公开(公告)号：US20170229279A1

公开(公告)日：2017-08-10

申请号：US15173144

申请日：2016-06-03

Applicant: KLA-Tencor Corporation

Inventor： Alan Brodie ,  Rainer Knippelmeyer ,  Christopher Sears ,  John Rouse ,  Grace Hsiu-Ling Chen

IPC: H01J37/12 ,  H01J37/21 ,  H01J37/28

CPC classification number: H01J37/12 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/1207 ,  H01J2237/21 ,  H01J2237/2801 ,  H01J2237/2817

Abstract: Multi-beam e-beam columns and inspection systems that use such multi-beam e-beam columns are disclosed. A multi-beam e-beam column configured in accordance with the present disclosure may include an electron source and a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source. The multi-lens array may be further configured to shift a focus of at least one particular beamlet of the plurality of beamlets such that the focus of the at least one particular beamlet is different from a focus of at least one other beamlet of the plurality of beamlets.

公开(公告)号：US11302511B2

公开(公告)日：2022-04-12

申请号：US15173144

申请日：2016-06-03

Applicant: KLA-Tencor Corporation

Inventor： Alan Brodie ,  Rainer Knippelmeyer ,  Christopher Sears ,  John Rouse ,  Grace Hsiu-Ling Chen

IPC: H01J37/12 ,  H01J37/28 ,  H01J37/21 ,  H01J37/153

Abstract: Multi-beam e-beam columns and inspection systems that use such multi-beam e-beam columns are disclosed. A multi-beam e-beam column configured in accordance with the present disclosure may include an electron source and a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source. The multi-lens array may be further configured to shift a focus of at least one particular beamlet of the plurality of beamlets such that the focus of the at least one particular beamlet is different from a focus of at least one other beamlet of the plurality of beamlets.