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公开(公告)号:US20210167397A1
公开(公告)日:2021-06-03
申请号:US16643773
申请日:2018-08-27
Applicant: KCF Technologies Co., Ltd.
Inventor: Seung Min KIM , An Na LEE
Abstract: The present invention relates to a copper foil current collector having superior adhesion to an active material of a Li secondary battery. The electrolytic copper foil of the present invention having a first surface and a second surface comprises: a first protective layer at the first surface; a second protective layer at the second surface; and a copper film between the first and second protective layers, wherein an oxygen-containing part at the second surface has a thickness (OT) of not less than 1.5 nm. According to the present invention, an electrolytic copper foil current collector for a Li secondary battery, which has low electric resistance and high adhesion to an active material, can be provided.
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公开(公告)号:US20200181790A1
公开(公告)日:2020-06-11
申请号:US16631739
申请日:2018-07-25
Applicant: KCF Technologies Co., Ltd.
Inventor: Shan Hua JIN , An Na LEE , Seung Min KIM
Abstract: Disclosed is a copper foil including a copper layer having a matte surface and a shiny surface, and an anticorrosive layer disposed on the copper layer, wherein the copper foil has a residual stress of 0.5 to 25 Mpa, based on absolute value, and the copper layer has a plurality of crystal planes, wherein a ratio [TCR (220)] of a texture coefficient (TC) of (220) crystal plane of the copper layer to a total of texture coefficients (TC) of (111), (200), (220) and (311) crystal planes of the copper layer is 5 to 30%.
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公开(公告)号:US20190003066A1
公开(公告)日:2019-01-03
申请号:US15999169
申请日:2018-08-17
Applicant: KCF Technologies Co., Ltd.
Inventor: Seung Min KIM , An Na LEE , Ho Gun KIM , Shan Hua JIN
Abstract: Disclosed is a copper foil including a copper layer and an anticorrosive layer disposed on the copper layer, wherein the copper foil has a peak to arithmetic mean roughness (PAR) of 0.8 to 12.5, a tensile strength of 29 to 58 kgf/mm2, and a weight deviation of 3% or less, wherein the PAR is calculated in accordance with the following Equation 1: PAR=Rp/Ra [Equation 1] wherein Rp is a maximum profile peak height and Ra is an arithmetic mean roughness.
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