METHOD OF PRINTING NANOSTRUCTURE
    4.
    发明公开

    公开(公告)号:US20240103362A1

    公开(公告)日:2024-03-28

    申请号:US18470084

    申请日:2023-09-19

    CPC classification number: G03F7/0002 B82Y30/00 B82Y40/00

    Abstract: Disclosed herein is a method of printing a nanostructure including: preparing a template substrate on which a pattern is formed; forming a replica pattern having an inverse phase of the pattern by coating a polymer thin film on an upper portion of the template substrate, adhering a thermal release tape to an upper portion of the polymer thin film, and separating the polymer thin film from the template substrate; forming a nanostructure by depositing a functional material on the replica pattern; and printing the nanostructure deposited on the replica pattern to a substrate by positioning the nanostructure on the substrate, applying heat and pressure to the nanostructure, and weakening an adhesive force between the thermal release tape and the replica pattern by the heat.

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