公开(公告)号：US12068129B2

公开(公告)日：2024-08-20

申请号：US17981141

申请日：2022-11-04

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Ralph Nyffenegger ,  Michael Steigerwald

IPC: H01J37/28 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/261

Abstract: A system and method of a tilt-column electron beam imaging system is disclosed. The system may include an imaging sub-system. The imaging sub-system may include a plurality of electron beam sources configured to generate a plurality of beamlets. The imaging sub-system may further include a plurality of tilt-illumination columns, where a respective tilt-illumination column is configured to receive a respective beamlet from a respective electron beam source. For the system and method, a first tilt axis of a first tilt-illumination column may be orientated along a first angle and at least one additional tilt axis of at least one additional tilt-illumination column may be orientated along at least one additional angle different from the first angle, where each of the plurality of beamlets pass through a first common crossover volume.

公开(公告)号：US11335608B2

公开(公告)日：2022-05-17

申请号：US17224407

申请日：2021-04-07

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/00 ,  H01L21/66 ,  H01J37/063 ,  H01J37/065 ,  H01J37/244 ,  H01J37/14

Abstract: An electron beam system for wafer inspection and review of 3D devices provides a depth of focus up to 20 microns. To inspect and review wafer surfaces or sub-micron-below surface defects with low landing energies in hundreds to thousands of electron Volts, a Wien-filter-free beam splitting optics with three magnetic deflectors can be used with an energy-boosting upper Wehnelt electrode to reduce spherical and chromatic aberration coefficients of the objective lens.

公开(公告)号：US11869743B2

公开(公告)日：2024-01-09

申请号：US17317861

申请日：2021-05-11

Applicant: KLA Corporation

Inventor： Xinrong Jiang

IPC: H01J37/09 ,  H01J37/12 ,  H01J37/073 ,  H01J37/14

CPC classification number: H01J37/09 ,  H01J37/073 ,  H01J37/12 ,  H01J37/14 ,  H01J2237/0453 ,  H01J2237/0473

Abstract: Multiple electron beamlets are split from a single electron beam. The electron beam passes through an acceleration tube, a beam-limiting aperture, an anode disposed between an electron beam source and the acceleration tube, a focusing lens downstream from the beam-limiting aperture, and a micro aperture array downstream from the acceleration tube. The micro aperture array generates beamlets from the electron beam. The electron beam can be focused from a divergent illumination beam into a telecentric illumination beam.

公开(公告)号：US20230395349A1

公开(公告)日：2023-12-07

申请号：US17830244

申请日：2022-06-01

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Michael Steigerwald ,  Ralph Nyffenegger

IPC: H01J37/073 ,  H01J37/28 ,  H01J37/147 ,  H01J37/22 ,  H01J37/12 ,  H01J37/14

CPC classification number: H01J37/073 ,  H01J37/28 ,  H01J37/1472 ,  H01J37/22 ,  H01J37/12 ,  H01J37/14 ,  H01J2237/103 ,  H01J2237/2448 ,  H01J2237/0492 ,  H01J2237/06333

Abstract: An electron-beam device includes a laser and a photocathode film. The photocathode film has a front side and a back side and emits a plurality of electron beamlets when illuminated from the back side using the laser. The electron-beam device also includes electrodes to extract the plurality of electron beamlets from the front side of the photocathode film and to control shapes of the plurality of electron beamlets.

公开(公告)号：US20220367140A1

公开(公告)日：2022-11-17

申请号：US17317861

申请日：2021-05-11

Applicant: KLA Corporation

Inventor： Xinrong Jiang

IPC: H01J37/09 ,  H01J37/12 ,  H01J37/14 ,  H01J37/073

Abstract: Multiple electron beamlets are split from a single electron beam. The electron beam passes through an acceleration tube, a beam-limiting aperture, an anode disposed between an electron beam source and the acceleration tube, a focusing lens downstream from the beam-limiting aperture, and a micro aperture array downstream from the acceleration tube. The micro aperture array generates beamlets from the electron beam. The electron beam can be focused from a divergent illumination beam into a telecentric illumination beam.

公开(公告)号：US20220108862A1

公开(公告)日：2022-04-07

申请号：US17135279

申请日：2020-12-28

Applicant: KLA Corporation

Inventor： Nikolai Chubun ,  Xinrong Jiang ,  Youfei Jiang ,  Christopher Sears

IPC: H01J37/063 ,  H01J37/32 ,  H01J37/09 ,  H01J37/14

Abstract: An electron source is disclosed. The electron source may include an electron emitter configured to generate one or more electron beams. The electron source may further include a magnetic suppressor electrode surrounding at least a portion of the electron emitter. The magnetic suppressor electrode may be formed from one or more magnetic materials. The magnetic suppressor may be configured to shield at least a portion of the electron emitter from an axial magnetic field. The electron source may further include an extractor electrode positioned adjacent to a tip of the electron emitter.

公开(公告)号：US20210327770A1

公开(公告)日：2021-10-21

申请号：US17224407

申请日：2021-04-07

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01L21/66 ,  H01J37/063 ,  H01J37/065 ,  H01J37/14 ,  H01J37/244

Abstract: An electron beam system for wafer inspection and review of 3D devices provides a depth of focus up to 20 microns. To inspect and review wafer surfaces or sub-micron-below surface defects with low landing energies in hundreds to thousands of electron Volts, a Wien-filter-free beam splitting optics with three magnetic deflectors can be used with an energy-boosting upper Wehnelt electrode to reduce spherical and chromatic aberration coefficients of the objective lens.

公开(公告)号：US12165838B2

公开(公告)日：2024-12-10

申请号：US16697347

申请日：2019-11-27

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/28 ,  H01J37/073 ,  H01J37/22

Abstract: A scanning electron microscopy system may include an electron-optical sub-system and a controller. The electron-optical sub-system may include an electron source and an electron-optical column configured to direct an electron beam to a sample. The electron-optical column may include a double-lens assembly, a beam limiting aperture disposed between a first and second lens of the double-lens assembly, and a detector assembly configured to detect electrons scattered from the sample. In embodiments, the controller of the scanning electron microscopy system may be configured to: cause the electron-optical sub-system to form a flooding electron beam and perform flooding scans of the sample with the flooding electron beam; cause the electron-optical sub-system to form an imaging electron beam and perform imaging scans of the sample with the imaging electron beam; receive images acquired by the detector assembly during the imaging scans; and determine characteristics of the sample based on the images.

公开(公告)号：US12165831B2

公开(公告)日：2024-12-10

申请号：US17829230

申请日：2022-05-31

Applicant: KLA CORPORATION

Inventor： Xinrong Jiang ,  Christopher Sears ,  Youfei Jiang ,  Sameet K. Shriyan ,  Jeong Ho Lee ,  Michael Steigerwald ,  Ralph Nyffenegger

IPC: H01J37/153 ,  H01J37/06 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28

Abstract: A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separate the secondary electron beams from the primary electron beams and can correct the astigmatism and source energy dispersion blurs for all the beamlets simultaneously.

公开(公告)号：US20240153737A1

公开(公告)日：2024-05-09

申请号：US17981141

申请日：2022-11-04

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Ralph Nyffenegger ,  Michael Steigerwald

IPC: H01J37/28 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/261

Abstract: A system and method of a tilt-column electron beam imaging system is disclosed. The system may include an imaging sub-system. The imaging sub-system may include a plurality of electron beam sources configured to generate a plurality of beamlets. The imaging sub-system may further include a plurality of tilt-illumination columns, where a respective tilt-illumination column is configured to receive a respective beamlet from a respective electron beam source. For the system and method, a first tilt axis of a first tilt-illumination column may be orientated along a first angle and at least one additional tilt axis of at least one additional tilt-illumination column may be orientated along at least one additional angle different from the first angle, where each of the plurality of beam lets pass through a first common crossover volume.