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1.发明申请公开(公告)号：US20110235012A1
公开(公告)日：2011-09-29
申请号：US13071237
申请日：2011-03-24
申请人： Juergen Fischer , Armin Schoeppach , Matthias Orth , Norbert Muehlberger , Thorsten Rassel , Armin Werber , Juergen Huber
发明人： Juergen Fischer , Armin Schoeppach , Matthias Orth , Norbert Muehlberger , Thorsten Rassel , Armin Werber , Juergen Huber
IPC分类号： G03B27/54
CPC分类号： G03F7/7015 , G03F7/70266 , G03F7/70825 , G03F7/70883 , G03F7/709 , G03F7/70991
摘要： A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.
摘要翻译： 用于生产半导体部件的用于微光刻的投影曝光装置包括至少一个光学组件，其具有可以以机械控制的方式被致动的至少一个光学元件安装在结构中。 为了执行机械致动，至少在投影曝光设备的特定操作状态期间，提供控制信号传输装置和/或能量传输装置，其将光学组件中没有寄生机械效应引入到光学组件中。
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2.发明授权公开(公告)号：US08885143B2
公开(公告)日：2014-11-11
申请号：US13071237
申请日：2011-03-24
申请人： Juergen Fischer , Armin Schoeppach , Matthias Orth , Norbert Muehlberger , Thorsten Rassel , Armin Werber , Juergen Huber
发明人： Juergen Fischer , Armin Schoeppach , Matthias Orth , Norbert Muehlberger , Thorsten Rassel , Armin Werber , Juergen Huber
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G03F7/70266 , G03F7/70825 , G03F7/70883 , G03F7/709 , G03F7/70991
摘要： A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.
摘要翻译： 用于生产半导体部件的用于微光刻的投影曝光装置包括至少一个光学组件，其具有可以以机械控制的方式被致动的至少一个光学元件安装在结构中。 为了执行机械致动，至少在投影曝光设备的特定操作状态期间，提供控制信号传输装置和/或能量传输装置，其将光学组件中没有寄生机械效应引入到光学组件中。
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3.发明申请GRAVITATION COMPENSATION FOR OPTICAL ELEMENTS IN PROJECTION EXPOSURE APPARATUSES 有权投影曝光装置中的光学元件的渲染补偿公开(公告)号：US20110267596A1
公开(公告)日：2011-11-03
申请号：US13111492
申请日：2011-05-19
CPC分类号： G02B7/001 , G02B13/143 , G02B13/16 , G03F7/70825
摘要： A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.
摘要翻译： 公开了一种用于在投影曝光设备和相应的投影曝光设备中安装光学元件的引力补偿器。 重力补偿器至少部分地补偿安装的光学元件的重量，并且同时能够改变光学元件的位置，而不会在位置改变期间以不允许的方式改变补偿的重量。 这尤其适用于要补偿的高重量力。 此外，引力补偿器可以在不同的环境中使用，并补偿相应的老化效应。
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4.发明授权Gravitation compensation for optical elements in projection exposure apparatuses 有权投影曝光装置中的光学元件的重力补偿公开(公告)号：US08854603B2
公开(公告)日：2014-10-07
申请号：US13111492
申请日：2011-05-19
CPC分类号： G02B7/001 , G02B13/143 , G02B13/16 , G03F7/70825
摘要： A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.
摘要翻译： 公开了一种用于在投影曝光设备和相应的投影曝光设备中安装光学元件的引力补偿器。 重力补偿器至少部分地补偿安装的光学元件的重量，并且同时能够改变光学元件的位置，而不会在位置改变期间以不允许的方式改变补偿的重量。 这尤其适用于要补偿的高重量力。 此外，引力补偿器可以在不同的环境中使用，并补偿相应的老化效应。
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5.发明申请ACTUATOR INCLUDING MAGNET FOR A PROJECTION EXPOSURE SYSTEM AND PROJECTION EXPOSURE SYSTEM INCLUDING A MAGNET 有权执行器包括用于投影曝光系统的磁体和包括磁铁的投影曝光系统公开(公告)号：US20120008121A1
公开(公告)日：2012-01-12
申请号：US13196592
申请日：2011-08-02
申请人： Armin Werber , Norbert Muehlberger , Almut Czap , Juergen Fischer
发明人： Armin Werber , Norbert Muehlberger , Almut Czap , Juergen Fischer
CPC分类号： G03F7/7095 , G02B26/085 , G02B27/0006 , G03F7/70 , G03F7/70291 , H01F7/0221 , H01F7/1623 , H01F7/1638
摘要： The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and/or supported in a magnet holding plate that is produced by microtechnical production methods so that a moving manipulator surface is held in the magnet holding plate via monolithic or bonded connections without additional connecting material so that there is a secure connection.
摘要翻译： 本公开涉及一种包括磁体的用于投影曝光系统的致动器。 磁体被封装和/或支撑在通过微技术生产方法制造的磁体保持板中，使得移动的操纵器表面通过单片或粘合的连接件被保持在磁体保持板中，而没有附加的连接材料，使得存在安全的连接。
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6.发明授权Actuator including magnet for a projection exposure system and projection exposure system including a magnet 有权致动器包括用于投影曝光系统的磁体和包括磁体的投影曝光系统公开(公告)号：US09025128B2
公开(公告)日：2015-05-05
申请号：US13196592
申请日：2011-08-02
申请人： Armin Werber , Norbert Muehlberger , Almut Czap , Juergen Fischer
发明人： Armin Werber , Norbert Muehlberger , Almut Czap , Juergen Fischer
CPC分类号： G03F7/7095 , G02B26/085 , G02B27/0006 , G03F7/70 , G03F7/70291 , H01F7/0221 , H01F7/1623 , H01F7/1638
摘要： The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and/or supported in a magnet holding plate that is produced by microtechnical production methods so that a moving manipulator surface is held in the magnet holding plate via monolithic or bonded connections without additional connecting material so that there is a secure connection.
摘要翻译： 本公开涉及一种包括磁体的用于投影曝光系统的致动器。 磁体被封装和/或支撑在通过微技术生产方法制造的磁体保持板中，使得移动的操纵器表面通过单片或粘合的连接件被保持在磁体保持板中，而没有附加的连接材料，使得存在安全的连接。
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7.发明授权公开(公告)号：US09013676B2
公开(公告)日：2015-04-21
申请号：US13172448
申请日：2011-06-29
申请人： Armin Werber , Norbert Muehlberger , Florian Bach
发明人： Armin Werber , Norbert Muehlberger , Florian Bach
CPC分类号： G02B26/0841 , G02B5/09 , G03F7/70075
摘要： An individual mirror is used to construct a facet mirror. A mirror body of the individual mirror is configured to be tiltable relative to a rigid carrier body about at least one tilting axis of a tilting joint. The tilting joint is configured as a solid-body joint. The solid-body joint, perpendicular to the tilting axis, has a joint thickness S and, along the tilting axis, a joint length L. The following applies: L/S>50. The result is an individual mirror to construct a facet mirror, which can be reproduced and is precisely adjustable and simultaneously ensures adequate heat removal, in particular, heat produced by residually absorbed useful radiation, which is reflected by the individual mirror, by dissipation of the heat by the mirror body.
摘要翻译： 单独的镜子用于构造一面镜。 单个反射镜的镜体被构造成相对于刚性载体主体倾斜倾斜关节的至少一个倾斜轴线。 倾斜接头被构造为固体接头。 垂直于倾斜轴的固体接头具有接头厚度S，并且沿倾斜轴线具有接头长度L.以下适用：L / S> 50。 结果是构建一个小平面镜的单独的镜子，其可以被再现并且是精确的可调节的并且同时确保足够的散热，特别是由个体反射镜反射的残余吸收的有用辐射产生的热量， 加热由镜体。
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8.发明授权公开(公告)号：US09411241B2
公开(公告)日：2016-08-09
申请号：US12848603
申请日：2010-08-02
申请人： Udo Dinger , Martin Endres , Armin Werber , Norbert Muehlberger , Florian Bach
发明人： Udo Dinger , Martin Endres , Armin Werber , Norbert Muehlberger , Florian Bach
CPC分类号： G03F7/702 , G02B5/09 , G02B26/06 , G02B26/0816 , G02B26/0833 , G02B27/0927 , G03F7/70075 , G03F7/70116
摘要： A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.
摘要翻译： 在用于微光刻的投影曝光装置中，将使用小平面镜作为束引导光学部件。 小平面镜具有多个独立的反射镜。 对于入射照明光的单独偏转，分离的反射镜在每种情况下都以致动器的方式连接，使得它们可以围绕至少一个倾斜轴线单独倾斜。 连接到致动器的控制装置被配置成使得可以将分离的反射镜的给定分组分组成分离的反射镜组，每个反射镜组在每种情况下包括至少两个分离的反射镜。 其结果是，当安装在投影曝光装置中时，增加了用于设置由投影曝光装置照亮的对象场的各种照明几何形状的可变性的刻面镜。 描述了用于形成小平面反射镜的分立反射镜的各种实施例。
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9.发明申请INDIVIDUAL MIRROR FOR CONSTRUCTING A FACETED MIRROR, IN PARTICULAR FOR USE IN A PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY 有权用于构造面镜的个人镜子，特别是用于微型计算机投影曝光系统公开(公告)号：US20110273694A1
公开(公告)日：2011-11-10
申请号：US13172448
申请日：2011-06-29
申请人： Armin Werber , Norbert Muehlberger , Florian Bach
发明人： Armin Werber , Norbert Muehlberger , Florian Bach
CPC分类号： G02B26/0841 , G02B5/09 , G03F7/70075
摘要： An individual mirror is used to construct a facet mirror. A mirror body of the individual mirror is configured to be tiltable relative to a rigid carrier body about at least one tilting axis of a tilting joint. The tilting joint is configured as a solid-body joint. The solid-body joint, perpendicular to the tilting axis, has a joint thickness S and, along the tilting axis, a joint length L. The following applies: L/S>50. The result is an individual mirror to construct a facet mirror, which can be reproduced and is precisely adjustable and simultaneously ensures adequate heat removal, in particular, heat produced by residually absorbed useful radiation, which is reflected by the individual mirror, by dissipation of the heat by the mirror body.
摘要翻译： 单独的镜子用于构造一面镜。 单个反射镜的镜体被构造成相对于刚性载体主体倾斜倾斜关节的至少一个倾斜轴线。 倾斜接头被构造为固体接头。 垂直于倾斜轴的固体接头具有接头厚度S，并且沿倾斜轴线具有接头长度L.以下适用：L / S> 50。 结果是构建一个小平面镜的单独的镜子，其可以被再现并且是精确的可调节的并且同时确保足够的散热，特别是由个体反射镜反射的残余吸收的有用辐射产生的热量， 加热由镜体。
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10.发明申请FACET MIRROR FOR USE IN A PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY 有权用于微型计算机投影曝光装置的FACET MIRROR公开(公告)号：US20110001947A1
公开(公告)日：2011-01-06
申请号：US12848603
申请日：2010-08-02
申请人： Udo Dinger , Martin Endres , Armin Werber , Norbert Muehlberger , Florian Bach
发明人： Udo Dinger , Martin Endres , Armin Werber , Norbert Muehlberger , Florian Bach
CPC分类号： G03F7/702 , G02B5/09 , G02B26/06 , G02B26/0816 , G02B26/0833 , G02B27/0927 , G03F7/70075 , G03F7/70116
摘要： A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.
摘要翻译： 在用于微光刻的投影曝光装置中，将使用小平面镜作为束引导光学部件。 小平面镜具有多个独立的反射镜。 对于入射照明光的单独偏转，分离的反射镜在每种情况下都以致动器的方式连接，使得它们可以围绕至少一个倾斜轴线单独倾斜。 连接到致动器的控制装置被配置成使得可以将分离的反射镜的给定分组分组成分离的反射镜组，每个反射镜组在每种情况下包括至少两个分离的反射镜。 其结果是，当安装在投影曝光装置中时，增加了用于设置由投影曝光装置照亮的对象场的各种照明几何形状的可变性的刻面镜。 描述了用于形成小平面反射镜的分立反射镜的各种实施例。
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