Triazole derivatives and organic electroluminescent devices produced
therefrom
    1.
    发明授权
    Triazole derivatives and organic electroluminescent devices produced therefrom 失效
    由其制备的三唑衍生物和有机电致发光器件

    公开(公告)号:US5792567A

    公开(公告)日:1998-08-11

    申请号:US545798

    申请日:1996-02-07

    摘要: The triazole derivatives of this invention are expressed by the general formula (1). The organic electroluminescent device of this invention have a layer containing at least one triazole derivative of the general formulas (1) and (2). Such triazole derivatives are excellent in electron-transport efficiency, hole-blocking properties and heat resistance, and such organic electroluminescent devices are excellent in luminous efficiency, luminance and stability. ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9 and R.sup.10 have the same meanings as indicated in the specification.

    摘要翻译: PCT No.PCT / JP95 / 00440 Sec。 371日期:1995年2月7日 102(e)1995年2月7日PCT PCT 1995年3月15日PCT公布。 出版物WO95 / 25097 日期1995年9月21日本发明的三唑衍生物由通式(1)表示。 本发明的有机电致发光器件具有含有至少一种通式(1)和(2)的三唑衍生物的层。 这种三唑衍生物的电子传输效率,空穴阻挡性和耐热性优异,这种有机电致发光器件的发光效率,亮度和稳定性都优异。 (1)其中R1,R2,R3,R4,R5,R6,R7,R8,R9和R10具有与说明书中所示相同的含义。

    Compound semiconductor wafer and manufacturing method thereof
    3.
    发明授权
    Compound semiconductor wafer and manufacturing method thereof 失效
    复合半导体晶片及其制造方法

    公开(公告)号:US07307290B2

    公开(公告)日:2007-12-11

    申请号:US10514973

    申请日:2004-04-13

    IPC分类号: H01L29/732

    摘要: A compound semiconductor wafer providing an InGaAs light receiving layer having superior crystal characteristic suitable for a near-infrared sensor includes an InAsxP1-x graded buffer layer consisting of a plurality of layers positioned on an InP substrate and an InAsyP1-y buffer layer positioned on the graded buffer layer, sandwiched between said InP substrate and the InGaAs layer, wherein maximum value of PL light emission intensity at an interface of each of the layers of the graded buffer layer and the buffer layer is, at every interface, smaller than 3/10 of the maximum PL light emission intensity of the buffer layer.

    摘要翻译: 提供具有适合于近红外传感器的优异晶体特性的InGaAs光接收层的化合物半导体晶片包括由多个元件组成的InAs×1×1×1×××××梯度缓冲层 位于InP衬底上的层和位于渐变缓冲层上的InAs / SubPl-1-y +缓冲层,夹在所述InP衬底和InGaAs层之间,其中最大 在渐变缓冲层和缓冲层的每个层的界面处的PL发光强度的值在每个界面处小于缓冲层的最大PL发光强度的3/10。