公开(公告)号：US09349585B2

公开(公告)日：2016-05-24

申请号：US14576435

申请日：2014-12-19

申请人： Kabushiki Kaisha Toshiba

发明人： Sonoe Nakaoka ,  Kentaro Matsunaga ,  Eiji Yoneda

IPC分类号： G03F7/004 ,  H01L21/027 ,  H01L21/02 ,  H01L21/311 ,  G03F1/00 ,  G03F7/20 ,  G03F7/38

CPC分类号： G03F7/38 ,  G03F1/0046 ,  G03F1/144 ,  G03F7/0002 ,  G03F7/004 ,  G03F7/2016 ,  G03F7/203 ,  H01L21/0271 ,  H01L21/0274

摘要： According to an embodiment, a guide pattern having a first opening pattern and a second opening pattern shallower than the first opening pattern, is formed on a film to be processed. A directed self-assembly material is set into the first and second opening patterns. The directed self-assembly material is phase-separated into first and second phases in the first and second opening patterns. A third opening pattern is formed by removing the first phase. The third opening pattern in the second opening pattern is eliminated, and the second and third opening patterns are transferred to the film to be processed, by one etching to be processed from the tops of the second and third opening patterns.

摘要翻译： 根据实施例，具有第一开口图案和比第一开口图案浅的第二开口图案的引导图案形成在待加工的薄膜上。 定向自组装材料被设置在第一和第二开口图案中。 定向自组装材料在第一和第二开口图案中相分离成第一和第二相。 通过去除第一相来形成第三开口图案。 消除了第二开口图案中的第三开口图案，并且通过从第二和第三开口图案的顶部进行一次蚀刻将第二和第三开口图案转印到待加工薄膜。