公开(公告)号：US20210294208A1

公开(公告)日：2021-09-23

申请号：US17010350

申请日：2020-09-02

Applicant: KIOXIA CORPORATION

Inventor： Anupam MITRA ,  Masaki MITSUYASU ,  Kazuya FUKUHARA ,  Kazuhiro TAKAHATA ,  Sachiko KOBAYASHI

IPC: G03F7/00 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00 ,  B29C59/02 ,  B29C35/08

Abstract: According to one embodiment, an imprint lithography template comprises a substrate transparent to ultraviolet light. A first mesa region is on the substrate. A surface of the first mesa region includes a pattern region to be pressed into a photocurable resist film. The pattern region having four sides. A second mesa region is also on the substrate. The first mesa region protrudes from a surface of the second mesa region. A blocking film is adjacent to two sides of the four sides pattern region. The two sides to which the blocking film is adjacent are connected to each other at a corner of the pattern region. The blocking film blocks ultraviolet light.

公开(公告)号：US20240094624A1

公开(公告)日：2024-03-21

申请号：US18457983

申请日：2023-08-29

Applicant: Kioxia Corporation

Inventor： Masaki MITSUYASU ,  Ryo OGAWA ,  Anupam MITRA

IPC: G03F1/42 ,  G03F7/00 ,  G03F9/00 ,  H01L21/3213

CPC classification number: G03F1/42 ,  G03F7/0002 ,  G03F9/7073 ,  H01L21/32139

Abstract: According to one embodiment, a pattern formation method includes holding a substrate on a suction chuck that an outer suction region for an outer edge portion of the substrate and an inner suction region for an inner region of the substrate. A partial shot region at an outer edge of the substrate has a first alignment mark in the inner region and a second alignment mark at the outer edge portion. While a template is being pressed against a resin film in the shot region, position alignment using the second and fourth alignment marks is performed by adjusting a suction force for the outer suction region for changing a warpage amount of the substrate while observing the second and fourth alignment marks through the template.

公开(公告)号：US20210294209A1

公开(公告)日：2021-09-23

申请号：US17011020

申请日：2020-09-03

Applicant: Kioxia Corporation

Inventor： Jun WATANABE ,  Anupam MITRA ,  Kazuya FUKUHARA

IPC: G03F7/00 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00 ,  B29C59/02 ,  B29C35/08

Abstract: A template includes: a base material having a surface including a first pattern, a second pattern and a third pattern, the first pattern including a first recess, the second pattern including a second recess. The base material containing a first material having a first refractive index; a first layer disposed in the first recess and containing a second material, the second material having a second refractive index different from the first refractive index; and a second layer disposed in the second recess, containing the second material, and being thicker than the first layer.

公开(公告)号：US20240201606A1

公开(公告)日：2024-06-20

申请号：US18456639

申请日：2023-08-28

Applicant: Kioxia Corporation

Inventor： Masaki MITSUYASU ,  Anupam MITRA ,  Ryo OGAWA

IPC: G03F9/00 ,  G03F7/00 ,  G03F7/20

CPC classification number: G03F9/7042 ,  G03F7/2012 ,  G03F7/70708

Abstract: An imprint apparatus includes: a chuck including a temperature controller configured to adjust a temperature of a substrate having a shot region, the chuck configured to hold the substrate; a template stage configured to hold a template so that a surface of the template with a pattern faces the substrate and configured to change a relative position of the substrate to the template in a vertical direction; and a controller configured to control the chuck and the template stage. The controller is configured to control the temperature controller such that the temperature of the substrate is adjusted based on a magnification error between the pattern and the shot region. The controller controls the template stage such that the pattern is transferred to the shot region of the substrate of which the temperature is adjusted.

公开(公告)号：US20230408935A1

公开(公告)日：2023-12-21

申请号：US18178358

申请日：2023-03-03

Applicant: Kioxia Corporation

Inventor： Anupam MITRA

IPC: G03F9/00 ,  G03F7/00 ,  H01L21/027

CPC classification number: G03F9/7042 ,  G03F7/0002 ,  H01L21/0274

Abstract: According to one embodiment, a pattern forming method includes placing a resin material on a film to be processed; pressing a template including a plurality of patterns protruding from a reference plane against the resin material to form a first resin film having first and second patterns, separated from each other in a first direction, and a third pattern between the first and second patterns; forming a second resin film that covers the first resin film; selectively exposing and developing the second resin film to expose the first and second patterns; and processing the film to be processed via the first and second resin films to transfer the first and second patterns to the film to be processed.

公开(公告)号：US20220082954A1

公开(公告)日：2022-03-17

申请号：US17466259

申请日：2021-09-03

Applicant: Kioxia Corporation

Inventor： Takeshi HIGUCHI ,  Anupam MITRA ,  Takahiro IWASAKI

IPC: G03F9/00 ,  G03F7/20 ,  G03F7/16 ,  G03F7/038 ,  G03F7/09 ,  G03F7/004

Abstract: An imprint method includes supplying a first photocurable resist to a first region of an object; irradiating the first resist with first light; forming a second resist over the object; bringing a template into contact with the second resist; and irradiating at least the second resist with second light through the template while the template is in contact with the second resist.