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公开(公告)号：US06482568B1
公开(公告)日：2002-11-19
申请号：US09662160
申请日：2000-09-14
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator. The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.
摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）含有酸解离基团的树脂，所述酸分解基团在酸解离基解离时不溶或几乎不溶于碱，并且可溶解，包含以下重复单元（I），重复单元 II）和至少一个重复单元（III-1）和（III-2）和（B）光酸产生剂。辐射敏感性树脂组合物适合用作化学增幅抗蚀剂，显示出对 由KrF准分子激光器或ArF准分子激光器表示的深紫外线的活性辐射，表现出优异的耐干蚀刻性，不受蚀刻气体类型的影响，具有高的透射率，表现出作为抗蚀剂的极好的基本特性，例如灵敏度，分辨率， 和图案形状，作为组合物具有优异的储存稳定性，并且对基材表现出足够的粘附性。
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公开(公告)号：US07202016B2
公开(公告)日：2007-04-10
申请号：US11116269
申请日：2005-04-28
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7/004
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译： 一种包含特定共聚物和光致酸发生剂的化学放大的辐射敏感性树脂组合物，其中共聚物含有以下重复单元（1）和/或重复单元（2）和重复单元（3-1），
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公开(公告)号：US06933094B2
公开(公告)日：2005-08-23
申请号：US09953941
申请日：2001-09-18
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译： 包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基， ，或R 3和R 4可以与R 3和R 4的氮原子组合形成， 基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子 同时。 该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。
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公开(公告)号：US20050214680A1
公开(公告)日：2005-09-29
申请号：US11116269
申请日：2005-04-28
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译： 包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基， ，或R 3和R 4可以与R 3和R 4的氮原子组合形成， 基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子 同时。 该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。
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公开(公告)号：US20070254247A1
公开(公告)日：2007-11-01
申请号：US11269761
申请日：2005-11-09
IPC分类号： G03C1/043
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising (A) a resin which comprises at least one recurring unit (I-1), (I-2), or (I-3), and a recurring unit (II), and is insoluble or scarcely soluble in alkali, but becomes alkali soluble by action of an acid, (B) a photoacid generator, and (C) a polycyclic compound. The resin composition is used as a chemically-amplified resist for microfabrication utilizing deep UV rays.
摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）包含至少一个重复单元（I-1），（I-2）或（I-3）和重复单元（II）的树脂， 几乎不溶于碱，但通过酸的作用变得碱溶，（B）光酸产生剂，和（C）多环化合物。 该树脂组合物用作利用深紫外线的微细加工的化学增幅抗蚀剂。
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公开(公告)号：US07005230B2
公开(公告)日：2006-02-28
申请号：US10345157
申请日：2003-01-16
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising (A) a resin which comprises at least one recurring unit (I-1), (I-2), or (I-3), and a recurring unit (II), and is insoluble or scarcely soluble in alkali, but becomes alkali soluble by action of an acid, (B) a photoacid generator, and (C) a polycyclic compound. The resin composition is used as a chemically-amplified resist for microfabrication utilizing deep UV rays
摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）包含至少一个重复单元（I-1），（I-2）或（I-3）和重复单元（II）的树脂， 几乎不溶于碱，但通过酸的作用变得碱溶，（B）光酸产生剂，和（C）多环化合物。 树脂组合物用作利用深紫外线的微细加工的化学增幅抗蚀剂<化学id =“CHEM-US-00001”num =“000
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公开(公告)号：US06403280B1
公开(公告)日：2002-06-11
申请号：US09558067
申请日：2000-04-26
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/115 , Y10S430/122
摘要： The present invention provides a radiation sensitive resin composition which comprises (A) a resin represented by a copolymer comprising recurring units represented by the general formulae (1) or (2) as shown below, and (B) a radiation sensitive acid-generator. The radiation sensitive resin composition has an excellent storage stability and the resist produced from the composition is a chemically amplifiable type sensitive to radiations represented by fartificial ultraviolet rays. The resist has a high transparency to radiations and it is excellent in basic physical properties for resist such as durability to dry etching, sensitivity, resolution, and pattern configuration:
摘要翻译： 本发明提供一种辐射敏感性树脂组合物，其包含（A）由下述通式（1）或（2）表示的重复单元的共聚物所表示的树脂，（B）辐射敏感性酸发生剂。 辐射敏感性树脂组合物具有优异的储存稳定性，并且由该组合物制备的抗蚀剂是对由人造紫外线表示的辐射敏感的化学可扩增型。 抗蚀剂对于辐射具有高透明度，并且对于抗蚀剂的基本物理性质如干蚀刻耐久性，灵敏度，分辨率和图案构型是优异的：
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公开(公告)号：US09966814B2
公开(公告)日：2018-05-08
申请号：US14432594
申请日：2012-10-05
申请人： Hiroki Aso , Mamoru Kawakubo , Mineo Yamamoto , Hiroyuki Ishii , Junichiro Oya , Yuto Urabe
发明人： Hiroki Aso , Mamoru Kawakubo , Mineo Yamamoto , Hiroyuki Ishii , Junichiro Oya , Yuto Urabe
摘要： A motor includes a molded stator; a cooling fan assembled to an end of a shaft protruding from one end face of the molded stator; a fan cover that covers the cooling fan; a capacitor assembly box installed to the molded stator and having a capacitor incorporated therein; a foot plate installed to the molded stator; and a bracket provided on the other end side of the molded stator. The fan cover is formed with a latched to the capacitor assembly box and a claw latched to the foot plate; and holes and to which the claws are latched are formed on the capacitor assembly box and the foot plate, respectively.
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公开(公告)号：US09698655B2
公开(公告)日：2017-07-04
申请号：US14406545
申请日：2012-06-19
申请人： Yuto Urabe , Hiroki Aso , Kazunori Sakanobe , Mineo Yamamoto , Hiroyuki Ishii , Junichiro Oya
发明人： Yuto Urabe , Hiroki Aso , Kazunori Sakanobe , Mineo Yamamoto , Hiroyuki Ishii , Junichiro Oya
CPC分类号： H02K11/042 , F04D1/04 , F04D13/024 , F04D13/064 , F25B1/005 , H02K1/27 , H02K15/03 , H02K29/08
摘要： Provided is a pump that includes an annular molded stator having a substrate mounted with a Hall element and that includes a rotor having an annular rotor unit rotatably housed in a cup-shaped partition component, with one end thereof in an axial direction facing the Hall element and the other end thereof in the axial direction provided with an impeller attachment unit. The rotor unit includes a resin magnet, a sleeve bearing, and a resin portion. The resin magnet includes a rotor-position detecting magnetic-pole portion protruding axially with a predetermined height in an annular shape having a predetermined width in a radial direction on an outer periphery of an end face opposite to the Hall element. The rotor-position detecting magnetic-pole portion includes a plurality of arc-shaped notches on the same circumference on an inner diameter side thereof.
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公开(公告)号：US09288811B2
公开(公告)日：2016-03-15
申请号：US13500511
申请日：2010-10-06
申请人： Hiromasa Umeda , Takashi Okada , Hiroyuki Ishii
发明人： Hiromasa Umeda , Takashi Okada , Hiroyuki Ishii
CPC分类号： H04W72/082 , H04L5/001 , H04W72/0446 , H04W72/0453 , H04W88/08
摘要： To reduce deterioration of a downlink signal when a multicarrier transmission is performed. A base station device eNB according to the present invention communication system includes: an uplink signal reception unit 17 configured to receive an uplink signal in a first carrier and an uplink signal in a second carrier, the uplink signal being transmitted from a user equipment UE; and a downlink signal transmission unit 15 configured to transmit a downlink signal in the first carrier and a downlink signal in the second carrier to the user equipment UE, wherein the downlink signal transmission unit 15 is configured to decide whether to transmit the downlink signal in the first carrier based on whether the uplink signal reception unit 17 receives the uplink signal in the second carrier.
摘要翻译： 为了减少执行多载波传输时的下行链路信号的恶化。 根据本发明的通信系统的基站设备eNB包括：上行链路信号接收单元17，被配置为在第一载波中接收上行链路信号，并在第二载波中接收上行链路信号，所述上行链路信号从用户设备UE发送; 以及下行链路信号发送单元15，被配置为向所述用户设备UE发送所述第一载波中的下行链路信号和所述第二载波中的下行链路信号，其中，所述下行链路信号发送单元15被配置为决定是否发送所述下行链路信号 第一载波基于上行链路信号接收单元17是否在第二载波中接收到上行链路信号。
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