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公开(公告)号:US20210294208A1
公开(公告)日:2021-09-23
申请号:US17010350
申请日:2020-09-02
Applicant: KIOXIA CORPORATION
Inventor: Anupam MITRA , Masaki MITSUYASU , Kazuya FUKUHARA , Kazuhiro TAKAHATA , Sachiko KOBAYASHI
Abstract: According to one embodiment, an imprint lithography template comprises a substrate transparent to ultraviolet light. A first mesa region is on the substrate. A surface of the first mesa region includes a pattern region to be pressed into a photocurable resist film. The pattern region having four sides. A second mesa region is also on the substrate. The first mesa region protrudes from a surface of the second mesa region. A blocking film is adjacent to two sides of the four sides pattern region. The two sides to which the blocking film is adjacent are connected to each other at a corner of the pattern region. The blocking film blocks ultraviolet light.
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公开(公告)号:US20240316915A1
公开(公告)日:2024-09-26
申请号:US18598201
申请日:2024-03-07
Applicant: Kioxia Corporation
Inventor: Sachiko KOBAYASHI , Kazuhiro TAKAHATA , Satoshi MITSUGI
IPC: B41C1/10 , G03F7/00 , G06F30/392
CPC classification number: B41C1/10 , G03F7/0002 , G06F30/392
Abstract: A pattern design method according to an embodiment is a method to design a pattern of a template used for an imprint process. The imprint process serves to form a predetermined pattern by pressing a shot surface of the template against a surface of a processed layer. The method includes setting an outer edge coverage range corresponding to an outer edge region located a predetermined distance inside an edge of the shot surface of the template. The outer edge coverage range is set to be different from an inner coverage range corresponding to an inner region inside the outer edge region. The method includes designing a pattern in the outer edge region to have a coverage falling within the outer edge coverage range. The method includes designing a pattern in the inner region to have a coverage falling within the inner coverage range.
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