公开(公告)号：US20170059491A1

公开(公告)日：2017-03-02

申请号：US15243809

申请日：2016-08-22

Applicant: KLA-Tencor Corporation

Inventor： Brian Duffy ,  Ashok Kulkarni ,  Michael Lennek ,  Allen Park

IPC: G01N21/956 ,  G01N21/95

CPC classification number: G01N21/95607 ,  G01N21/9501 ,  G01N2021/95615 ,  G01N2021/95676 ,  G06K9/64 ,  G06T7/001 ,  G06T2207/30148 ,  H01L22/12 ,  H01L22/20

Abstract: Methods and systems for determining characteristic(s) of patterns of interest (POIs) are provided. One system is configured to acquire output of an inspection system generated at the POI instances without detecting defects at the POI instances. The output is then used to generate a selection of the POI instances. The system then acquires output from an output acquisition subsystem for the selected POI instances. The system also determines characteristic(s) of the POI using the output acquired from the output acquisition subsystem.

Abstract translation: 提供了用于确定感兴趣模式（POI）特征的方法和系统。 一个系统被配置为获取在POI实例处生成的检查系统的输出，而不检测POI实例的缺陷。 然后，输出用于生成POI实例的选择。 然后，系统从所选POI实例的输出采集子系统获取输出。 该系统还使用从输出采集子系统获得的输出来确定POI的特性。

公开(公告)号：US20160027164A1

公开(公告)日：2016-01-28

申请号：US14804102

申请日：2015-07-20

Applicant: KLA-Tencor Corporation

Inventor： Brian Duffy ,  Michael Lennek ,  ChangHo Lee

IPC: G06T7/00 ,  G06T5/50

CPC classification number: G06T7/001 ,  G06T5/50 ,  G06T7/32 ,  G06T2207/10004 ,  G06T2207/20164 ,  G06T2207/30148

Abstract: Methods and systems for determining coordinates for an area of interest on a specimen are provided. One system includes one or more computer subsystems configured for, for an area of interest on a specimen being inspected, identifying one or more targets located closest to the area of interest. The computer subsystem(s) are also configured for aligning one or more images for the one or more targets to a reference for the specimen. The image(s) for the target(s) and an image for the area of interest are acquired by an inspection subsystem during inspection of the specimen. The computer subsystem(s) are further configured for determining an offset between the image(s) for the target(s) and the reference based on results of the aligning and determining modified coordinates of the area of interest based on the offset and coordinates of the area of interest reported by the inspection subsystem.

Abstract translation: 提供了用于确定样本上感兴趣区域的坐标的方法和系统。 一个系统包括一个或多个计算机子系统，其被配置用于针对被检查的样本上的感兴趣区域，识别位于最靠近感兴趣区域的一个或多个目标。 计算机子系统还被配置为将一个或多个目标的一个或多个图像对准样本的参考。 用于目标的图像和感兴趣区域的图像在检查样本期间由检查子系统获取。 计算机子系统还被配置为基于对准的结果和基于所关注区域的偏移和坐标来确定感兴趣区域的修改坐标来确定用于目标的图像和参考图像之间的偏移 检查子系统报告的感兴趣区域。

公开(公告)号：US10359371B2

公开(公告)日：2019-07-23

申请号：US15243809

申请日：2016-08-22

Applicant: KLA-Tencor Corporation

Inventor： Brian Duffy ,  Ashok Kulkarni ,  Michael Lennek ,  Allen Park

IPC: G06K9/64 ,  G06T7/00 ,  G01N21/95 ,  H01L21/66 ,  G01N21/956 ,  G05B19/418

Abstract: Methods and systems for determining characteristic(s) of patterns of interest (POIs) are provided. One system is configured to acquire output of an inspection system generated at the POI instances without detecting defects at the POI instances. The output is then used to generate a selection of the POI instances. The system then acquires output from an output acquisition subsystem for the selected POI instances. The system also determines characteristic(s) of the POI using the output acquired from the output acquisition subsystem.

公开(公告)号：US10127653B2

公开(公告)日：2018-11-13

申请号：US14804102

申请日：2015-07-20

Applicant: KLA-Tencor Corporation

Inventor： Brian Duffy ,  Michael Lennek ,  ChangHo Lee

IPC: G06T7/00 ,  G06T5/50 ,  G06T7/32

Abstract: Methods and systems for determining coordinates for an area of interest on a specimen are provided. One system includes one or more computer subsystems configured for, for an area of interest on a specimen being inspected, identifying one or more targets located closest to the area of interest. The computer subsystem(s) are also configured for aligning one or more images for the one or more targets to a reference for the specimen. The image(s) for the target(s) and an image for the area of interest are acquired by an inspection subsystem during inspection of the specimen. The computer subsystem(s) are further configured for determining an offset between the image(s) for the target(s) and the reference based on results of the aligning and determining modified coordinates of the area of interest based on the offset and coordinates of the area of interest reported by the inspection subsystem.

公开(公告)号：US10338004B2

公开(公告)日：2019-07-02

申请号：US14666942

申请日：2015-03-24

Applicant: KLA-Tencor Corporation

Inventor： Martin Plihal ,  Ankit Jain ,  Michael Lennek

IPC: G01N21/93 ,  G01N21/95 ,  H01L21/66

Abstract: Methods and systems for generating defect samples are provided. One method includes identifying a set of defects detected on a wafer having the most diversity in values of at least one defect attribute and generating different tiles for different defects in the set. The tiles define a portion of all values for the at least one attribute of all defects detected on the wafer that are closer to the values for the at least one attribute of their corresponding defects than the values for the at least one attribute of other defects. In addition, the method includes separating the defects on the wafer into sample bins corresponding to the different tiles based on their values of the at least one attribute, randomly selecting defect(s) from each of two or more of the sample bins, and creating a defect sample for the wafer that includes the randomly selected defects.

公开(公告)号：US09613411B2

公开(公告)日：2017-04-04

申请号：US14505446

申请日：2014-10-02

Applicant: KLA-Tencor Corporation

Inventor： Raghavan Konuru ,  Naema Bhatti ,  Michael Lennek ,  Martin Plihal

IPC: G06T7/00 ,  G06K9/62

CPC classification number: G06T7/0004 ,  G06K9/6254 ,  G06K9/6282 ,  G06K2209/19

Abstract: Methods and systems for setting up a classifier for defects detected on a wafer are provided. One method includes generating a template for a defect classifier for defects detected on a wafer and applying the template to a training data set. The training data set includes information for defects detected on the wafer or another wafer. The method also includes determining one or more parameters for the defect classifier based on results of the applying step.

公开(公告)号：US10062012B1

公开(公告)日：2018-08-28

申请号：US14885859

申请日：2015-10-16

Applicant: KLA-Tencor Corporation

Inventor： Allen Park ,  Michael Lennek

IPC: G06K9/00 ,  G06K9/62 ,  G06K9/46 ,  G06T7/00 ,  G06T7/60 ,  G06K9/52

CPC classification number: G06K9/6267 ,  G06K9/4604 ,  G06K9/52 ,  G06T7/0004 ,  G06T7/001 ,  G06T7/60 ,  G06T2207/30148

Abstract: Methods and systems for finding patterns in a design for a specimen are provided. One system includes one or more computer subsystems configured for searching for a target pattern in a design for a specimen to thereby find multiple instances of the target pattern in the design. The one or more computer subsystems are also configured for separating the multiple instances of the target pattern into different groups based on information for surrounding patterns within a predefined window around the target pattern such that each of the different groups corresponds to a different combination of the target pattern and the surrounding patterns.

公开(公告)号：US20150276618A1

公开(公告)日：2015-10-01

申请号：US14666942

申请日：2015-03-24

Applicant: KLA-Tencor Corporation

Inventor： Martin Plihal ,  Ankit Jain ,  Michael Lennek

IPC: G01N21/93 ,  H01L21/66 ,  G01N21/95

CPC classification number: H01L22/12 ,  G01N21/8851 ,  G01N21/9501 ,  G01N2021/8877 ,  G01N2201/063 ,  G01N2201/12 ,  H01L22/20

Abstract: Methods and systems for generating defect samples are provided. One method includes identifying a set of defects detected on a wafer having the most diversity in values of at least one defect attribute and generating different tiles for different defects in the set. The tiles define a portion of all values for the at least one attribute of all defects detected on the wafer that are closer to the values for the at least one attribute of their corresponding defects than the values for the at least one attribute of other defects. In addition, the method includes separating the defects on the wafer into sample bins corresponding to the different tiles based on their values of the at least one attribute, randomly selecting defect(s) from each of two or more of the sample bins, and creating a defect sample for the wafer that includes the randomly selected defects.

Abstract translation: 提供了生成缺陷样本的方法和系统。 一种方法包括识别在具有至少一个缺陷属性值的多样性最大的晶片上检测到的一组缺陷，并为该组中的不同缺陷生成不同的瓦片。 瓦片定义了在晶片上检测到的所有缺陷的至少一个属性的所有值的一部分，其比其它缺陷的至少一个属性的值更接近于其相应缺陷的至少一个属性的值。 另外，该方法包括：基于它们的至少一个属性值，从两个或多个样本仓中的每一个中随机选择缺陷，将晶片上的缺陷分离成与不同瓦片对应的样品仓，并创建 用于晶片的缺陷样品，其包括随机选择的缺陷。

公开(公告)号：US20150262038A1

公开(公告)日：2015-09-17

申请号：US14505446

申请日：2014-10-02

Applicant: KLA-Tencor Corporation

Inventor： Raghavan Konuru ,  Naema Bhatti ,  Michael Lennek ,  Martin Plihal

IPC: G06K9/66 ,  G06K9/62 ,  G06T7/00

CPC classification number: G06T7/0004 ,  G06K9/6254 ,  G06K9/6282 ,  G06K2209/19

Abstract: Methods and systems for setting up a classifier for defects detected on a wafer are provided. One method includes generating a template for a defect classifier for defects detected on a wafer and applying the template to a training data set. The training data set includes information for defects detected on the wafer or another wafer. The method also includes determining one or more parameters for the defect classifier based on results of the applying step.

Abstract translation: 提供了用于设置在晶片上检测到的缺陷的分类器的方法和系统。 一种方法包括为在晶片上检测到的缺陷生成用于缺陷分类器的模板并将模板应用于训练数据集。 训练数据集包括在晶片或另一晶片上检测到的缺陷的信息。 该方法还包括基于应用步骤的结果确定缺陷分类器的一个或多个参数。