摘要:
An apparatus and method for encoding/decoding a multi-channel signal may be provided. The apparatus of encoding a multi-channel signal may insert information about whether to encode a phase parameter indicating phase information of a plurality of channels, included in the multi-channel signal, in a bitstream of the multi-channel signal. The apparatus of decoding a multi-channel signal may determine whether to up-mix a mono signal using the phase parameter based on the information about whether to encode.
摘要:
Disclosed is an apparatus for encoding and decoding a multi-channel audio signal. The apparatus for encoding the multi-channel audio signal groups channels of a multi-channel audio signal, eliminates redundant information between channels using a mixing matrix including phase information, converts a frequency of the signal, and encodes the signal.
摘要:
A method and apparatus of effectively encoding and decoding a high-frequency signal of a multi-channel audio are provided. A multi-channel audio decoding apparatus may down-mix a multi-channel audio input signal, expand a number of channels of the down-mixed signal, select at least one of the expanded channel signal, extract a parameter indicating a characteristic relation between the selected signal and the multi-channel audio input signal, and encode the down-mixed signal and the extracted parameter.
摘要:
An apparatus for encoding/decoding a multichannel signal. The apparatus for encoding/decoding a multichannel signal processes phase parameters for phase information among a plurality of channels constituting the multichannel signal in consideration of the characteristics of the multichannel signal. The apparatus generates an encoded bit stream for the multichannel signal using the processed phase parameters and the mono signal extracted from the multichannel signal.
摘要:
Disclosed are lateral double diffused metal oxide semiconductor (LDMOS) transistors having a uniform threshold voltage and methods for manufacturing the same. The methods include forming a polysilicon layer over the semiconductor substrate including a shallow trench isolation region, etching a portion of the polysilicon layer over an active region, implanting first conductive-type impurity ions using the polysilicon layer as a mask to form a first conductive-type body region, implanting second conductive-type impurity ions using the polysilicon layer as a mask to form a second conductive-type channel region in the first conductive-type body region, removing the polysilicon layer, forming gate electrodes in the polysilicon-free region, and forming a source region and a drain region in the first conductive-type body region using the gate electrode and the shallow trench isolation as ion-implantation masks.
摘要:
A hardmask composition for forming a resist underlayer film, a process for producing a semiconductor integrated circuit device, and a semiconductor integrated circuit device, the hardmask composition including an organosilane polymer, and a stabilizer, the stabilizer including one of acetic anhydride, methyl acetoacetate, propionic anhydride, ethyl-2-ethylacetoacetate, butyric anhydride, ethyl-2-ethylacetoacetate, valeric anhydride, 2-methylbutyric anhydride, nonanol, decanol, undecanol, dodecanol, propylene glycol propyl ether, propylene glycol ethyl ether, propylene glycol methyl ether, propylene glycol, phenyltrimethoxysilane, diphenylhexamethoxydisiloxane, diphenylhexaethoxydisiloxane, dioctyltetramethyldisiloxane, hexamethyltrisiloxane, tetramethyldisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, hexamethyldisiloxane, and mixtures thereof.