摘要:
Disclosed is an Al alloy reflective film which has a higher reflectance than that of pure Al films when produced by sputtering, excels in alkali resistance, acid resistance, and moisture resistance, and therefore less suffers from the reduction in reflectance even when a protective coating is not applied. Specifically disclosed is an Al alloy reflective film which contains at least one element selected from Sc, Y, La, Gd, Tb, and Lu in a total amount of from 0.4 to 2.5 atomic percent, with the remainder being Al and inevitable impurities. The Al alloy reflective film has a film surface roughness of 4 nm or less as measured with an atomic force microscope. Also disclosed are an automotive lighting device and an illumination device each provided with the reflective film. Further disclosed is an Al alloy sputtering target for use in the formation of the reflective film.
摘要:
Provided is an Al alloy reflective film which does not require a protective film in that it has excellent alkali resistance (resistance to alkali corrosion), acid resistance (resistance to acid corrosion) and humidity resistance (resistance to a high-temperature, humid environment) even if there is no protective film, and which contains 2.5 to 20 at % of at least one element selected from Gd, La, Y, Sc, Tb, Lu, Pr, Nd, Pm, Ce, Dy, Ho, Er, and Tm, with the balance being Al and inevitable impurities. Also provided are an automobile light, illuminator, and ornamentation having such an Al alloy reflective film. Further provided is an Al alloy sputtering target, which is for forming such an Al alloy reflective film and which contains 2.5 to 35 at % of at least one element selected from Gd, La, Y, Sc, Tb, Lu, Pr, Nd, Pm, Ce, Dy, Ho, Er, and Tm, with the balance being Al and inevitable impurities.
摘要:
Disclosed are a separator for a fuel cell realizing both the high electrical conductivity and the corrosion resistance and enabling using stably for a long period of time in the fuel cell and a manufacturing method for it. The separator for a fuel cell 1 includes a substrate 2 composed of pure aluminum or aluminum alloy and a plating layer 3 formed on the substrate 2, wherein the plating layer 3 has a copper layer 3a formed in the substrate 2 side and a tin layer 3b formed on the copper layer 3a, the tin layer 3b is formed in an uppermost layer, the thickness of the copper layer 3a is 0.10 μm or above, and the value obtained by dividing the thickness of the tin layer 3b by the thickness of the copper layer 3a is 0.1-50.
摘要:
A reflective film laminate is provided with high productivity and at low cost in which a protective film with minimized pinholes is provided to improve the alkali resistance and warm water resistance of the reflective film laminate including a pure Al film or an Al-based alloy film so that a reflectivity reduction resulting from the elution or oxidization of the Al film in an alkaline or warm water environment is less likely to occur. The reflective film laminate of the present invention includes, over a substrate, a pure Al film or an Al-based alloy film as a first layer, and an oxide film of a metal containing one or more elements selected from the group consisting of Zr, Cr, Y, Nb, Hf, Ta, W, Ti, Si, and Mo as a second layer over the first layer. The thickness of the second layer is 0.1 to 10 nm.
摘要:
Disclosed is a reflective film laminate, which has a pure Ag film or an Ag-based alloy film as a first layer on a base body, and an oxide film of a metal of one or more kinds selected from among Zr, Cr, Nb, Hf, Ta, V, Ni, Mo, W, Al and Si, as a second layer on the first layer. The thickness of the second layer is 0.1 to 10 nm, and deterioration of the reflection ratio of reflective film laminate is 30% or less by having the second layer provided therein. The reflective film laminate is provided with a protection film, which has a high initial reflection ratio, excellent sulfuration resistance and heat resistance, and an extremely small number of pin holes. As a result, the reflection ratio of the reflective film laminate is not easily deteriorated due to aggregation of Ag atoms of the Ag film.
摘要:
A reflective film laminate is provided with high productivity and at low cost in which a protective film with minimized pinholes is provided to improve the alkali resistance and warm water resistance of the reflective film laminate including a pure Al film or an Al-based alloy film so that a reflectivity reduction resulting from the elution or oxidization of the Al film in an alkaline or warm water environment is less likely to occur. The reflective film laminate of the present invention includes, over a substrate, a pure Al film or an Al-based alloy film as a first layer, and an oxide film of a metal containing one or more elements selected from the group consisting of Zr, Cr, Y, Nb, Hf, Ta, W, Ti, Si, and Mo as a second layer over the first layer. The thickness of the second layer is 0.1 to 10 nm.
摘要:
It is an object of the present invention to provide a titanium electrode material which is low in cost and is excellent in electric conductivity, corrosion resistance and hydrogen absorption resistance, and a surface treatment method of a titanium electrode material. A titanium electrode material includes: on the surface of a titanium material including pure titanium or a titanium alloy, a titanium oxide layer having a thickness of 3 nm or more and 75 nm or less, and having an atomic concentration ratio of oxygen and titanium (O/Ti) at a site having the maximum oxygen concentration in the layer of 0.3 or more and 1.7 or less; and an alloy layer including at least one noble metal selected from Au, Pt, and Pd, and at least one non-noble metal selected from Zr, Nb, Ta, and Hf, having a content ratio of the noble metal and the non-noble metal of 35:65 to 95:5 by atomic ratio, and having a thickness of 2 nm or more, on the titanium oxide layer. The surface treatment method of a titanium electrode material includes a titanium oxide layer formation step, an alloy layer formation step, and a heat treatment step.
摘要翻译:本发明的目的是提供一种成本低且导电性,耐腐蚀性和耐氢吸收性优异的钛电极材料以及钛电极材料的表面处理方法。 钛电极材料包括:在包括纯钛或钛合金的钛材料的表面上,具有3nm以上且75nm以下的氧化钛层,并且具有氧和钛的原子浓度比( O / Ti)在层中的最大氧浓度为0.3以上且1.7以下的部位; 以及包含选自Au,Pt和Pd中的至少一种贵金属和选自Zr,Nb,Ta和Hf中的至少一种非贵金属的合金层,其具有贵金属和非金属的含量比, 在氧化钛层上的原子比为35:65〜95:5的贵金属,厚度为2nm以上。 钛电极材料的表面处理方法包括氧化钛层形成步骤,合金层形成步骤和热处理步骤。
摘要:
Disclosed herein is a surface treatment method of a titanium material for electrodes characterized by including: a titanium oxide layer formation step S1 of forming a titanium oxide layer with a thickness of 10 nm or more and 80 nm or less on the surface of a titanium material including pure titanium or a titanium alloy; a noble metal layer formation step S2 of forming a noble metal layer with a thickness of 2 nm or more including at least one noble metal selected from Au, Pt, and Pd on the titanium oxide layer by a PVD method; and a heat treatment step S3 of heat treating the titanium material having the noble metal layer formed thereon at a temperature of 300° C. or more and 800° C. or less.
摘要:
The present invention concerns an alloy film for a metal separator for a fuel cell characterized by containing at least one noble metal element selected from Au and Pt and at least one non-noble metal element selected from the group consisting of Ti, Zr, Nb, Hf, and Ta, at a content ratio of noble metal element/non-noble metal element of 35/65 to 95/5, and having a film thickness of 2 nm or more. The present invention also relates to a manufacturing method of an alloy film for the metal separator for the fuel cell and a target material for sputtering, as well as the metal separator and the fuel sell. The alloy film for the metal separator for the fuel cell according to the invention is excellent in the corrosion resistance, has low contact resistance, can maintain the low contact resistance for a long time even in a corrosive environment, and is excellent further in the productivity.
摘要:
Disclosed is a reflecting film comprising: an Ag or Ag-base alloy thin film of an Ag-base alloy containing at least one element among Au, Pt, Pd, Bi, and rare-earth elements as a first layer; a film of an oxide or oxynitride of at least one element among Si, Al and Ti having a thickness between 5 and 50 nm as a second layer deposited on the first layer; and a film having a thickness between 10 and 100 nm formed by a plasma polymerization process as a third layer deposited on the second layer.