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1.发明申请APPARATUS AND METHOD FOR EXPOSING A SUBSTRATE TO A ROTATING IRRADIANCE PATTERN OF UV RADIATION 有权将基材暴露于紫外线辐射的旋转辐照图案的装置和方法公开(公告)号：US20070286963A1
公开(公告)日：2007-12-13
申请号：US11686881
申请日：2007-03-15
申请人： Juan Rocha-Alvarez , Thomas Nowak , Dale Du Bois , Sanjeev Baluja , Scott Hendrickson , Dustin Ho , Andrzei Kaszuba , Tom Cho
发明人： Juan Rocha-Alvarez , Thomas Nowak , Dale Du Bois , Sanjeev Baluja , Scott Hendrickson , Dustin Ho , Andrzei Kaszuba , Tom Cho
CPC分类号： B05D3/0209 , B05D3/0493 , B05D3/067 , H01L21/31058 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。
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2.发明申请APPARATUS AND METHOD FOR TREATING A SUBSTRATE WITH UV RADIATION USING PRIMARY AND SECONDARY REFLECTORS 有权用初级和次级反射器处理具有紫外线辐射的基板的装置和方法公开(公告)号：US20070257205A1
公开(公告)日：2007-11-08
申请号：US11686878
申请日：2007-03-15
申请人： Juan Rocha-Alvarez , Thomas Nowak , Dale Du Bois , Sanjeev Baluja , Scott Hendrickson , Dustin Ho , Andrzei Kaszuba , Tom Cho
发明人： Juan Rocha-Alvarez , Thomas Nowak , Dale Du Bois , Sanjeev Baluja , Scott Hendrickson , Dustin Ho , Andrzei Kaszuba , Tom Cho
IPC分类号： B01J19/08
CPC分类号： B05D3/067
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。
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3.发明申请APPARATUS AND METHOD FOR EXPOSING A SUBSTRATE TO UV RADIATION USING ASYMMETRIC REFLECTORS 有权使用不对称反射器将基板暴露于紫外线辐射的装置和方法公开(公告)号：US20080067425A1
公开(公告)日：2008-03-20
申请号：US11686900
申请日：2007-03-15
申请人： Andrzei Kaszuba , Juan Rocha-Alvarez , Sanjeev Baluja , Tom Cho , Hichem M'Saad , Scott Hendrickson , Dustin Ho , Thomas Nowak
发明人： Andrzei Kaszuba , Juan Rocha-Alvarez , Sanjeev Baluja , Tom Cho , Hichem M'Saad , Scott Hendrickson , Dustin Ho , Thomas Nowak
IPC分类号： G21K5/00
CPC分类号： G21K1/062 , B82Y10/00 , G21K2201/061 , G21K2201/064 , G21K2201/067 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。
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公开(公告)号：US20060249175A1
公开(公告)日：2006-11-09
申请号：US11230975
申请日：2005-09-20
申请人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
发明人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
IPC分类号： B08B3/12 , B08B7/00 , B08B9/00 , H01L21/306
CPC分类号： B08B7/0035 , C23C16/4405
摘要： An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV bulbs per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV bulbs can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.
摘要翻译： 紫外线（UV）固化室可固化设置在基底上的电介质材料并进行原位清洁。 串联处理室提供由覆盖有盖的主体限定的两个单独的和相邻的过程区域，所述盖子具有分别位于每个处理区域上方的窗口。 每个处理区域的一个或多个UV灯泡被耦合到盖的壳体覆盖，将通过窗口的UV光发射到位于处理区域内的衬底上。 UV灯泡可以是利用诸如微波或射频的源的发光二极管或灯泡阵列。 紫外光可以在固化过程中被脉冲。 使用远程生成的氧自由基/臭氧和/或原位实现清洁室。 灯阵列的使用，基板和灯头的相对运动以及灯反射器形状和/或位置的实时修改可以增强基板照明的均匀性。
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公开(公告)号：US20060251827A1
公开(公告)日：2006-11-09
申请号：US11124908
申请日：2005-05-09
申请人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
发明人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
CPC分类号： B05D3/067 , B05D3/0209 , B05D3/0493 , H01L21/31058
摘要： An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV bulbs per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV bulbs can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.
摘要翻译： 紫外线（UV）固化室可固化设置在基底上的电介质材料并进行原位清洁。 串联处理室提供由覆盖有盖的主体限定的两个单独的和相邻的过程区域，所述盖子具有分别位于每个处理区域上方的窗口。 每个处理区域的一个或多个UV灯泡被耦合到盖的壳体覆盖，将通过窗口的UV光发射到位于处理区域内的衬底上。 UV灯泡可以是利用诸如微波或射频的源的发光二极管或灯泡阵列。 紫外光可以在固化过程中被脉冲。 使用远程生成的氧自由基/臭氧和/或原位实现清洁室。 灯阵列的使用，基板和灯头的相对运动以及灯反射器形状和/或位置的实时修改可以增强基板照明的均匀性。
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公开(公告)号：US20060249078A1
公开(公告)日：2006-11-09
申请号：US11424368
申请日：2006-06-15
申请人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
发明人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
CPC分类号： B05D3/067 , B05D3/0209 , B05D3/0493 , H01L21/31058
摘要： An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV bulbs per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV bulbs can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.
摘要翻译： 紫外线（UV）固化室可固化设置在基底上的电介质材料并进行原位清洁。 串联处理室提供由覆盖有盖的主体限定的两个单独的和相邻的过程区域，所述盖子具有分别位于每个处理区域上方的窗口。 每个处理区域的一个或多个UV灯泡被耦合到盖的壳体覆盖，将通过窗口的UV光发射到位于处理区域内的衬底上。 UV灯泡可以是利用诸如微波或射频的源的发光二极管或灯泡阵列。 紫外光可以在固化过程中被脉冲。 使用远程生成的氧自由基/臭氧和/或原位实现清洁室。 灯阵列的使用，基板和灯头的相对运动以及灯反射器形状和/或位置的实时修改可以增强基板照明的均匀性。
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7.发明申请APPARATUS AND METHOD FOR EXPOSING A SUBSTRATE TO UV RADIATION WHILE MONITORING DETERIORATION OF THE UV SOURCE AND REFLECTORS 有权用于在紫外线源和反射器的监测下，将基底暴露于紫外线辐射的装置和方法公开(公告)号：US20070228289A1
公开(公告)日：2007-10-04
申请号：US11686897
申请日：2007-03-15
IPC分类号： G21G5/00
CPC分类号： B05D3/067 , B29C71/04 , B29C2035/0827 , F26B3/28 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。
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8.发明申请APPARATUS AND METHOD FOR EXPOSING A SUBSTRATE TO UV RADIATION USING A REFLECTOR HAVING BOTH ELLIPTICAL AND PARABOLIC REFLECTIVE SECTIONS 有权使用具有两个ELLIPTICAL和PARABOLIC反射部分的反射器将基板暴露于紫外线辐射的装置和方法公开(公告)号：US20070228618A1
公开(公告)日：2007-10-04
申请号：US11686901
申请日：2007-03-15
申请人： Andrzei Kaszuba , Juan Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ashish Shah , Inna Shmurun
发明人： Andrzei Kaszuba , Juan Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ashish Shah , Inna Shmurun
IPC分类号： B29C35/08
CPC分类号： B05D3/067 , B29C71/04 , B29C2035/0827 , F26B3/28 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。
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公开(公告)号：US20090305515A1
公开(公告)日：2009-12-10
申请号：US12134413
申请日：2008-06-06
CPC分类号： H01L21/76224 , H01L21/02164 , H01L21/3105
摘要： Embodiments of the invention generally relate to a method and apparatus for curing dielectric material deposited in trenches or gaps in the surface of a substrate to produce a feature free of voids and seams. In one embodiment, the dielectric material is steam annealed while being exposed to ultraviolet radiation. In one embodiment, the dielectric material is further thermally annealed in a nitrogen environment.
摘要翻译： 本发明的实施方案一般涉及用于固化沉积在基板表面中的沟槽或间隙中的电介质材料以产生无空隙和接缝的特征的方法和装置。 在一个实施例中，电介质材料在暴露于紫外线辐射的同时进行蒸汽退火。 在一个实施例中，电介质材料在氮气环境中进一步热退火。
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10.发明授权Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation 有权用于将衬底暴露于UV辐射的旋转辐照图案的装置和方法公开(公告)号：US08203126B2
公开(公告)日：2012-06-19
申请号：US12841935
申请日：2010-07-22
申请人： Juan Carlos Rocha-Alvarez , Thomas Nowak , Dale R. Du Bois , Sanjeev Baluja , Scott A. Hendrickson , Dustin W. Ho , Andrzei Kaszuba , Tom K. Cho
发明人： Juan Carlos Rocha-Alvarez , Thomas Nowak , Dale R. Du Bois , Sanjeev Baluja , Scott A. Hendrickson , Dustin W. Ho , Andrzei Kaszuba , Tom K. Cho
CPC分类号： B05D3/0209 , B05D3/0493 , B05D3/067 , H01L21/31058 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。
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