公开(公告)号：US20230326704A1

公开(公告)日：2023-10-12

申请号：US17658637

申请日：2022-04-08

Applicant: KLA Corporation

Inventor： Lawrence Muray ,  John Gerling ,  James Spallas ,  Alan Brodie

IPC: H01J37/141 ,  H01J37/244

CPC classification number: H01J37/141 ,  H01J37/244 ,  H01J2237/1405 ,  H01J2237/04922

Abstract: A miniature electron beam column in combination with magnetostatic lenses to produce very high-performance miniature electron or ion beam columns. Silicon-based electron optical components provide high-accuracy formation and alignment of critical optical elements and the magnetic lenses provide low-aberration focusing or condensing elements. Accurate assembly of the silicon and magnetic components is achievable via the multilayered assembly techniques and allows for achieving high performance.

公开(公告)号：US20220399220A1

公开(公告)日：2022-12-15

申请号：US17483545

申请日：2021-09-23

Applicant: KLA Corporation

Inventor： John Gerling ,  Lawrence Muray ,  Alan Brodie ,  James Spallas ,  Marcel Trimpl

IPC: H01L21/67 ,  H01J37/26 ,  H01J37/244 ,  G01N23/2251 ,  G01N23/203

Abstract: A segmented detector device with backside illumination. The detector is able to collect and differentiate between secondary electrons and backscatter electrons. The detector includes a through-hole for passage of a primary electron beam. After hitting a sample, the reflected secondary and backscatter electrons are collected via a vertical structure having a P+/P−/N+ or an N+/N−/P+ composition for full depletion through the thickness of the device. The active area of the device is segmented using field isolation insulators located on the front side of the device.

公开(公告)号：US20240014000A1

公开(公告)日：2024-01-11

申请号：US17862052

申请日：2022-07-11

Applicant: KLA Corporation

Inventor： Alan D. Brodie ,  Lawrence P. Muray ,  John Gerling

IPC: H01J37/141 ,  H01J37/153

CPC classification number: H01J37/141 ,  H01J37/153 ,  H01J37/147

Abstract: A miniature electron optical column apparatus is disclosed. The apparatus may include a set of electron-optical elements configured to direct a primary electron beam to a sample. The set of electron-optical elements may include an objective lens. The apparatus may also include a deflection sub-system. The deflection sub-system may include one or more pre-lens deflectors positioned between an electron beam source and the objective lens. The deflection sub-system may also include a post-lens deflector positioned between the objective lens and the sample. The deflection sub-system may also include a post-lens miniature optical element positioned between the objective lens and the sample.

公开(公告)号：US11699607B2

公开(公告)日：2023-07-11

申请号：US17483545

申请日：2021-09-23

Applicant: KLA Corporation

Inventor： John Gerling ,  Lawrence Muray ,  Alan Brodie ,  James Spallas ,  Marcel Trimpl

IPC: H01L21/67 ,  H01J37/26 ,  H01J37/244 ,  G01N23/203 ,  G01N23/2251

CPC classification number: H01L21/67288 ,  G01N23/203 ,  G01N23/2251 ,  H01J37/244 ,  H01J37/26 ,  G01N2223/6116 ,  G01N2223/646

Abstract: A segmented detector device with backside illumination. The detector is able to collect and differentiate between secondary electrons and backscatter electrons. The detector includes a through-hole for passage of a primary electron beam. After hitting a sample, the reflected secondary and backscatter electrons are collected via a vertical structure having a P+/P−/N+ or an N+/N−/P+ composition for full depletion through the thickness of the device. The active area of the device is segmented using field isolation insulators located on the front side of the device.

公开(公告)号：US20210090844A1

公开(公告)日：2021-03-25

申请号：US17099476

申请日：2020-11-16

Applicant: KLA Corporation

Inventor： Robert Haynes ,  Aron Welk ,  Tomas Plettner ,  John Gerling ,  Mehran Nasser Ghodsi

IPC: H01J37/10 ,  H01J37/02 ,  H01J37/14 ,  H01J37/147 ,  H01J37/28 ,  H01J37/285

Abstract: A multi-column scanning electron microscopy (SEM) system includes a column assembly, where the column assembly includes a first substrate array assembly and at least a second substrate array assembly. The system also includes a source assembly, the source assembly including two or more illumination sources configured to generate two or more electron beams and two or more sets of a plurality of positioners configured to adjust a position of a particular illumination source of the two or more illumination sources in a plurality of directions. The system also includes a stage configured to secure a sample, where the column assembly directs at least a portion of the two or more electron beams onto a portion of the sample.