AMBIPOLAR SEMICONDUCTOR-BASED TRANSISTOR AND METHOD

    公开(公告)号:US20240379833A1

    公开(公告)日:2024-11-14

    申请号:US18691610

    申请日:2022-09-14

    Abstract: An ambipolar, gate all around, semiconductor-based transistor includes a substrate, a first-type channel structure located on the substrate, the first-type channel structure having a gate region, a source region, and a drain region, a second-type material located on all sides of the gate region of the first-type channel structure, but not on the source region and the drain region, a dielectric material fully surrounding the second-type material on all the external surface of the gate region, a gate electrode located on the dielectric material, a source electrode located on the source region, and a drain electrode located on the drain region. The first-type is one of p- or n-type and the second type is another of the p- or n-type.

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