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    Resist composition and patterning process
    3.
    发明授权
    Resist composition and patterning process 有权
    抗蚀剂组成和图案化工艺

    公开(公告)号：US07771914B2

    公开(公告)日：2010-08-10

    申请号：US11872952

    申请日：2007-10-16

    申请人： Jun Hatakeyama ,  Takao Yoshihara ,  Yuji Harada ,  Wataru Kusaki

    发明人： Jun Hatakeyama ,  Takao Yoshihara ,  Yuji Harada ,  Wataru Kusaki

    IPC分类号： G03F7/039 ,  G03F7/038 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  C08F220/10 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/143

    摘要： A resist composition comprises a polymer comprising recurring units having formula (1) wherein R1, R4, R7, and R14 are H or methyl, R2, R3, R15, and R16 are H, alkyl or fluoroalkyl, R is F or H, R5 is alkylene, R6 is fluorinated alkyl, R8 is a single bond or alkylene, R10 and R11 are H, F, methyl or trifluoromethyl, R12 and R13 are a single bond, —O— or —CR18R19—, R9, R18, and R19 are H, F, methyl or trifluoromethyl, R17 is alkylene, X1, X2 and X3 are —C(═O)—O—, —O—, or —C(═O)—R20—C(═O)—O— wherein R20 is alkylene, 0≦(a-1)

    摘要翻译： 抗蚀剂组合物包含含有式（1）的重复单元的聚合物，其中R 1，R 4，R 7和R 14为H或甲基，R 2，R 3，R 15和R 16为H，烷基或氟代烷基，R为F或H，R 5 是亚烷基，R6是氟化烷基，R8是单键或亚烷基，R10和R11是H，F，甲基或三氟甲基，R12和R13是单键，-O-或-CR18R19-，R9，R18和R19 是H，F，甲基或三氟甲基，R 17是亚烷基，X 1，X 2和X 3是-C（= O）-O-，-O-或-C（= O）-R 20 -C（= O）-O （a-1）+（a-2）+（a-1）+（a-2）+（a-2） （a-3）<1,0

    Positive resist compositions and patterning process
    7.
    发明授权
    Positive resist compositions and patterning process 有权
    正极抗蚀剂组成和图案化工艺

    公开(公告)号：US08541158B2

    公开(公告)日：2013-09-24

    申请号：US13013143

    申请日：2011-01-25

    申请人： Wataru Kusaki ,  Takeshi Kinsho ,  Takeru Watanabe

    发明人： Wataru Kusaki ,  Takeshi Kinsho ,  Takeru Watanabe

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38

    CPC分类号： G03F7/0397 ,  G03F7/2041

    摘要： A positive resist composition is provided comprising an acid generator, a resin component which generates resin-solubilizing groups under the action of acid so that the resin component becomes soluble in an alkaline developer, at least some resin-solubilizing groups being carboxyl groups, and a compound for activating or condensing a carboxyl group. When processed by the lithography, the resist composition forms a resist pattern having a very high resolution and good mask fidelity.

    摘要翻译： 提供了一种正性抗蚀剂组合物，其包含酸产生剂，在酸的作用下产生树脂增溶基团的树脂组分，使得树脂组分变得可溶于碱性显影剂，至少一些树脂增溶基团为羧基， 用于活化或缩合羧基的化合物。 当通过光刻处理时，抗蚀剂组合物形成具有非常高的分辨率和良好的掩模保真度的抗蚀剂图案。

    Method for producing hollow structure
    8.
    发明授权
    Method for producing hollow structure 有权
    中空结构的制造方法

    公开(公告)号：US08367311B2

    公开(公告)日：2013-02-05

    申请号：US12909329

    申请日：2010-10-21

    申请人： Wataru Kusaki ,  Toshinobu Ishihara

    发明人： Wataru Kusaki ,  Toshinobu Ishihara

    IPC分类号： G03F7/26

    CPC分类号： B32B38/10

    摘要： Provided is a fabrication method with which a laminate having a hollow structure can be produced more easily, while enabling to produce a multilayer structure as well. That is, a method for producing a hollow structure, a fabrication method by stacking-up a structural material among fabrication methods of a hollow structure on a substrate, the method including; a step of forming a structural material layer on a substrate, a step of forming a pattern on the structural material layer, a step of forming a sacrificial material layer by burying between the patterns with a water-soluble or an alkaline-soluble polymer as the sacrificial material to be buried between the patterns, a step of further laminating a structural material layer and forming a pattern on the structural material layer laminated, and a step of finally removing the sacrificial material after all of lamination is completed.

    摘要翻译： 提供了一种能够更容易地制造具有中空结构的层叠体的制造方法，同时能够制造多层结构。 即，一种中空结构的制造方法，在基板的中空结构的制造方法中堆叠结构材料的制造方法，其特征在于，包括： 在基材上形成结构材料层的步骤，在结构材料层上形成图案的步骤，通过用水溶性或碱溶性聚合物将图案之间埋入形成牺牲材料层的步骤 牺牲材料被埋在图案之间，进一步层压结构材料层并在层压的结构材料层上形成图案的步骤，以及完成所有层压之后最终去除牺牲材料的步骤。

    POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS
    10.
    发明申请
    POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS 有权
    积极的组合物和绘图过程

    公开(公告)号：US20110183262A1

    公开(公告)日：2011-07-28

    申请号：US13013143

    申请日：2011-01-25

    申请人： Wataru Kusaki ,  Takeshi Kinsho ,  Takeru Watanabe

    发明人： Wataru Kusaki ,  Takeshi Kinsho ,  Takeru Watanabe

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/0397 ,  G03F7/2041

    摘要： A positive resist composition is provided comprising an acid generator, a resin component which generates resin-solubilizing groups under the action of acid so that the resin component becomes soluble in an alkaline developer, at least some resin-solubilizing groups being carboxyl groups, and a compound for activating or condensing a carboxyl group. When processed by the lithography, the resist composition forms a resist pattern having a very high resolution and good mask fidelity.

    摘要翻译： 提供了一种正性抗蚀剂组合物，其包含酸产生剂，在酸的作用下产生树脂增溶基团的树脂组分，使得树脂组分变得可溶于碱性显影剂，至少一些树脂增溶基团为羧基， 用于活化或缩合羧基的化合物。 当通过光刻处理时，抗蚀剂组合物形成具有非常高的分辨率和良好的掩模保真度的抗蚀剂图案。