公开(公告)号：US20080143908A1

公开(公告)日：2008-06-19

申请号：US11985770

申请日：2007-11-16

申请人： Ju Han Bae ,  Dae-Jin Park

发明人： Ju Han Bae ,  Dae-Jin Park

IPC分类号： G02F1/1368 ,  G02F1/13

CPC分类号： G02F1/133555 ,  G02F1/133345 ,  G02F2202/02

摘要： The thin film transistor substrate includes a reflection area and a transmission area formed in a pixel region, a thin film transistor formed in the reflection area and connected to a gate line and a data line, an imprint layer formed in the reflection area and having an optical pattern surface, a reflective electrode formed on the imprint layer and having the same cross section as the optical pattern, a contact portion penetrating the imprint layer and the reflective electrode to expose a portion of a drain electrode of the thin film transistor, and a pixel electrode connected to the reflective electrode and connected to the drain electrode via the contact portion.

摘要翻译： 薄膜晶体管基板包括反射区域和形成在像素区域中的透射区域，形成在反射区域中并连接到栅极线和数据线的薄膜晶体管，形成在反射区域中的压印层，并且具有 光学图案表面，形成在压印层上并且具有与光学图案相同的横截面的反射电极，穿过压印层和反射电极的接触部分以暴露薄膜晶体管的漏电极的一部分，以及 像素电极，连接到反射电极，并通过接触部分连接到漏电极。

公开(公告)号：US07807087B2

公开(公告)日：2010-10-05

申请号：US11882363

申请日：2007-08-01

申请人： Dae Jin Park ,  Kyu Young Kim ,  Jung Mok Bae ,  Ju Han Bae

发明人： Dae Jin Park ,  Kyu Young Kim ,  Jung Mok Bae ,  Ju Han Bae

IPC分类号： B28B3/00 ,  B28B3/02 ,  B28B1/14 ,  B28B1/02 ,  B28B3/06 ,  B28B5/00 ,  B29C43/02 ,  B29C43/32 ,  B29C51/00 ,  B29C39/00 ,  B29C41/00 ,  B29C71/00 ,  B29C45/73 ,  B29C59/02 ,  B29C41/46 ,  B27N3/18

CPC分类号： G03F7/0002 ,  B29C43/06 ,  B29C43/222 ,  B29C43/3697 ,  B29C43/58 ,  B29C2035/0827 ,  B29C2043/5833 ,  B29L2011/0016 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprinting apparatus and a method of the same which form a residual film including a uniform thickness all over a substrate. The imprinting apparatus includes a substrate support which supports a substrate which is coated with an imprint resin on an upper surface thereof, an imprint mold arranged on an upper side of the substrate support and which forms a predetermined pattern by molding the imprint resin coated on the substrate, a pressure roller which pressurizes the imprint mold to adhere closely to the substrate, a pressure roller control unit which controls the pressure roller to change a moving velocity and an applied pressure of the pressure roller according to a position of the imprint mold, and a resin curing unit which cures the imprint resin on the substrate.

摘要翻译： 一种压印装置及其制造方法，其在整个基板上形成包括均匀厚度的残留膜。 压印设备包括：基板支撑件，其支撑在其上表面上涂覆有压印树脂的基板;压印模具，布置在基板支撑件的上侧，并且通过模制涂覆在基板支撑体上的压印树脂形成预定图案 基板，对压印模具进行加压以紧贴基板的压力辊;压力辊控制单元，其根据压印模具的位置控制压力辊以改变压力辊的移动速度和施加的压力;以及 树脂固化单元，其固化基板上的压印树脂。

公开(公告)号：US20080028958A1

公开(公告)日：2008-02-07

申请号：US11882363

申请日：2007-08-01

申请人： Dae Jin Park ,  Kyu Young Kim ,  Jung Mok Bae ,  Ju Han Bae

发明人： Dae Jin Park ,  Kyu Young Kim ,  Jung Mok Bae ,  Ju Han Bae

IPC分类号： B41F7/00 ,  G02B1/12

CPC分类号： G03F7/0002 ,  B29C43/06 ,  B29C43/222 ,  B29C43/3697 ,  B29C43/58 ,  B29C2035/0827 ,  B29C2043/5833 ,  B29L2011/0016 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprinting apparatus and a method of the same which form a residual film including a uniform thickness all over a substrate. The imprinting apparatus includes a substrate support which supports a substrate which is coated with an imprint resin on an upper surface thereof, an imprint mold arranged on an upper side of the substrate support and which forms a predetermined pattern by molding the imprint resin coated on the substrate, a pressure roller which pressurizes the imprint mold to adhere closely to the substrate, a pressure roller control unit which controls the pressure roller to change a moving velocity and an applied pressure of the pressure roller according to a position of the imprint mold, and a resin curing unit which cures the imprint resin on the substrate.

摘要翻译： 一种压印装置及其制造方法，其在整个基板上形成包括均匀厚度的残留膜。 压印设备包括：基板支撑件，其支撑在其上表面上涂覆有压印树脂的基板;压印模具，布置在基板支撑件的上侧，并且通过模制涂覆在基板支撑体上的压印树脂形成预定图案 基板，对压印模具进行加压以紧贴基板的压力辊;压力辊控制单元，其根据压印模具的位置控制压力辊以改变压力辊的移动速度和施加的压力;以及 树脂固化单元，其固化基板上的压印树脂。