包括提供包括地形预图案的基材，所述地貌预图案包括从沟槽表面分开高度h，大于0纳米的脊表面; 在所述地形预图案上设置包含两个或更多个嵌段组分的嵌段共聚物，以在所述脊表面和所述沟槽表面上形成厚度大于0纳米的层; 并退火所述层以形成具有所述地形预图案的周期性的嵌段共聚物图案，所述嵌段共聚物图案包括设置在所述脊表面上的自组装嵌段共聚物的微区域和所述沟槽表面，其中所述微区域设置在所述脊表面上 与设置在沟槽表面上的微区域相比具有不同的取向。
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公开(公告)号：US07560141B1
公开(公告)日：2009-07-14
申请号：US12268562
申请日：2008-11-11
申请人： Ho-Cheol Kim , Charles T. Rettner , Sang-Min Park
发明人： Ho-Cheol Kim , Charles T. Rettner , Sang-Min Park
IPC分类号： B05D3/02
CPC分类号： B05D3/02 , B33Y80/00 , B81C1/00031 , B81C2201/0149 , B82Y30/00 , H01L21/0337
摘要： A method of controlling both alignment and registration (lateral position) of lamellae formed from self-assembly of block copolymers, the method comprising the steps of obtaining a substrate having an energetically neutral surface layer comprising a first topographic “phase pinning” pattern and a second topographic “guiding” pattern; obtaining a self-assembling di-block copolymer; coating the self-assembling di-block copolymer on the energetically neutral surface to obtain a coated substrate; and annealing the coated substrate to obtain micro-domains of the di-block copolymer.
摘要翻译： 一种控制由嵌段共聚物的自组装形成的薄片的对准和配准（横向位置）的方法，所述方法包括以下步骤：获得具有能量中性的表面层的基材，该基材包含第一形貌“相位钉扎”图案和第二 地形“导向”模式; 得到自组装二嵌段共聚物; 在能量中性表面上涂布自组装二嵌段共聚物以获得涂布的基材; 并对涂覆的基材进行退火以获得二嵌段共聚物的微畴。
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10.发明授权Method of forming self-assembled patterns using block copolymers, and articles thereof 有权使用嵌段共聚物形成自组装图案的方法及其制品公开(公告)号：US08349203B2
公开(公告)日：2013-01-08
申请号：US12554175
申请日：2009-09-04
申请人： Ho-Cheol Kim , Sang-min Park , Charles T. Rettner
发明人： Ho-Cheol Kim , Sang-min Park , Charles T. Rettner
IPC分类号： C03C15/00
CPC分类号： H01L29/0657 , B81C1/00031 , B81C2201/0149 , G03F7/0002 , Y10T428/24479 , Y10T428/24521 , Y10T428/2457 , Y10T428/24612 , Y10T428/24802
摘要： A method of forming a block copolymer pattern comprises providing a substrate comprising a topographic pre-pattern comprising a ridge surface separated by a height, h, greater than 0 nanometers from a trench surface; disposing a block copolymer comprising two or more block components on the topographic pre-pattern to form a layer having a thickness of more than 0 nanometers over the ridge surface and the trench surface; and annealing the layer to form a block copolymer pattern having a periodicity of the topographic pre-pattern, the block copolymer pattern comprising microdomains of self-assembled block copolymer disposed on the ridge surface and the trench surface, wherein the microdomains disposed on the ridge surface have a different orientation compared to the microdomains disposed on the trench surface.
摘要翻译： 形成嵌段共聚物图案的方法包括提供包括地形预图案的基材，所述地貌预图案包括从沟槽表面分开高度h，大于0纳米的脊表面; 在所述地形预图案上设置包含两个或更多个嵌段组分的嵌段共聚物，以在所述脊表面和所述沟槽表面上形成厚度大于0纳米的层; 并退火所述层以形成具有所述地形预图案的周期性的嵌段共聚物图案，所述嵌段共聚物图案包括设置在所述脊表面上的自组装嵌段共聚物的微区域和所述沟槽表面，其中所述微区域设置在所述脊表面上 与设置在沟槽表面上的微区域相比具有不同的取向。
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