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1.发明授权Nitrogen-containing organic compound, resist composition and patterning process 有权含氮有机化合物，抗蚀剂组合物和图案化工艺公开(公告)号：US07629108B2
公开(公告)日：2009-12-08
申请号：US11976426
申请日：2007-10-24
CPC分类号： G03F7/0392 , C07D233/60 , C07D235/06 , C07D295/088 , G03F7/0045 , G03F7/0382
摘要： A resist composition comprising as a quencher a nitrogen-containing organic compound bearing a nitrogen-containing heterocycle and having a molecular weight of at least 380 exhibits a high resolution and satisfactory mask coverage dependence and is useful in microfabrication using electron beam or deep-UV.
摘要翻译： 包含作为猝灭剂的带有含氮杂环并且分子量至少为380的含氮有机化合物的抗蚀剂组合物显示出高分辨率和令人满意的掩模覆盖度依赖性，并且可用于使用电子束或深UV的微细加工。
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2.发明申请Nitrogen-containing organic compound, resist composition and patterning process 有权含氮有机化合物，抗蚀剂组合物和图案化工艺公开(公告)号：US20080102405A1
公开(公告)日：2008-05-01
申请号：US11976426
申请日：2007-10-24
IPC分类号： G03C1/00 , C07D233/54 , C07D235/04 , G03C5/00 , C07D265/30 , C07D417/02
CPC分类号： G03F7/0392 , C07D233/60 , C07D235/06 , C07D295/088 , G03F7/0045 , G03F7/0382
摘要： A resist composition comprising as a quencher a nitrogen-containing organic compound bearing a nitrogen-containing heterocycle and having a molecular weight of at least 380 exhibits a high resolution and satisfactory mask coverage dependence and is useful in microfabrication using electron beam or deep-UV.
摘要翻译： 包含作为猝灭剂的带有含氮杂环并且分子量至少为380的含氮有机化合物的抗蚀剂组合物显示出高分辨率和令人满意的掩模覆盖度依赖性，并且可用于使用电子束或深UV的微细加工。
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公开(公告)号：US20090202943A1
公开(公告)日：2009-08-13
申请号：US12370652
申请日：2009-02-13
申请人： Youichi Ohsawa , Takeshi Kinsho , Masaki Ohashi , Seiichiro Tachibana , Takeru Watanabe , Jun Hatakeyama
发明人： Youichi Ohsawa , Takeshi Kinsho , Masaki Ohashi , Seiichiro Tachibana , Takeru Watanabe , Jun Hatakeyama
IPC分类号： G03F7/00 , C08F228/02 , C08F24/00
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/143
摘要： A positive resist composition comprises a polymer comprising recurring units having a sulfonium salt incorporated therein as a base resin which becomes soluble in alkaline developer under the action of acid. The polymer generates a strong sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition.
摘要翻译： 正型抗蚀剂组合物包含含有其中掺入其中的锍盐作为基础树脂的重复单元的聚合物，其在酸的作用下变得可溶于碱性显影剂。 聚合物在暴露于高能量辐射时产生强烈的磺酸，以促进抗蚀剂组合物中酸不稳定基团的有效断裂。
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公开(公告)号：US20090061358A1
公开(公告)日：2009-03-05
申请号：US12204685
申请日：2008-09-04
申请人： Masaki OHASHI , Youichi Ohsawa , Takeru Watanabe , Takeshi Kinsho
发明人： Masaki OHASHI , Youichi Ohsawa , Takeru Watanabe , Takeshi Kinsho
CPC分类号： C07J31/006 , C07J41/0055 , C07J43/003 , G03F7/0045 , G03F7/0397 , G03F7/2041 , Y10S430/114
摘要： Photoacid generators generate sulfonic acids of formula (1a) or (1c) upon exposure to high-energy radiation. R1—COOCH(CF3)CF2SO3+H+ (1a) R1—O—COOCH(CF3)CF2SO3−H+ (1c) R1 is a C20-C50 hydrocarbon group having a steroid structure. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.
摘要翻译： 光生酸发生剂在暴露于高能量辐射时产生式（1a）或（1c）的磺酸。 <？in-line-formula description =“In-line formula”end =“lead”？> R1-COOCH（CF3）CF2SO3 + H +（1a）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> R1-O-COOCH（CF3）CF2SO3-H +（1c） =“内联式”末端=“尾”→R1是具有类固醇结构的C20-C50烃基。 光致酸产生剂与树脂相容并且可以控制酸扩散，因此适用于化学增幅抗蚀剂组合物。
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公开(公告)号：US07527912B2
公开(公告)日：2009-05-05
申请号：US11905126
申请日：2007-09-27
申请人： Youichi Ohsawa , Takeru Watanabe , Koji Hasegawa , Masaki Ohashi
发明人： Youichi Ohsawa , Takeru Watanabe , Koji Hasegawa , Masaki Ohashi
IPC分类号： G03F7/004 , G03F7/30 , C07D207/00
CPC分类号： C07D333/46 , C07C309/12 , C07C381/12 , C07D207/408 , C07D209/48 , C07D209/70 , C07D307/93 , C07D491/18 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/70875 , Y10S430/106 , Y10S430/111 , Y10S430/121 , Y10S430/122 , Y10S430/126
摘要： Photoacid generators generate sulfonic acids of formula (1a) upon exposure to high-energy radiation. RC(═O)R1—COOCH(CF3)CF2SO3−H+ (1a) R is hydroxyl, alkyl, aryl, hetero-aryl, alkoxy, aryloxy or hetero-aryloxy, R1 is a divalent organic group which may have a heteroatom (O, N or S) containing substituent, or R1 may form a cyclic structure with R. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.
摘要翻译： 光生酸发生剂在暴露于高能量辐射时产生式（1a）的磺酸。 RC（-O）R1-COOCH（CF3）CF2SO3-H +（1a）<？in-line-formula description =“In-line-formula description =”In-line formula“end =”lead“ R'是羟基，烷基，芳基，杂芳基，烷氧基，芳氧基或杂芳氧基，R 1是可以具有含有杂原子（O，N或S）的二价有机基团 取代基或R1可以与R形成环状结构。光酸产生剂与树脂相容并且可以控制酸扩散，因此适用于化学增强抗蚀剂组合物。
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6.发明申请Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process 有权具有可聚合阴离子的锍盐，聚合物，抗蚀剂组合物和图案化工艺公开(公告)号：US20080102407A1
公开(公告)日：2008-05-01
申请号：US11976564
申请日：2007-10-25
CPC分类号： G03F7/0045 , C08F20/22 , C08F20/38 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/124 , Y10S430/126 , Y10S430/143
摘要： A sulfonium salt having a polymerizable anion generates a strong sulfonic acid upon exposure to high-energy radiation so that it facilitates effective scission of acid labile groups in chemically amplified resist compositions. It is useful as a monomer from which a base resin for use in radiation-sensitive resist compositions is derived.
摘要翻译： 具有可聚合阴离子的锍盐在暴露于高能量辐射下产生强烈的磺酸，从而有助于在化学增强的抗蚀剂组合物中有效地分裂酸不稳定基团。 作为衍生用于辐射敏感性抗蚀剂组合物的基础树脂的单体是有用的。
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公开(公告)号：US20090274978A1
公开(公告)日：2009-11-05
申请号：US12433370
申请日：2009-04-30
申请人： Masaki OHASHI , Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe
发明人： Masaki OHASHI , Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe
CPC分类号： C07J9/00 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/114 , Y10S430/115
摘要： Photoacid generators generate sulfonic acids of formula (1a) or (1b) upon exposure to high-energy radiation. R1—COOCH2CF2SO3−H+ (1a) R1—O—COOCH2CF2SO3−H+ (1b) R1 is a monovalent C20-C50 hydrocarbon group of steroid structure which may contain a heteroatom. The bulky steroid structure ensures adequate control of acid diffusion. The photoacid generators are compatible with resins and suited for use in chemically amplified resist compositions.
摘要翻译： 光生酸发生剂在暴露于高能量辐射时产生式（1a）或（1b）的磺酸。 R1-COOCH2CF2SO3-H +（1a）R1-O-COOCH2CF2SO3-H +（1b）R1是可以含有杂原子的类固醇结构的一价C 20 -C 50烃基。 庞大的类固醇结构确保充分控制酸扩散。 光致酸发生器与树脂相容并且适用于化学放大抗蚀剂组合物。
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8.发明申请公开(公告)号：US20080085469A1
公开(公告)日：2008-04-10
申请号：US11905126
申请日：2007-09-27
申请人： Youichi Ohsawa , Takeru Watanabe , Koji Hasegawa , Masaki Ohashi
发明人： Youichi Ohsawa , Takeru Watanabe , Koji Hasegawa , Masaki Ohashi
IPC分类号： G03G13/06 , C07C69/74 , C07D207/40 , C07D209/48 , C07D209/80 , C07D209/90 , C07D221/14 , C07D491/08 , G03C1/73
CPC分类号： C07D333/46 , C07C309/12 , C07C381/12 , C07D207/408 , C07D209/48 , C07D209/70 , C07D307/93 , C07D491/18 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/70875 , Y10S430/106 , Y10S430/111 , Y10S430/121 , Y10S430/122 , Y10S430/126
摘要： Photoacid generators generate sulfonic acids of formula (1a) upon exposure to high-energy radiation. RC(═O)R1—COOCH(CF3)CF2SO3−H+ (1a) R is hydroxyl, alkyl, aryl, hetero-aryl, alkoxy, aryloxy or hetero-aryloxy, R1 is a divalent organic group which may have a heteroatom (O, N or S) containing substituent, or R1 may form a cyclic structure with R. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.
摘要翻译： 光生酸发生剂在暴露于高能量辐射时产生式（1a）的磺酸。 <？in-line-formula description =“在线公式”end =“lead”？> RC（-O）R 1 -COOCH（CF 3 3）CF （1a）<？in-line-formula description =“In-line R“是羟基，烷基，芳基，杂芳基，烷氧基，芳氧基或杂芳氧基，R 1是可以具有杂原子的二价有机基团（O ，N或S）或R 1可以与R形成环状结构。光酸产生剂与树脂相容并且可以控制酸扩散，因此适用于化学增强抗蚀剂组合物。
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9.发明授权Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom 有权2,2-双（氟烷基）环氧乙烷的制备及其制备光致酸产生剂公开(公告)号：US08686166B2
公开(公告)日：2014-04-01
申请号：US13526569
申请日：2012-06-19
IPC分类号： C07D301/27 , C07D301/02 , C07C69/74 , C07C309/00
CPC分类号： C07D301/24 , C07C303/32 , C07C381/12 , C07C2603/74 , C07D303/08 , C07C309/08 , C07C309/12
摘要： A 2,2-bis(fluoroalkyl)oxirane (A) is prepared by reacting a fluorinated alcohol (1) with a chlorinating, brominating or sulfonylating agent under basic conditions to form an oxirane precursor (2) and subjecting the oxirane precursor to ring closure under basic conditions. R1 and R2 are fluoroalkyl groups, R3 and R4 are hydrogen or monovalent hydrocarbon groups, X is chlorine, bromine or —OSO2R5 group, and R5 is alkyl or aryl.
摘要翻译： 通过在碱性条件下使氟化醇（1）与氯化，溴化或磺酰化剂反应以形成环氧乙烷前体（2）并使环氧乙烷前体环闭合来制备2,2-双（氟烷基）环氧乙烷（A） 在基本条件下 R1和R2是氟烷基，R3和R4是氢或一价烃基，X是氯，溴或-OSO2R5基，R5是烷基或芳基。
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公开(公告)号：US08609889B2
公开(公告)日：2013-12-17
申请号：US12828557
申请日：2010-07-01
申请人： Masaki Ohashi , Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe
发明人： Masaki Ohashi , Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe
IPC分类号： G03F7/028 , G03F7/26 , C07C309/06 , C07C309/07
CPC分类号： C07C309/12 , C07C381/12 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： The photoacid generator produces a sulfonic acid which has a bulky cyclic structure in the sulfonate moiety and a straight-chain hydrocarbon group and thus shows a controlled acid diffusion behavior and an adequate mobility. The PAG is fully compatible with a resin to form a resist composition which performs well during the device fabrication process and solves the problems of resolution, LWR, and exposure latitude.
摘要翻译： 光致酸发生剂产生在磺酸盐部分中具有大体积的环状结构的磺酸和直链烃基，因此显示受控的酸扩散行为和适当的迁移率。 PAG与树脂完全兼容以形成在器件制造过程中表现良好的抗蚀剂组合物，并解决了分辨率，LWR和曝光宽容度的问题。
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