利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

10 条记录 (耗时 0.034 秒)

    Microlithographic projection exposure apparatus
    3.
    发明授权
    Microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置

    公开(公告)号：US08891057B2

    公开(公告)日：2014-11-18

    申请号：US12818501

    申请日：2010-06-18

    申请人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    发明人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    IPC分类号： G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

    摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.

    摘要翻译： 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于暂时稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关联的出射光瞳中的期望强度分布 以关联出射光瞳的最大边缘角度值sin（γ）表示的质心角值sin（＆bgr）小于2％的情况和/或在椭圆度小于2％的情况下， 和/或在极平衡小于2％的情况下。

    Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
    4.
    发明授权
    Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation 有权
    具有具有时间稳定性的多镜阵列的微光刻投影曝光装置

    公开(公告)号：US08724086B2

    公开(公告)日：2014-05-13

    申请号：US12818844

    申请日：2010-06-18

    申请人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    发明人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    IPC分类号： G03B27/54

    CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

    摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a second adjusted intensity distribution in the associated exit pupil by less than 0.1 in at least one of an inner σ or an outer σ.

    摘要翻译： 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于在时间上稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关出射光瞳中的第二调整的强度分布 在内部和外部的至少一个中小于0.1; 或外部的。

    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    6.
    发明申请
    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微波投影曝光装置

    公开(公告)号：US20100283985A1

    公开(公告)日：2010-11-11

    申请号：US12818844

    申请日：2010-06-18

    申请人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    发明人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    IPC分类号： G03B27/54

    CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

    摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.

    摘要翻译： 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于暂时稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关联的出射光瞳中的期望强度分布 以关联出射光瞳的最大边缘角度值sin（γ）表示的质心角值sin（＆bgr）小于2％的情况和/或在椭圆度小于2％的情况下， 和/或在极平衡小于2％的情况下。

    METHOD OF PRODUCING A DIFFRACTIVE OPTICAL ELEMENT AND DIFFRACTIVE OPTICAL ELEMENT PRODUCED BY SUCH A METHOD
    10.
    发明申请
    METHOD OF PRODUCING A DIFFRACTIVE OPTICAL ELEMENT AND DIFFRACTIVE OPTICAL ELEMENT PRODUCED BY SUCH A METHOD 有权
    生产通过这种方法生产的衍射光学元件和衍射光学元件的方法

    公开(公告)号：US20080192223A1

    公开(公告)日：2008-08-14

    申请号：US12030646

    申请日：2008-02-13

    申请人： Harald Volkenandt ,  Gundula Weiss

    发明人： Harald Volkenandt ,  Gundula Weiss

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70158 ,  B29D11/00634 ,  G02B5/18 ,  G03F7/70108 ,  G03F7/70566

    摘要： In some embodiments, a microlithography projection exposure system has an illumination system with an illumination optical system. The latter can have at least one diffractive optical element, which is divided into multiple adjacently arranged individual elements, each of which has one specified bundle-forming and polarizing effect. The at least one diffractive optical element can be produced as follows: First a bundle formation substrate is optically polished on one joining side. Then the bundle formation substrate is joined to an optically doubly refracting polarization formation substrate to form an optical raw element. Then bundle-forming structures are applied into the bundle formation substrate, the latter being divided corresponding to the later individual elements. The layer thickness of the polarization formation substrate at the location of specified individual elements can then removed as far as the polished joining side of the bundle formation substrate. The result can be a diffractive optical element in which at least two different types of individual elements with different specified bundle-forming and polarizing effect can be produced with high structural precision.

    摘要翻译： 在一些实施例中，微光刻投影曝光系统具有带照明光学系统的照明系统。 后者可以具有至少一个衍射光学元件，其被分成多个相邻排列的各个元件，每个元件具有一个特定的束形成和偏振效果。 所述至少一个衍射光学元件可以如下制造：首先在一个接合侧对光束进行光学抛光。 然后将束形成衬底接合到光学双折射偏振形成衬底以形成光学原始元件。 然后将捆束形成结构施加到束形成基底中，后者根据后来的各个元素被分割。 然后可以去除指定单个元件的位置处的偏振形成衬底的层厚度直到束形成衬底的抛光的接合侧。 结果可以是衍射光学元件，其中可以以高结构精度产生具有不同规定的束形成和偏振效应的至少两种不同类型的单独元件。