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公开(公告)号:US06855477B2
公开(公告)日:2005-02-15
申请号:US10256141
申请日:2002-09-27
申请人: Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Haruhiko Komoriya , Kazuhiko Maeda
发明人: Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Haruhiko Komoriya , Kazuhiko Maeda
CPC分类号: G03F7/0045 , G03F7/0046 , G03F7/0392
摘要: A chemically amplified resist composition comprising (A) a polymer comprising recurring units containing at least one fluorine atom, (B) a compound of formula (1) wherein R1 and R2 are H, F or alkyl or fluorinated alkyl, at least one of R1 and R2 contains at least one fluorine atom, R3 is a single bond or alkylene, R4 is a n-valent aromatic or cyclic diene group, R5 is H or C(═O)R6, R6 is H or methyl, and n is 2, 3 or 4, (C) an organic solvent, and (D) a photoacid generator is sensitive to high-energy radiation and has improved sensitivity and transparency at a wavelength of less than 200 nm.
摘要翻译: 一种化学放大抗蚀剂组合物,其包含(A)包含含有至少一个氟原子的重复单元的聚合物,(B)式(1)的化合物,其中R 1和R 2为H,F或烷基或氟化烷基 ,R 1和R 2中的至少一个含有至少一个氟原子,R 3是单键或亚烷基,R 4是n价的芳族或环状二烯基,R 5 >为H或C(= O)R 6,R 6为H或甲基,n为2,3或4,(C)有机溶剂,(D)光致酸发生剂对高 能量辐射,并且在小于200nm的波长下具有改善的灵敏度和透明度。
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公开(公告)号:US07169869B2
公开(公告)日:2007-01-30
申请号:US11179606
申请日:2005-07-13
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号: C08F12/30
CPC分类号: C08F28/02 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.
摘要翻译: 包含具有氟化亲水基团的乙烯基磺酸酯单元作为基础树脂的聚合物的抗蚀剂组合物具有优异的透明性,底物粘合性和显影剂渗透性以及耐等离子体耐蚀刻性,并且适用于光刻微处理。
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公开(公告)号:US20050267275A1
公开(公告)日:2005-12-01
申请号:US11179606
申请日:2005-07-13
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号: C08F28/02 , C08F212/14 , C08F220/12 , C08F232/00 , G03F7/004 , G03F7/039 , H01L21/027 , C08F12/30
CPC分类号: C08F28/02 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.
摘要翻译: 包含具有氟化亲水基团的乙烯基磺酸酯单元作为基础树脂的聚合物的抗蚀剂组合物具有优异的透明性,底物粘合性和显影剂渗透性以及耐等离子体耐蚀刻性,并且适用于光刻微处理。
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公开(公告)号:US06824955B2
公开(公告)日:2004-11-30
申请号:US10328007
申请日:2002-12-26
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号: G03C1492
CPC分类号: G03F7/0046 , G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要: A resist composition comprising a copolymer of an acrylic ester monomer containing fluorine at &agr;-position with a norbornene derivative containing oxygen or sulfur within the norbornene ring as a base resin is sensitive to high-nergy radiation below 200 nm, has excellent sensitivity, transparency and dry etching resistance, and is suited for lithographic microprocessing.
摘要翻译: 包含α位上含氟的丙烯酸酯单体与在降冰片烯环内含有氧或硫的降冰片烯衍生物作为基础树脂的共聚物的抗蚀剂组合物对于200nm以下的高能量辐射敏感,具有优异的灵敏度,透明度和 干蚀刻电阻,适用于光刻微处理。
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公开(公告)号:US06603037B2
公开(公告)日:2003-08-05
申请号:US10305085
申请日:2002-11-27
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号: C07C6962
CPC分类号: G03F7/0397 , C07C67/10 , C07C69/653 , C07C2601/14 , C07C2602/28 , C07C2602/42 , C07C2603/74 , C07C2603/86 , C08F20/28
摘要: Acrylic esters containing fluorine at &agr;-position and having an alkoxymethyl group introduced into the ester side chain thereof are novel. Polymers obtained from the acrylic esters are improved in transparency, acid elimination and substrate adhesion and are used to formulate chemically amplified resist compositions for lithographic microfabrication.
摘要翻译: 在α-位上含有氟并具有引入其酯侧链的烷氧基甲基的丙烯酸酯是新颖的。 从丙烯酸酯获得的聚合物在透明度,酸消除和底物粘附性方面得到改进,并且用于制备用于光刻微细加工的化学放大抗蚀剂组合物。
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公开(公告)号:US06946235B2
公开(公告)日:2005-09-20
申请号:US10636692
申请日:2003-08-08
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号: C08F28/02 , C08F212/14 , C08F220/12 , C08F232/00 , G03F7/004 , G03F7/039 , H01L21/027 , G03C1/492
CPC分类号: C08F28/02 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.
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公开(公告)号:US06916592B2
公开(公告)日:2005-07-12
申请号:US10395268
申请日:2003-03-25
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号: C07C309/67 , G03F7/004 , G03F7/039 , C08F12/30 , C08F114/18 , G03F7/30 , G03F7/38
CPC分类号: C07C309/67 , C07C2603/68 , G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111 , Y10S430/115
摘要: A resist composition comprising a base polymer having a fluorinated sulfonate or fluorinated sulfone introduced therein is sensitive to high-energy radiation, has excellent transparency, contrast and adherence, and is suited for lithographic microprocessing.
摘要翻译: 包含其中引入氟化磺酸盐或氟化砜的基础聚合物的抗蚀剂组合物对高能辐射敏感,具有优异的透明度,对比度和粘附性,并且适用于光刻微处理。
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公开(公告)号:US06872514B2
公开(公告)日:2005-03-29
申请号:US10395256
申请日:2003-03-25
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
CPC分类号: G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , Y10S430/106 , Y10S430/108 , Y10S430/111 , Y10S430/115
摘要: A resist composition comprising a base polymer having a fluorinated sulfonate or fluorinated sulfone introduced therein is sensitive to high-energy radiation below 300 nm, has excellent transparency, contrast and adherence, and is suited for lithographic microprocessing.
摘要翻译: 包含其中引入氟化磺酸盐或氟化砜的基础聚合物的抗蚀剂组合物对于300nm以下的高能辐射敏感,具有优异的透明度,对比度和粘附性,并且适用于光刻微处理。
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公开(公告)号:US07378218B2
公开(公告)日:2008-05-27
申请号:US11345325
申请日:2006-02-02
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
CPC分类号: G03F7/0046 , C08F220/18 , C08F220/24 , C08F220/26 , C08F220/28 , C08F232/08 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要: A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1, and 0
摘要翻译: 提供了包含式(1a)至(1d)的重复单元并且Mw为1,000-500,000的含氟聚合物。 R 1是酸不稳定基团,R 2是单键或亚甲基,a1,a2,a3和a4是大于0至小于1的数, 并且0
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公开(公告)号:US20060269871A1
公开(公告)日:2006-11-30
申请号:US11440126
申请日:2006-05-25
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
IPC分类号: G03C1/00
CPC分类号: G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要: A polymer comprising recurring units of formula (1) wherein R1 is F or fluoroalkyl, R2 is alkylene or fluoroalkylene, and R3 is an acid labile group and having a Mw of 1,000-500,000 is used to formulate a resist composition, which is processed by the lithography involving ArF exposure and offers many advantages including resolution, minimal line edge roughness, etch resistance, and minimal surface roughness after etching. The composition performs well when processed by the ArF immersion lithography with liquid interposed between the projection lens and the wafer.
摘要翻译: 包含式(1)的重复单元的聚合物,其中R 1是F或氟代烷基,R 2是亚烷基或氟代亚烷基,R 3是 使用Mw为1,000-500,000的酸不稳定基团来配制抗蚀剂组合物,其通过涉及ArF曝光的光刻进行处理,并提供许多优点,包括分辨率,最小线边缘粗糙度,耐蚀刻性和蚀刻后的最小表面粗糙度 。 当通过ArF浸没式光刻法处理介于投影透镜和晶片之间的液体时,组合物表现良好。
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