公开(公告)号：US08349203B2

公开(公告)日：2013-01-08

申请号：US12554175

申请日：2009-09-04

申请人： Ho-Cheol Kim ,  Sang-min Park ,  Charles T. Rettner

发明人： Ho-Cheol Kim ,  Sang-min Park ,  Charles T. Rettner

IPC分类号： C03C15/00

CPC分类号： H01L29/0657 ,  B81C1/00031 ,  B81C2201/0149 ,  G03F7/0002 ,  Y10T428/24479 ,  Y10T428/24521 ,  Y10T428/2457 ,  Y10T428/24612 ,  Y10T428/24802

摘要： A method of forming a block copolymer pattern comprises providing a substrate comprising a topographic pre-pattern comprising a ridge surface separated by a height, h, greater than 0 nanometers from a trench surface; disposing a block copolymer comprising two or more block components on the topographic pre-pattern to form a layer having a thickness of more than 0 nanometers over the ridge surface and the trench surface; and annealing the layer to form a block copolymer pattern having a periodicity of the topographic pre-pattern, the block copolymer pattern comprising microdomains of self-assembled block copolymer disposed on the ridge surface and the trench surface, wherein the microdomains disposed on the ridge surface have a different orientation compared to the microdomains disposed on the trench surface.

摘要翻译： 形成嵌段共聚物图案的方法包括提供包括地形预图案的基材，所述地貌预图案包括从沟槽表面分开高度h，大于0纳米的脊表面; 在所述地形预图案上设置包含两个或更多个嵌段组分的嵌段共聚物，以在所述脊表面和所述沟槽表面上形成厚度大于0纳米的层; 并退火所述层以形成具有所述地形预图案的周期性的嵌段共聚物图案，所述嵌段共聚物图案包括设置在所述脊表面上的自组装嵌段共聚物的微区域和所述沟槽表面，其中所述微区域设置在所述脊表面上 与设置在沟槽表面上的微区域相比具有不同的取向。

公开(公告)号：US07846502B2

公开(公告)日：2010-12-07

申请号：US12482583

申请日：2009-06-11

申请人： Ho-Cheol Kim ,  Charles T Rettner ,  Sang-Min Park

发明人： Ho-Cheol Kim ,  Charles T Rettner ,  Sang-Min Park

IPC分类号： B05D3/00

CPC分类号： B05D3/02 ,  B33Y80/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  H01L21/0337

摘要： A method of controlling both alignment and registration (lateral position) of lamellae formed from self-assembly of block copolymers, the method comprising the steps of obtaining a substrate having an energetically neutral surface layer comprising a first topographic “phase pinning” pattern and a second topographic “guiding” pattern; obtaining a self-assembling di-block copolymer; coating the self-assembling di-block copolymer on the energetically neutral surface to obtain a coated substrate; and annealing the coated substrate to obtain micro-domains of the di-block copolymer.

摘要翻译： 一种控制由嵌段共聚物的自组装形成的薄片的对准和配准（横向位置）的方法，所述方法包括以下步骤：获得具有能量中性的表面层的基材，该基材包括第一形貌“相位钉扎”图案和第二 地形“导向”模式; 得到自组装二嵌段共聚物; 在能量中性表面上涂布自组装二嵌段共聚物以获得涂布的基材; 并对涂覆的基材进行退火以获得二嵌段共聚物的微畴。

公开(公告)号：US07560141B1

公开(公告)日：2009-07-14

申请号：US12268562

申请日：2008-11-11

申请人： Ho-Cheol Kim ,  Charles T. Rettner ,  Sang-Min Park

发明人： Ho-Cheol Kim ,  Charles T. Rettner ,  Sang-Min Park

IPC分类号： B05D3/02

CPC分类号： B05D3/02 ,  B33Y80/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  H01L21/0337

摘要： A method of controlling both alignment and registration (lateral position) of lamellae formed from self-assembly of block copolymers, the method comprising the steps of obtaining a substrate having an energetically neutral surface layer comprising a first topographic “phase pinning” pattern and a second topographic “guiding” pattern; obtaining a self-assembling di-block copolymer; coating the self-assembling di-block copolymer on the energetically neutral surface to obtain a coated substrate; and annealing the coated substrate to obtain micro-domains of the di-block copolymer.

摘要翻译： 一种控制由嵌段共聚物的自组装形成的薄片的对准和配准（横向位置）的方法，所述方法包括以下步骤：获得具有能量中性的表面层的基材，该基材包含第一形貌“相位钉扎”图案和第二 地形“导向”模式; 得到自组装二嵌段共聚物; 在能量中性表面上涂布自组装二嵌段共聚物以获得涂布的基材; 并对涂覆的基材进行退火以获得二嵌段共聚物的微畴。

公开(公告)号：US20100120252A1

公开(公告)日：2010-05-13

申请号：US12482583

申请日：2009-06-11

申请人： Ho-Cheol Kim ,  Charles T. Rettner ,  Sang-Min Park

发明人： Ho-Cheol Kim ,  Charles T. Rettner ,  Sang-Min Park

IPC分类号： H01L21/465

CPC分类号： B05D3/02 ,  B33Y80/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  H01L21/0337

摘要： A method of controlling both alignment and registration (lateral position) of lamellae formed from self-assembly of block copolymers, the method comprising the steps of obtaining a substrate having an energetically neutral surface layer comprising a first topographic “phase pinning” pattern and a second topographic “guiding” pattern; obtaining a self-assembling di-block copolymer; coating the self-assembling di-block copolymer on the energetically neutral surface to obtain a coated substrate; and annealing the coated substrate to obtain micro-domains of the di-block copolymer.

摘要翻译： 一种控制由嵌段共聚物的自组装形成的薄片的对准和配准（横向位置）的方法，所述方法包括以下步骤：获得具有能量中性的表面层的基材，该基材包括第一形貌“相位钉扎”图案和第二 地形“导向”模式; 得到自组装二嵌段共聚物; 在能量中性表面上涂布自组装二嵌段共聚物以获得涂布的基材; 并对涂覆的基材进行退火以获得二嵌段共聚物的微畴。

公开(公告)号：US20110059299A1

公开(公告)日：2011-03-10

申请号：US12554175

申请日：2009-09-04

申请人： Ho-Cheol Kim ,  Sang-min Park ,  Charles T. Rettner

发明人： Ho-Cheol Kim ,  Sang-min Park ,  Charles T. Rettner

IPC分类号： B32B3/00 ,  B05D3/02 ,  B44C1/22

CPC分类号： H01L29/0657 ,  B81C1/00031 ,  B81C2201/0149 ,  G03F7/0002 ,  Y10T428/24479 ,  Y10T428/24521 ,  Y10T428/2457 ,  Y10T428/24612 ,  Y10T428/24802

摘要： A method of forming a block copolymer pattern comprises providing a substrate comprising a topographic pre-pattern comprising a ridge surface separated by a height, h, greater than 0 nanometers from a trench surface; disposing a block copolymer comprising two or more block components on the topographic pre-pattern to form a layer having a thickness of more than 0 nanometers over the ridge surface and the trench surface; and annealing the layer to form a block copolymer pattern having a periodicity of the topographic pre-pattern, the block copolymer pattern comprising microdomains of self-assembled block copolymer disposed on the ridge surface and the trench surface, wherein the microdomains disposed on the ridge surface have a different orientation compared to the microdomains disposed on the trench surface.

摘要翻译： 形成嵌段共聚物图案的方法包括提供包括地形预图案的基材，所述地貌预图案包括从沟槽表面分开高度h，大于0纳米的脊表面; 在所述地形预图案上设置包含两个或更多个嵌段组分的嵌段共聚物，以在所述脊表面和所述沟槽表面上形成厚度大于0纳米的层; 并退火所述层以形成具有所述地形预图案的周期性的嵌段共聚物图案，所述嵌段共聚物图案包括设置在所述脊表面上的自组装嵌段共聚物的微区域和所述沟槽表面，其中所述微区域设置在所述脊表面上 与设置在沟槽表面上的微区域相比具有不同的取向。

公开(公告)号：US07521090B1

公开(公告)日：2009-04-21

申请号：US12060500

申请日：2008-04-01

申请人： Joy Cheng ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Linda Sundberg

发明人： Joy Cheng ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Linda Sundberg

IPC分类号： B05D5/00

CPC分类号： B05D5/00 ,  B05D7/14 ,  B05D7/52 ,  C08L53/00 ,  C09D125/14 ,  C09D153/00

摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.

摘要翻译： 本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联 取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。 取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。 在另外的实施方案中，公开了双层和三层成像方案。

公开(公告)号：US08226838B2

公开(公告)日：2012-07-24

申请号：US12061693

申请日：2008-04-03

申请人： Joy Cheng ,  William D. Hinsberg ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders

发明人： Joy Cheng ,  William D. Hinsberg ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders

IPC分类号： C03C15/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： Disclosed are methods of forming polymer structures comprising: applying a solution of a block copolymer assembly comprising at least one block copolymer to a neutral substrate having a chemical pattern thereon, the chemical pattern comprising alternating pinning and neutral regions that are chemically distinct and have a first spatial frequency given by the number of paired sets of pinning and neutral regions along a given direction on the substrate; and forming domains of the block copolymer that form by lateral segregation of the blocks in accordance with the underlying chemical pattern, wherein at least one domain of the block copolymer assembly has an affinity for the pinning regions, wherein a structure extending across the chemical pattern is produced, the structure having a uniform second spatial frequency given by the number of repeating sets of domains along the given direction that is at least twice that of the first spatial frequency.

摘要翻译： 公开了形成聚合物结构的方法，包括：将包含至少一种嵌段共聚物的嵌段共聚物组合物溶液施加到其上具有化学图案的中性衬底上，所述化学图案包括化学上不同的交替的钉扎和中性区域，并且具有第一 空间频率由衬底上沿着给定方向的成套组钉扎和中性区域的数量给出; 以及通过根据下面的化学图案横向分离块而形成嵌段共聚物的结构域，其中嵌段共聚物组合物的至少一个结构域对于钉扎区域具有亲和力，其中横跨化学图案延伸的结构是 所述结构具有由给定方向上的至少是第一空间频率的两倍的畴的重复集合的数量给出的统一的第二空间频率。

公开(公告)号：US07989026B2

公开(公告)日：2011-08-02

申请号：US12013444

申请日：2008-01-12

申请人： Joy Cheng ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Linda Sundberg

发明人： Joy Cheng ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Linda Sundberg

IPC分类号： B05D5/00

CPC分类号： B05D5/00 ,  B05D7/14 ,  B05D7/52 ,  C08L53/00 ,  C09D125/14 ,  C09D153/00

摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.

摘要翻译： 本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联 取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。 取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。 在另外的实施方案中，公开了双层和三层成像方案。

公开(公告)号：US20090179002A1

公开(公告)日：2009-07-16

申请号：US12061693

申请日：2008-04-03

申请人： Joy Cheng ,  William D. Hinsberg ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders

发明人： Joy Cheng ,  William D. Hinsberg ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders

IPC分类号： B05D5/00 ,  C23F1/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： Disclosed are methods of forming polymer structures comprising: applying a solution of a block copolymer assembly comprising at least one block copolymer to a neutral substrate having a chemical pattern thereon, the chemical pattern comprising alternating pinning and neutral regions that are chemically distinct and have a first spatial frequency given by the number of paired sets of pinning and neutral regions along a given direction on the substrate; and forming domains of the block copolymer that form by lateral segregation of the blocks in accordance with the underlying chemical pattern, wherein at least one domain of the block copolymer assembly has an affinity for the pinning regions, wherein a structure extending across the chemical pattern is produced, the structure having a uniform second spatial frequency given by the number of repeating sets of domains along the given direction that is at least twice that of the first spatial frequency.

摘要翻译： 公开了形成聚合物结构的方法，包括：将包含至少一种嵌段共聚物的嵌段共聚物组合物溶液施加到其上具有化学图案的中性衬底上，所述化学图案包括化学上不同的交替的钉扎和中性区域，并且具有第一 空间频率由衬底上沿着给定方向的成套组钉扎和中性区域的数量给出; 以及通过根据下面的化学图案横向分离块而形成嵌段共聚物的结构域，其中嵌段共聚物组合物的至少一个结构域对于钉扎区域具有亲和力，其中横跨化学图案延伸的结构是 所述结构具有由给定方向上的至少是第一空间频率的两倍的畴的重复集合的数量给出的统一的第二空间频率。

公开(公告)号：US20090179001A1

公开(公告)日：2009-07-16

申请号：US12013444

申请日：2008-01-12

申请人： Joy Cheng ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Linda Sundberg

发明人： Joy Cheng ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Linda Sundberg

IPC分类号： B32B37/14 ,  B32B38/10

CPC分类号： B05D5/00 ,  B05D7/14 ,  B05D7/52 ,  C08L53/00 ,  C09D125/14 ,  C09D153/00

摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.

摘要翻译： 本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联 取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。 取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。 在另外的实施方案中，公开了双层和三层成像方案。