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    Reticle defect inspection apparatus and reticle defect inspection method
    4.
    发明授权
    Reticle defect inspection apparatus and reticle defect inspection method 有权
    光罩缺陷检查装置和掩模版缺陷检查方法

    公开(公告)号：US07911599B2

    公开(公告)日：2011-03-22

    申请号：US12047554

    申请日：2008-03-13

    申请人： Toshiyuki Watanabe ,  Riki Ogawa

    发明人： Toshiyuki Watanabe ,  Riki Ogawa

    IPC分类号： G01N21/00 ,  G01N21/88

    CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G03F1/84

    摘要： A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample.

    摘要翻译： 提供了能够进行高检测灵敏度的缺陷检查的掩模版缺陷检查装置。 该装置包括用于利用第一检查光照射样品的一个表面的透射照明的光学系统，用第二检查光照射样品的另一个表面的反射照明的光学系统，以及可以同时检测的检测光学系统 通过第一检查光通过样品而获得的透射光和由第二检查光获得的反射光被样品反射。 并且透射照明的光学系统包括用于校正由样品的厚度产生的透射光的焦点偏移的聚焦透镜驱动机构。

    Mask-defect inspecting apparatus with movable focusing lens
    5.
    发明授权
    Mask-defect inspecting apparatus with movable focusing lens 有权
    具有可移动聚焦透镜的掩模缺陷检测设备

    公开(公告)号：US07760349B2

    公开(公告)日：2010-07-20

    申请号：US11083323

    申请日：2005-03-18

    申请人： Akihiko Sekine ,  Ikunao Isomura ,  Toshiyuki Watanabe ,  Shinji Sugihara ,  Riki Ogawa

    发明人： Akihiko Sekine ,  Ikunao Isomura ,  Toshiyuki Watanabe ,  Shinji Sugihara ,  Riki Ogawa

    IPC分类号： G01N21/00

    CPC分类号： G01N21/956

    摘要： A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (18a, 20a) for adjusting an angle of an aperture.

    摘要翻译： 一种掩模缺陷检查装置，包括：多个照明光学系统（2），用于照射形成有图案（6）的掩模（4）上的不同区域（14a，14b）;物镜（OL） 所述掩模和至少一对检测光学系统（15,16），每个具有检测传感器（17,19）以形成所述图案的图像并且用于通过所述物镜接收来自每个所述不同区域的照明光， 每个检测光学系统具有用于调整孔的角度的机构（18a，20a）。

    IMAGE FORMING APPARATUS
    6.
    发明申请
    IMAGE FORMING APPARATUS 有权
    图像形成装置

    公开(公告)号：US20100098457A1

    公开(公告)日：2010-04-22

    申请号：US12580421

    申请日：2009-10-16

    申请人： Toshiyuki Watanabe

    发明人： Toshiyuki Watanabe

    IPC分类号： G03G21/16

    CPC分类号： G03G21/1853 ,  G03G21/1647 ,  G03G2221/1684

    摘要： An image forming apparatus for forming an image on a recording material includes a cartridge, a main assembly including a positioner positioning the cartridge and an urger urging the cartridge to the positioner, a mover supporting the cartridge and movable between a pulled out position outside of the main assembly and an inside position inside the main assembly, and a gripper mounted to the mover and movable between a reference position and an outward position located outwardly with respect to the pull out direction of the mover. When the mover is at the inside position, the cartridge is positioned to the positioner by the urger to be placed in a positioning state when the gripper is at the reference position and the positioning state of the cartridge is released by moving the gripper from the reference position to the outward position.

    摘要翻译： 用于在记录材料上形成图像的图像形成装置包括：盒，主组件，其包括定位盒定位器和将盒推送到定位器的推动器;支撑盒的移动器， 主组件和主组件内部的内部位置，以及安装到移动器上并可在参考位置和相对于移动器的拉出方向向外定位的向外位置之间移动的夹具。 当移动器位于内部位置时，当夹持器处于基准位置时，墨盒定位在定位器上，以便在夹持器处于基准位置时被放置在定位状态，并且通过从夹持器移动夹具来释放墨盒的定位状态 位置向外位置。

    PATTERN INSPECTION APPARATUS
    7.
    发明申请
    PATTERN INSPECTION APPARATUS 有权
    图案检查装置

    公开(公告)号：US20080166054A1

    公开(公告)日：2008-07-10

    申请号：US12040541

    申请日：2008-02-29

    申请人： Hideo Tsuchiya ,  Kyoji Yamashita ,  Toshiyuki Watanabe ,  Ikunao Isomura ,  Toru Tojo ,  Yasushi Sanada

    发明人： Hideo Tsuchiya ,  Kyoji Yamashita ,  Toshiyuki Watanabe ,  Ikunao Isomura ,  Toru Tojo ,  Yasushi Sanada

    IPC分类号： G06K9/46

    CPC分类号： G06T7/0004 ,  G06T2207/30148

    摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.

    摘要翻译： 图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合， 芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。 计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动取出模具数据的检查区域， 对比方法。

    Silicon alloy, alloy powder thereof, manufacturing apparatus, manufacturing process and sintered alloy thereof
    8.
    发明申请
    Silicon alloy, alloy powder thereof, manufacturing apparatus, manufacturing process and sintered alloy thereof 审中-公开
    硅合金，其合金粉末，制造装置，制造工艺及其烧结合金

    公开(公告)号：US20080159905A1

    公开(公告)日：2008-07-03

    申请号：US11788243

    申请日：2007-04-19

    申请人： Toshiyuki Watanabe ,  Masafumi Matsushita ,  Toshitaka Sakurai ,  Kazuya Sato ,  Yoko Matsushita

    发明人： Toshiyuki Watanabe ,  Masafumi Matsushita ,  Toshitaka Sakurai ,  Kazuya Sato ,  Yoko Matsushita

    IPC分类号： C22C30/00 ,  B22F1/00 ,  C21D11/00

    CPC分类号： C22C30/00 ,  B22F3/23 ,  C21D11/00

    摘要： A controlled combustion synthesis apparatus comprises an ignition system, a pressure sensor for detecting internal pressure, a nitrogen supply, a gas pressure control valve for feeding nitrogen and exhausting reaction gas, means for detecting the internal temperature of the reaction container, a water cooled jacket, and a cooling plate. A temperature control system controls the temperature of the reaction container by controlling the flow of cooling water supplied to the jacket and the cooling plate in response to the detected temperature. By combustion synthesizing, while controlling the internal pressure and temperature, the apparatus can synthesize a silicon alloy including 30-70 wt. % silicon, 10-45 wt. % nitrogen, 1-40 wt. % aluminum, and 1-40 wt % oxygen.

    摘要翻译： 控制燃烧合成装置包括点火系统，用于检测内部压力的压力传感器，氮气供应，用于输入氮气和排出反应气体的气体压力控制阀，用于检测反应容器的内部温度的装置，水冷套管 ，和冷却板。 温度控制系统通过响应于检测到的温度控制供给到护套和冷却板的冷却水的流量来控制反应容器的温度。 通过燃烧合成，在控制内部压力和温度的同时，该装置可以合成包含30-70wt。 ％硅，10-45wt。 ％氮，1-40重量％ ％铝和1-40重量％的氧。

    PATTERN INSPECTION METHOD
    9.
    发明申请
    PATTERN INSPECTION METHOD 有权
    模式检验方法

    公开(公告)号：US20080151230A1

    公开(公告)日：2008-06-26

    申请号：US12033599

    申请日：2008-02-19

    申请人： Toru Tojo ,  Toshiyuki Watanabe ,  Ikunao Isomura ,  Akihiko Sekine

    发明人： Toru Tojo ,  Toshiyuki Watanabe ,  Ikunao Isomura ,  Akihiko Sekine

    IPC分类号： G01N21/00

    CPC分类号： G01N21/956

    摘要： A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.

    摘要翻译： 图案检查装置包括将预定波长的第一检查光施加到与基板的图案形成表面相对的表面的照明光学器件以及其波长等于第一检查光的波长与图案的第二检查光 形成表面，检测器，通过照射第一检查光和通过照射第二检查光的来自基板的反射光独立地检测来自基板的透射光;以及空间分离机构，设置在光学焦平面附近，朝向 图案形成表面，并且在空间上分离第一和第二检查光的照射区域，使得来自基板的透射和反射光成像在在光学焦平面上分离的两个离散区域中。