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公开(公告)号：US5906148A
公开(公告)日：1999-05-25
申请号：US803423
申请日：1997-02-20
申请人： Kaoru Aihara , Kentaro Asakura , Soutoku Asano , Toichi Imasaka , Nobuyoshi Kataoka , Sadao Furusho , Toshio Sato , Yasuhisa Hirohata , Mototugu Yamamoto
发明人： Kaoru Aihara , Kentaro Asakura , Soutoku Asano , Toichi Imasaka , Nobuyoshi Kataoka , Sadao Furusho , Toshio Sato , Yasuhisa Hirohata , Mototugu Yamamoto
CPC分类号： G01N1/06 , G01N2001/066 , Y10T83/141 , Y10T83/6492 , Y10T83/6566
摘要： The microtome of the present invention includes a base, a knife for cutting a sample, a knife holder fixed on the base and holding the knife, a carrier bar carrying the sample at the leading end thereof and vertically traveling with the trailing end as a fulcrum. A bar traveling mechanism supports and moves the carrier vertically. A transmission lever transmits force to feed the leading end of the carrier bar toward the knife. A support plate is mounted on the base and rotatably supports the transmission lever. A tension spring pulls the carrier bar toward the transmission lever. A lever moving mechanism is in contact with the transmission lever.
摘要翻译： 本发明的切片机包括基座，用于切割样品的刀，固定在基座上并保持刀的刀架，承载杆在其前端承载样品并以后端垂直行进为支点 。 杆移动机构垂直地支撑和移动托架。 传动杆传递力将载体杆的前端朝向刀进给。 支撑板安装在基座上并可旋转地支撑传动杆。 拉伸弹簧将承载杆拉向传动杆。 杆移动机构与传动杆接触。
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公开(公告)号：US5752425A
公开(公告)日：1998-05-19
申请号：US756905
申请日：1996-12-02
IPC分类号： G01N1/06
CPC分类号： G01N1/06 , G01N2001/066 , Y10T83/18 , Y10T83/6508 , Y10T83/6563
摘要： A microtome particularly suitable for sectioning specimen to be observed on a transmission type electron microscope. Mounted on top of and located to one side of a machine base (2) are an X-Y axis stage and a tilting stage (4) which in turn supports thereon a cutter holder block (5) with a cutting knife (6). Located to the other side of the machine base (2) is a micro-feed mechanism (7) which supports thereon a specimen holder support arm (12) with specimen (14) and a Z-axis stage (11). The micro-feed mechanism (7) has first and second linear motor stages (8) and (9) to be displaced inversely in intersecting directions crossed each other with a predetermined intersection angle (28) across Y-axis. As the first and second linear motor stages (8) and (9) are displaced at the intersection angle (20) with each other, the specimen (14) is displaced over a small distance of nanometrically fine level in the direction of X-axis, thereby permitting to produce an ultra-thin specimen piece.
摘要翻译： 切片机特别适用于在透射型电子显微镜上观察样品的切片。 安装在机座（2）的一侧的顶部并且位于机座（2）的一侧上的是X-Y轴台和倾斜台（4），该台架又用切割刀（6）在其上支撑有刀架块（5）。 位于机座（2）的另一侧的是一个微型进给机构（7），其上装有一个具有试样（14）和一个Z轴平台（11）的试样支架支撑臂（12）。 微进给机构（7）具有第一和第二直线电动机级（8）和（9），以横跨Y轴的预定交叉角（28）交叉相交的方向相反地移动。 当第一和第二线性马达级（8）和（9）以交叉角（20）彼此移位时，试样（14）在X轴方向上在微米级的微小距离上移位 ，从而允许生产超薄的样品片。
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公开(公告)号：US20100192402A1
公开(公告)日：2010-08-05
申请号：US12667958
申请日：2007-07-23
CPC分类号： B41F23/0433 , F26B3/04 , F26B13/10 , F26B21/004
摘要： To carry out drying of printing ink with the use of Nano sized high-temperature dryness steam. Nano sized high-temperature dryness steam being clustered on Nano oder is generated and jetted to the print side of printed material so that the Nano sized high-temperature dryness steam imparts intramolecular vibrational energy to ink of the print side. Consequently, the Nano sized high-temperature dryness steam being clustered on Nano oder not only passes through fiber pores in the printed material but also collides with the ink of the print side. The Nano sized high-temperature dryness steam having collided with the ink of the print side imparts thermally excited energy as intramolecular vibrational energy to the ink containing polar molecules. The ink is dried by the intramolecular energy.
摘要翻译： 使用纳米级高温干燥蒸汽进行印刷油墨的干燥。 产生纳米尺寸的高温干燥蒸汽，并将其喷射到印刷品的印刷面上，使得纳米尺寸的高温干燥蒸汽将分子内的振动能量赋予印刷面的油墨。 因此，纳米尺寸的高温干燥蒸汽聚集在纳米尺寸上不仅穿过印刷材料中的纤维孔，而且还与印刷面的墨水碰撞。 与印刷侧的墨水碰撞的纳米尺寸的高温干燥蒸汽将热激发能作为分子内振动能赋予含有极性分子的油墨。 油墨被分子内的能量干燥。
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公开(公告)号：USD592573S1
公开(公告)日：2009-05-19
申请号：US29322050
申请日：2008-07-29
申请人： Kentaro Asakura , Tetsu Endoh
设计人： Kentaro Asakura , Tetsu Endoh
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公开(公告)号：US20150000155A1
公开(公告)日：2015-01-01
申请号：US14376272
申请日：2013-02-04
发明人： Kentaro Asakura , Shunsuke Hasegawa , Shigeyuki Takahashi , Yoshihiro Doba , Masao Fukudome , Sennin Kobayashi , Toshiaki Yamaguchi , Yasuo Yamaguchi
CPC分类号： F26B3/02 , B05D3/0272 , B41F23/04 , B41M7/009 , F26B3/04 , F26B21/00 , F26B21/003 , F26B25/14
摘要： The present invention is constituted to: apply injection energy to overheated dry vapor in which saturated moisture vapor is heated and dried so as to miniaturize and cluster particles of the overheated dry vapor; apply impact energy to the clustered overheated dry vapor so as to further miniaturize the clustered particles of the overheated dry vapor and generate nano-size overheated dry vapor; and supply the nano-size overheated dry vapor in a supersaturated state into a chamber in which a substrate is placed to form an anoxic atmosphere within the chamber, infuse the nano-size overheated dry vapor into ink molecules and molecular boundaries in the anoxic atmosphere, and apply the energy of the nano-sized overheated dry vapor to the ink, so as to evaporate the moisture of the ink and degraded or reduced the organic solvent of the ink.
摘要翻译： 本发明构成为：对过热的干蒸汽施加注入能量，在其中加热和干燥饱和的水蒸汽，以使过热的干蒸气的颗粒小型化并聚集; 将冲击能量施加到聚集的过热干燥蒸气，以进一步使过热的干蒸汽的聚集颗粒小型化，并产生纳米尺寸的过热干燥蒸气; 并将过饱和状态的纳米级过热干蒸汽供应到其中放置基板以在室内形成缺氧气氛的室内，将纳米级过热干蒸气注入到缺氧气氛中的油墨分子和分子界限中， 并将纳米尺寸过热干蒸气的能量施加到墨水上，以便蒸发墨水的水分并降低或降低墨水的有机溶剂。
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公开(公告)号：US07989353B2
公开(公告)日：2011-08-02
申请号：US11968369
申请日：2008-01-02
IPC分类号： H01L21/302
CPC分类号： H01J37/20 , H01J37/3244 , H01J37/32862 , H01J2237/0203
摘要： Method for operating a processing system and refurbishing a ceramic substrate holder within a process chamber of the processing system are described. The method includes plasma processing one or more substrates on the ceramic substrate holder, where the processing causes erosion of a nitride material of the ceramic substrate holder. The method further includes refurbishing the ceramic substrate holder in-situ without a substrate residing on the ceramic substrate holder, where the refurbishing includes exposing the ceramic substrate holder to a plasma-excited nitrogen-containing gas in the process chamber to at least partially reverse the erosion of the nitride material.
摘要翻译： 描述了在处理系统的处理室内操作处理系统和翻新陶瓷衬底保持器的方法。 该方法包括等离子体处理陶瓷衬底保持器上的一个或多个衬底，其中处理引起陶瓷衬底保持器的氮化物材料的侵蚀。 该方法还包括原位翻新陶瓷衬底保持器，而不需要驻留在陶瓷衬底保持器上的衬底，其中翻新包括将陶瓷衬底保持器暴露于处理室中的等离子体激发的含氮气体，以至少部分地将 氮化物材料的侵蚀。
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公开(公告)号：US07422655B2
公开(公告)日：2008-09-09
申请号：US10553843
申请日：2004-04-20
申请人： Kentaro Asakura
发明人： Kentaro Asakura
CPC分类号： H01L21/68742 , H01L21/67069
摘要： An apparatus for performing a semiconductor process on a target substrate (W) includes a lifting mechanism (48) disposed in a worktable (38) to assist transfer of the target substrate. The lifting mechanism includes a lifter pin (51) configured to support and move up and down the target substrate, and a guide hole (49) configured to guide the lifter pin being moved up and down. The guide hole includes a main hole portion (49a) which extends through the worktable from its upper surface to lower surface, and an extended hole portion (49b) which extends into an extension sleeve (66) which projects downward from the lower surface of the worktable to correspond to the main hole portion.
摘要翻译： 用于在目标基板（W）上执行半导体处理的装置包括设置在工作台（38）中以辅助目标基板的传送的提升机构（48）。 提升机构包括：构造成用于支撑并移动目标基板的升降销（51）;以及引导孔（49），其构造成引导升降器销上下移动。 引导孔包括从其上表面延伸到下表面延伸穿过工作台的主孔部分（49a）和延伸到从下表面向下突出的延伸套筒（66）的延伸孔部分（49b） 的工作台对应于主孔部分。
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公开(公告)号：US20090095731A1
公开(公告)日：2009-04-16
申请号：US12334119
申请日：2008-12-12
申请人： Kentaro Asakura , Hiroo Kawasaki
发明人： Kentaro Asakura , Hiroo Kawasaki
IPC分类号： F27D11/02
CPC分类号： H01L21/67103 , C23C16/4586 , C23C16/46
摘要： A mounting table structure arranged in a processing chamber is provided for mounting a target object to be processed on the upper surface. The mounting table structure is characterized in having a mounting table wherein a heating unit are embedded to heat the target object to perform a specified heat treatment to the target object, and a supporting column which stands on the bottom portion of the processing chamber and supports the mounting table. The mounting table structure is also characterized in that a heat-equalizing member spread in a planar direction is embedded above the heating unit in the mounting table.
摘要翻译： 设置在处理室中的安装台结构用于在上表面上安装待加工的目标物体。 安装台结构的特征在于具有安装台，其中嵌入有加热单元以加热目标物体以对目标物体进行特定的热处理;以及支撑柱，其支撑在处理室的底部并支撑 安装台。 安装台结构的特征还在于，在平面方向上扩展的均热构件嵌入在安装台中的加热单元的上方。
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公开(公告)号：US08183502B2
公开(公告)日：2012-05-22
申请号：US12334119
申请日：2008-12-12
申请人： Kentaro Asakura , Hiroo Kawasaki
发明人： Kentaro Asakura , Hiroo Kawasaki
CPC分类号： H01L21/67103 , C23C16/4586 , C23C16/46
摘要： A mounting table structure arranged in a processing chamber is provided for mounting a target object to be processed on the upper surface. The mounting table structure is characterized in having a mounting table wherein a heating unit are embedded to heat the target object to perform a specified heat treatment to the target object, and a supporting column which stands on the bottom portion of the processing chamber and supports the mounting table. The mounting table structure is also characterized in that a heat-equalizing member spread in a planar direction is embedded above the heating unit in the mounting table.
摘要翻译： 设置在处理室中的安装台结构用于在上表面上安装待加工的目标物体。 安装台结构的特征在于具有安装台，其中嵌入有加热单元以加热目标物体以对目标物体进行特定的热处理;以及支撑柱，其支撑在处理室的底部并支撑 安装台。 安装台结构的特征还在于，在平面方向上扩展的均热构件嵌入在安装台中的加热单元的上方。
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公开(公告)号：USD592563S1
公开(公告)日：2009-05-19
申请号：US29322051
申请日：2008-07-29
申请人： Kentaro Asakura , Tetsu Endoh
设计人： Kentaro Asakura , Tetsu Endoh
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