公开(公告)号：US20090130458A1

公开(公告)日：2009-05-21

申请号：US12359530

申请日：2009-01-26

申请人： K. Scott Weil ,  Lawrence A. Chick ,  Christopher A. Coyle ,  John S. Hardy ,  Guanguang Xia ,  Kerry D. Meinhardt ,  Vincent L. Sprenkle ,  Dean M. Paxton

发明人： K. Scott Weil ,  Lawrence A. Chick ,  Christopher A. Coyle ,  John S. Hardy ,  Guanguang Xia ,  Kerry D. Meinhardt ,  Vincent L. Sprenkle ,  Dean M. Paxton

IPC分类号： B32B15/04 ,  C03C27/02

CPC分类号： H01J49/025 ,  B32B2311/22 ,  B32B2311/30 ,  C04B35/01 ,  C04B35/013 ,  C04B37/023 ,  C04B37/025 ,  C04B2235/3246 ,  C04B2235/3279 ,  C04B2235/424 ,  C04B2235/6025 ,  C04B2237/10 ,  C04B2237/34 ,  C04B2237/405 ,  C04B2237/406 ,  H01M8/0271 ,  H01M8/0282 ,  H01M8/0286 ,  Y02P70/56 ,  Y10T428/26

摘要： A seal formed between a metal part and a second part that will remain gas tight in high temperature operating environments which experience frequent thermal cycling, which is particularly useful as an insulating joint in solid oxide fuel cells. A first metal part is attached to a reinforcing material. A glass forming material in the positioned in between the first metal part and the second part, and a seal is formed between the first metal part and the second part by heating the glass to a temperature suitable to melt the glass forming materials. The glass encapsulates and bonds at least a portion of the reinforcing material, thereby adding tremendous strength to the overall seal. A ceramic material may be added to the glass forming materials, to assist in forming an insulating barrier between the first metal part and the second part and to regulating the viscosity of the glass during the heating step.

摘要翻译： 形成在金属部件和第二部件之间的密封件，其将在经受频繁热循环的高温操作环境中保持气密，这在固体氧化物燃料电池中作为绝缘接头特别有用。 第一金属部件附接到增强材料。 定位在第一金属部分和第二部分之间的玻璃形成材料，并且通过将玻璃加热到适于熔化玻璃形成材料的温度，在第一金属部分和第二部分之间形成密封。 玻璃封装并粘合至少一部分增强材料，从而为整个密封件增加了巨大的强度。 陶瓷材料可以添加到玻璃形成材料中，以有助于在第一金属部分和第二部分之间形成绝缘屏障，并且在加热步骤期间调节玻璃的粘度。

公开(公告)号：US08012403B2

公开(公告)日：2011-09-06

申请号：US10489924

申请日：2001-09-14

申请人： Jerome C. Birnbaum ,  Glen E. Fryxell ,  Shari Li Xiaohong ,  Christopher A. Coyle ,  Glen C. Dunham ,  Suresh Baskaran ,  Ralph E. Williford

发明人： Jerome C. Birnbaum ,  Glen E. Fryxell ,  Shari Li Xiaohong ,  Christopher A. Coyle ,  Glen C. Dunham ,  Suresh Baskaran ,  Ralph E. Williford

IPC分类号： B28B1/30

CPC分类号： C04B35/62655 ,  B01D67/0048 ,  B01D67/0058 ,  B01D67/0088 ,  B01D67/0093 ,  B01D71/024 ,  B01D2323/18 ,  B01D2323/30 ,  C04B20/0056 ,  C04B35/14 ,  C04B35/16 ,  C04B35/624 ,  C04B38/0022 ,  C04B2111/00482 ,  C04B2111/1025 ,  C04B2235/72 ,  H01L21/31695 ,  C04B38/0051 ,  C04B38/009 ,  C04B38/02 ,  C04B38/10 ,  C04B14/4631

摘要： Porous ceramic and hybrid ceramic films are useful as low dielectric constant interlayers in semiconductor interconnects. (Hybrid ceramic films are defined as films that contain organic and ceramic molecular components in the structure, as, for example, organosilicates). This invention describes the usefulness of humidity treatments (using specific temperature/humidity treatments as illustrative examples) in increasing mechanical integrity of porous dielectric films with minimal detrimental effect on film porosity or dielectric constant and with no adverse impact on film quality. The efficacy of such treatments is illustrated using surfactant-templated mesoporous silicate films as an example. This invention also describes a specific family of additives to be used with highly pure alkali-metal-free ceramic and hybrid precursors for such dielectric films that will enable better control of the film porosity and quality and lower dielectric constants with the required mechanical integrity. The efficacy of such additives is illustrated using surfactant-templated mesoporous silicate films as a model example. The invention should be broadly applicable to any cross-linked ceramic or hybrid ceramic films (including silicate and organosilicate films, and especially highly porous forms of the films for low-dielectric constant applications). The invention has been found to be particularly effective with surfactant-templated silicate films with nanometer-scale porosity. The invention in either embodiment should also be applicable to evaporation-induced formation of other cross-linked shapes such as fibers and powders.

摘要翻译： 多孔陶瓷和混合陶瓷膜可用作半导体互连中的低介电常数中间层。 （混合陶瓷膜被定义为在结构中含有有机和陶瓷分子组分的膜，例如有机硅酸盐）。 本发明描述了在增加多孔电介质膜的机械完整性的情况下，湿度处理（使用特定温度/湿度处理作为说明性实例）的有用性，对膜孔隙率或介电常数具有最小的有害影响，并且对膜质量没有不利影响。 以表面活性剂模板的介孔硅酸盐膜为例说明了这种处理的效果。 本发明还描述了与用于这种介电膜的高纯度无碱金属的陶瓷和混合前体一起使用的特定的添加剂族，其将能够以所需的机械完整性更好地控制膜孔隙率和质量以及更低的介电常数。 作为示例，使用表面活性剂模板的中孔硅酸盐膜来说明这些添加剂的功效。 本发明应广泛适用于任何交联的陶瓷或混合陶瓷膜（包括硅酸盐和有机硅酸盐膜，特别是用于低介电常数应用的膜的高度多孔形式）。 已经发现本发明对于具有纳米级孔隙率的表面活性剂模板化硅酸盐膜是特别有效的。 在任一实施方案中的本发明也应适用于其它交联形状如纤维和粉末的蒸发诱导形成。

公开(公告)号：US20110185899A1

公开(公告)日：2011-08-04

申请号：US12698659

申请日：2010-02-02

申请人： Larry R. Pederson ,  Olga A. Marina ,  Christopher A. Coyle ,  Gregory W. Coffey ,  Edwin C. Thomsen ,  Liyu Li ,  Carolyn N. Cramer ,  Gary L. McVay

发明人： Larry R. Pederson ,  Olga A. Marina ,  Christopher A. Coyle ,  Gregory W. Coffey ,  Edwin C. Thomsen ,  Liyu Li ,  Carolyn N. Cramer ,  Gary L. McVay

IPC分类号： B01D59/26

CPC分类号： C10L3/10 ,  B01D53/02 ,  B01D53/46 ,  B01D2251/304 ,  B01D2251/306 ,  B01D2251/40 ,  B01D2253/11 ,  B01D2257/55 ,  B01D2258/05 ,  C01B2203/0211 ,  C01B2203/0465 ,  C01B2203/1258

摘要： Methods for abatement of antimony-containing, arsenic-containing and/or phosphorous-containing impurities in fuel gas that is derived from a carbonaceous source can include contacting the fuel gas with an absorbent comprising a capture compound. The capture compound has one or more alkali metals, one or more alkaline earth metals, or a combination of one or more alkali and alkaline earth metals. The fuel gas impurities are reacted with the capture compound, which can be used alone or dispersed on the adsorbent, at a temperature greater than or equal to approximately 300° C. to form solid capture products comprising antimony, arsenic, or phosphorous and the alkali or alkaline earth metal.

摘要翻译： 用于减少源自碳质源的燃料气体中含锑，含砷和/或含磷杂质的方法可包括使燃料气体与包含捕获化合物的吸收剂接触。 捕获化合物具有一种或多种碱金属，一种或多种碱土金属或一种或多种碱金属和碱土金属的组合。 燃料气体杂质与可以单独使用或分散在吸附剂上的捕获化合物在大于或等于约300℃的温度下反应，形成包含锑，砷或磷和碱的固体捕获产物 或碱土金属。

公开(公告)号：US06329017B1

公开(公告)日：2001-12-11

申请号：US09413062

申请日：1999-10-04

申请人： Jun Liu ,  Karel Domansky ,  Xiaohong Li ,  Glen E. Fryxell ,  Suresh Baskaran ,  Nathan J. Kohler ,  Suntharampillai Thevuthasan ,  Christopher A. Coyle ,  Jerome C. Birnbaum

发明人： Jun Liu ,  Karel Domansky ,  Xiaohong Li ,  Glen E. Fryxell ,  Suresh Baskaran ,  Nathan J. Kohler ,  Suntharampillai Thevuthasan ,  Christopher A. Coyle ,  Jerome C. Birnbaum

IPC分类号： B05D312

CPC分类号： C01B37/02 ,  H01L21/31695 ,  Y10T428/249969 ,  Y10T428/249972

摘要： The present invention is a mesoporous silica film having a low dielectric constant and method of making having the steps of combining a surfactant in a silica precursor solution, spin-coating a film from this solution mixture, forming a partially hydroxylated mesoporous film, and dehydroxylating the hydroxylated film to obtain the mesoporous film. It is advantageous that the small polyoxyethylene ether surfactants used in spin-coated films as described in the present invention will result in fine pores smaller on average than about 20 nm. The resulting mesoporous film has a dielectric constant less than 3, which is stable in moist air with a specific humidity. The present invention provides a method for superior control of film thickness and thickness uniformity over a coated wafer, and films with low dielectric constant.

摘要翻译： 本发明是具有低介电常数的介孔二氧化硅薄膜及其制造方法，其具有以下步骤：在二氧化硅前体溶液中混合表面活性剂，从该溶液混合物中旋涂薄膜，形成部分羟基化介孔薄膜，并使 羟基化膜得到介孔膜。 在本发明中所述的旋转涂膜中使用的小聚氧乙烯醚表面活性剂的优点是平均产生比20nm小的细孔。 得到的介孔膜的介电常数小于3，在湿度相对湿度的空气中稳定。 本发明提供了一种用于在涂覆的晶片上优良控制膜厚度和厚度均匀性的方法以及具有低介电常数的膜。