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    EMBOSSED ELECTROSTATIC CHUCK
    1.
    发明申请
    EMBOSSED ELECTROSTATIC CHUCK 审中-公开
    嵌入式静电切割机

    公开(公告)号：US20090122458A1

    公开(公告)日：2009-05-14

    申请号：US12269394

    申请日：2008-11-12

    申请人： D. Jeffrey Lischer ,  Dale K. Stone ,  Lyudmila Stone ,  David Suuronen ,  Julian G. Blake

    发明人： D. Jeffrey Lischer ,  Dale K. Stone ,  Lyudmila Stone ,  David Suuronen ,  Julian G. Blake

    IPC分类号： H01L21/683

    CPC分类号： H01L21/6831

    摘要： An electrostatic chuck includes a layer having a plurality of protrusions to support a workpiece, wherein at least a portion of the layer has a first plurality of the plurality of protrusions. The first plurality of protrusions is spaced to geometrically form a pattern of hexagons. The first plurality of protrusions may be spaced an equal distance from adjacent protrusions and the equal distance may be about 4.0 millimeters from a center of one protrusion to a center of another protrusion. The present disclosure reduces peak mechanical stress levels conventionally present along an edge of each protrusion. Reducing such mechanical stress levels helps reduce backside damage to a supported workpiece, which in turn can reduce the generation of unwanted particles caused by such damage.

    摘要翻译： 静电卡盘包括具有多个突起以支撑工件的层，其中该层的至少一部分具有第一多个多个突起。 第一多个突起间隔几何形成六边形图案。 第一多个突起可以与相邻的突起间隔开相等的距离，并且等距离可以是距离一个突起的中心到另一个突起的中心的约4.0毫米。 本公开减少了沿着每个突起的边缘常规存在的峰值机械应力水平。 降低这种机械应力水平有助于减少支撑的工件的背面损坏，这又可以减少由这种损坏引起的不想要的颗粒的产生。

    ELECTROSTATIC CHUCK WITH SEPARATED ELECTRODES
    3.
    发明申请
    ELECTROSTATIC CHUCK WITH SEPARATED ELECTRODES 有权
    具有分离电极的静电卡盘

    公开(公告)号：US20080239614A1

    公开(公告)日：2008-10-02

    申请号：US11690950

    申请日：2007-03-26

    申请人： Julian G. Blake ,  Dale K. Stone ,  Lyudmila Stone ,  David Suuronen

    发明人： Julian G. Blake ,  Dale K. Stone ,  Lyudmila Stone ,  David Suuronen

    IPC分类号： H01L21/683

    CPC分类号： H02N13/00 ,  H01J37/20 ,  H01J2237/2007 ,  H01J2237/31701 ,  H01L21/6833

    摘要： Electrostatic clamping devices and methods for reducing contamination to a workpiece coupled to an electrostatic clamping device are disclosed. According to an embodiment an electrostatic clamping device for coupling a workpiece comprises: an embossment portion on a surface of a body to contact the workpiece; and at least two electrodes within the body; wherein the two electrodes are separated by a separation portion below the embossment portion.

    摘要翻译： 公开了用于减少与静电夹紧装置连接的工件的污染的静电夹紧装置和方法。 根据实施例，用于联接工件的静电夹紧装置包括：在主体表面上与工件接触的压花部分; 和身体内至少两个电极; 其中两个电极由压花部分下方的分离部分分开。

    COATED GRAPHITE LINERS
    4.
    发明申请
    COATED GRAPHITE LINERS 审中-公开
    涂层石墨线

    公开(公告)号：US20100140508A1

    公开(公告)日：2010-06-10

    申请号：US12328307

    申请日：2008-12-04

    申请人： Julian G. Blake ,  Dale K. Stone ,  Lyudmila Stone

    发明人： Julian G. Blake ,  Dale K. Stone ,  Lyudmila Stone

    IPC分类号： H01J37/08

    CPC分类号： H01J37/3171 ,  H01J2237/022

    摘要： Liner elements designed to protect the components located in the beam line are disclosed. These liner elements, preferably constructed from graphite, are coated with a non-metal material, such as silicon, silicon carbide or diamond like carbon. These coatings significantly reduce the loose particles created by the liner. Therefore, following preventative maintenance, the ion implantation system can return to normal operation sooner. A method of providing preventative maintenance for an ion implanter is also disclosed, whereby used liners are cleaned and recoated before being used again.

    摘要翻译： 公开了用于保护位于光束线中的部件的衬垫元件。 这些衬垫元件，优选由石墨构成，涂覆有非金属材料，例如硅，碳化硅或类金刚石碳。 这些涂层显着减少了衬垫产生的松散颗粒。 因此，在预防性维护之后，离子注入系统可以更快恢复正常运行。 还公开了一种为离子注入机提供预防性维护的方法，其中使用的衬垫在被再次使用之前被清洁和重新涂覆。

    TECHNIQUES FOR HANDLING SUBSTRATES
    5.
    发明申请
    TECHNIQUES FOR HANDLING SUBSTRATES 审中-公开
    处理基板的技术

    公开(公告)号：US20090003979A1

    公开(公告)日：2009-01-01

    申请号：US11770805

    申请日：2007-06-29

    申请人： Dale K. Stone ,  Lyudmila Stone ,  Julian G. Blake ,  Suneethi Gudapati

    发明人： Dale K. Stone ,  Lyudmila Stone ,  Julian G. Blake ,  Suneethi Gudapati

    IPC分类号： H01L21/683

    CPC分类号： H01L21/68707

    摘要： Techniques for handling substrates are disclosed. In one particular exemplary embodiment, the techniques may be realized as a substrate support. The substrate support may comprise a mounting portion. The substrate support may also comprise a wall extending from the mounting portion, wherein the wall may form a generally enclosed area and may have a contact surface at a distal end.

    摘要翻译： 公开了处理衬底的技术。 在一个特定的示例性实施例中，这些技术可以被实现为衬底支撑。 衬底支撑件可以包括安装部分。 衬底支撑件还可以包括从安装部分延伸的壁，其中壁可以形成大致封闭的区域并且可以在远端具有接触表面。

    Removal of charge between a substrate and an electrostatic clamp
    7.
    发明授权
    Removal of charge between a substrate and an electrostatic clamp 有权
    去除基板和静电夹具之间的电荷

    公开(公告)号：US08531814B2

    公开(公告)日：2013-09-10

    申请号：US12759990

    申请日：2010-04-14

    申请人： Dale K. Stone ,  Lyudmila Stone ,  Klaus Petry ,  David E. Suuronen ,  Julian G. Blake

    发明人： Dale K. Stone ,  Lyudmila Stone ,  Klaus Petry ,  David E. Suuronen ,  Julian G. Blake

    IPC分类号： H01L21/683 ,  H01T23/00 ,  H01H47/00 ,  H05F3/00 ,  H05F3/02

    CPC分类号： H01L21/6831 ,  H01L21/68742 ,  Y10T29/49998 ,  Y10T279/23

    摘要： An electrostatic clamp, which more effectively removes built up charge from a substrate prior to and during removal, is disclosed. Currently, the lift pins and ground pins are the only mechanisms used to remove charge from the substrate after implantation. The present discloses describes a clamp having one of more additional low resistance paths to ground. These additional conduits allow built up charge to be dissipated prior to and during the removal of the substrate from the clamp. By providing sufficient charge drainage from the backside surface of the substrate 114, the problem whereby the substrate sticks to the clamp can be reduced. This results in a corresponding reduction in substrate breakage.

    摘要翻译： 公开了一种静电夹具，其在去除和移除之前更有效地从衬底上去除积聚的电荷。 目前，电极引脚和接地引脚是植入后从衬底去除电荷的唯一机制。 本公开描述了一种具有更多附加的低电阻路径到地之一的夹具。 这些额外的管道允许在从夹具移除衬底之前和期间消耗积分电荷。 通过从基板114的背面提供足够的电荷排出，可以减少基板粘附到夹具上的问题。 这导致基板断裂的相应减少。

    REMOVAL OF CHARGE BETWEEN A SUBSTRATE AND AN ELECTROSTATIC CLAMP
    8.
    发明申请
    REMOVAL OF CHARGE BETWEEN A SUBSTRATE AND AN ELECTROSTATIC CLAMP 有权
    去除基板和静电夹之间的电荷

    公开(公告)号：US20100265631A1

    公开(公告)日：2010-10-21

    申请号：US12759990

    申请日：2010-04-14

    申请人： Dale K. Stone ,  Lyudmila Stone ,  David E. Suuronen ,  Klaus Petry ,  Julian G. Blake

    发明人： Dale K. Stone ,  Lyudmila Stone ,  David E. Suuronen ,  Klaus Petry ,  Julian G. Blake

    IPC分类号： H01L21/683 ,  H02N13/00

    CPC分类号： H01L21/6831 ,  H01L21/68742 ,  Y10T29/49998 ,  Y10T279/23

    摘要： An electrostatic clamp, which more effectively removes built up charge from a substrate prior to and during removal, is disclosed. Currently, the lift pins and ground pins are the only mechanisms used to remove charge from the substrate after implantation. The present discloses describes a clamp having one of more additional low resistance paths to ground. These additional conduits allow built up charge to be dissipated prior to and during the removal of the substrate from the clamp. By providing sufficient charge drainage from the backside surface of the substrate 114, the problem whereby the substrate sticks to the clamp can be reduced. This results in a corresponding reduction in substrate breakage.

    摘要翻译： 公开了一种静电夹具，其在去除和移除之前更有效地从衬底上去除积聚的电荷。 目前，电极引脚和接地引脚是植入后从衬底去除电荷的唯一机制。 本公开描述了一种具有更多附加的低电阻路径到地之一的夹具。 这些额外的管道允许在从夹具移除衬底之前和期间消耗积分电荷。 通过从基板114的背面提供足够的电荷排出，可以减少基板粘附到夹具上的问题。 这导致基板断裂的相应减少。

    IN-VACUUM PROTECTIVE LINERS
    9.
    发明申请
    IN-VACUUM PROTECTIVE LINERS 审中-公开
    真空保护衬管

    公开(公告)号：US20090179158A1

    公开(公告)日：2009-07-16

    申请号：US12353642

    申请日：2009-01-14

    申请人： Lyudmila Stone ,  Julian G. Blake ,  Dale K. Stone ,  Ron S. Serisky

    发明人： Lyudmila Stone ,  Julian G. Blake ,  Dale K. Stone ,  Ron S. Serisky

    IPC分类号： H01J27/00 ,  G21K1/00 ,  H01J49/00

    CPC分类号： H01J37/3171 ,  H01J37/16 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0268 ,  H01J2237/31705

    摘要： This device has a liner disposed on a face in a vacuum chamber. A component in the vacuum chamber defines the face. The liner is configured to protect the workpiece from contamination or to prevent blistering of the face caused by implantation of atoms or ions into the face. The liner may be disposable and removed from the face in the vacuum chamber and replaced with a new liner in some embodiments. This liner may be a polymer with a roughened surface, be carbon-based, or be composed of carbon nanotubes in some embodiments.

    摘要翻译： 该装置具有设置在真空室中的表面上的衬垫。 真空室中的部件限定了面。 衬套被配置为保护工件免受污染或防止由于将原子或离子注入到面中引起的起泡。 在一些实施例中，衬垫可以是一次性的并且从真空室中的表面移除并替换为新衬里。 在一些实施方案中，该衬垫可以是具有粗糙表面的聚合物，为碳基，或由碳纳米管组成。