公开(公告)号：US08642981B1

公开(公告)日：2014-02-04

申请号：US13753657

申请日：2013-01-30

Applicant: KLA-Tencor Corporation

Inventor： Paul Petric ,  Mark A. McCord ,  Michael Madsen ,  Alan Brodie

IPC: H01J49/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3005 ,  H01J37/3007 ,  H01J2237/0245 ,  H01J2237/24514 ,  H01J2237/30472 ,  H01J2237/31793 ,  H01J2237/31798

Abstract: An electron microscope assembly suitable for enhancing an image of a lithography tool includes an electron microscope configured for positioning below a lithography stage of an e-beam lithography tool, the lithography stage of the e-beam lithography tool including an aperture for providing the microscope line-of-sight to the lithography optics of the lithography tool, a translation unit configured to selectively translate the microscope along the optical axis of the lithography optics of the lithography tool responsive to a translation control system, the translation unit further configured to position the microscope in an operational state such that the optics of the microscope are positioned proximate to the lithography optics, a docking unit configured to reversibly mechanically couple the microscope with the lithography tool, the microscope configured to magnify a virtual sample plane image generated by the lithography tool.

Abstract translation: 适用于增强光刻工具的图像的电子显微镜组件包括：电子显微镜，被配置为定位在电子束光刻工具的光刻平台下方，电子束光刻工具的光刻台包括用于提供显微镜线的孔 视觉到光刻工具的光刻光学器件;平移单元，被配置为响应于平移控制系统沿着光刻工具的光刻光学器件的光轴选择性地平移显微镜，所述平移单元还被配置成将显微镜 处于操作状态，使得显微镜的光学器件靠近光刻光学器件定位，对接单元被配置为将显微镜与光刻工具可逆地机械耦合，显微镜被配置为放大由光刻工具产生的虚拟样本平面图像。

公开(公告)号：US20170229279A1

公开(公告)日：2017-08-10

申请号：US15173144

申请日：2016-06-03

Applicant: KLA-Tencor Corporation

Inventor： Alan Brodie ,  Rainer Knippelmeyer ,  Christopher Sears ,  John Rouse ,  Grace Hsiu-Ling Chen

IPC: H01J37/12 ,  H01J37/21 ,  H01J37/28

CPC classification number: H01J37/12 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/1207 ,  H01J2237/21 ,  H01J2237/2801 ,  H01J2237/2817

Abstract: Multi-beam e-beam columns and inspection systems that use such multi-beam e-beam columns are disclosed. A multi-beam e-beam column configured in accordance with the present disclosure may include an electron source and a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source. The multi-lens array may be further configured to shift a focus of at least one particular beamlet of the plurality of beamlets such that the focus of the at least one particular beamlet is different from a focus of at least one other beamlet of the plurality of beamlets.

公开(公告)号：US11302511B2

公开(公告)日：2022-04-12

申请号：US15173144

申请日：2016-06-03

Applicant: KLA-Tencor Corporation

Inventor： Alan Brodie ,  Rainer Knippelmeyer ,  Christopher Sears ,  John Rouse ,  Grace Hsiu-Ling Chen

IPC: H01J37/12 ,  H01J37/28 ,  H01J37/21 ,  H01J37/153

Abstract: Multi-beam e-beam columns and inspection systems that use such multi-beam e-beam columns are disclosed. A multi-beam e-beam column configured in accordance with the present disclosure may include an electron source and a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source. The multi-lens array may be further configured to shift a focus of at least one particular beamlet of the plurality of beamlets such that the focus of the at least one particular beamlet is different from a focus of at least one other beamlet of the plurality of beamlets.

公开(公告)号：US09874597B2

公开(公告)日：2018-01-23

申请号：US14696891

申请日：2015-04-27

Applicant: KLA-TENCOR CORPORATION

Inventor： Mark McCord ,  Alan Brodie ,  James George ,  Yu Guan ,  Ralph Nyffenegger

IPC: G01R31/26

CPC classification number: G01R31/2635 ,  G01R31/2601

Abstract: Light-emitting devices, such as LEDs, are tested using a photometric unit. The photometric unit, which may be an integrating sphere, can measure flux, color, or other properties of the devices. The photometric unit may have a single port or both an inlet and outlet. Light loss through the port, inlet, or outlet can be reduced or calibrated for. These testing systems can provide increased reliability, improved throughput, and/or improved measurement accuracy.