公开(公告)号：US11776819B2

公开(公告)日：2023-10-03

申请号：US16969488

申请日：2019-02-13

Applicant: KOREA INSTITUTE OF FUSION ENERGY

Inventor： Dong Chan Seok ,  Tai Hyeop Lho ,  Yong Ho Jung ,  Yong Sup Choi ,  Kang Il Lee ,  Seung Ryul Yoo ,  Soo Ouk Jang

IPC: H01L21/311 ,  H01J37/32

CPC classification number: H01L21/31116 ,  H01J37/32449 ,  H01J37/32541 ,  H01J37/32568

Abstract: A point etching module using an annular surface-discharge plasma apparatus is disclosed. The point etching module using an annular surface-discharge plasma apparatus comprises: a plate-shaped dielectric; a circular electrode disposed on and in contact with the upper surface of the dielectric; an annular electrode disposed on and in contact with the lower surface of the dielectric and providing a gas receiving space for receiving gas; and a power supplier for applying high voltage between the circular electrode and the annular electrode, wherein when the application of the high voltage starts an electric discharge, filament type plasma is irradiated toward a substrate to be treated, by using plasma flowing in the center direction of the annular electrode from between the inner surface of the annular electrode and the lower surface of the dielectric.