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公开(公告)号：US07202016B2
公开(公告)日：2007-04-10
申请号：US11116269
申请日：2005-04-28
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7/004
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译： 一种包含特定共聚物和光致酸发生剂的化学放大的辐射敏感性树脂组合物，其中共聚物含有以下重复单元（1）和/或重复单元（2）和重复单元（3-1），
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公开(公告)号：US06933094B2
公开(公告)日：2005-08-23
申请号：US09953941
申请日：2001-09-18
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译： 包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基， ，或R 3和R 4可以与R 3和R 4的氮原子组合形成， 基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子 同时。 该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。
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公开(公告)号：US20050214680A1
公开(公告)日：2005-09-29
申请号：US11116269
申请日：2005-04-28
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译： 包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基， ，或R 3和R 4可以与R 3和R 4的氮原子组合形成， 基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子 同时。 该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。
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公开(公告)号：US06482568B1
公开(公告)日：2002-11-19
申请号：US09662160
申请日：2000-09-14
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator. The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.
摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）含有酸解离基团的树脂，所述酸分解基团在酸解离基解离时不溶或几乎不溶于碱，并且可溶解，包含以下重复单元（I），重复单元 II）和至少一个重复单元（III-1）和（III-2）和（B）光酸产生剂。辐射敏感性树脂组合物适合用作化学增幅抗蚀剂，显示出对 由KrF准分子激光器或ArF准分子激光器表示的深紫外线的活性辐射，表现出优异的耐干蚀刻性，不受蚀刻气体类型的影响，具有高的透射率，表现出作为抗蚀剂的极好的基本特性，例如灵敏度，分辨率， 和图案形状，作为组合物具有优异的储存稳定性，并且对基材表现出足够的粘附性。
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公开(公告)号：US20070254247A1
公开(公告)日：2007-11-01
申请号：US11269761
申请日：2005-11-09
IPC分类号： G03C1/043
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising (A) a resin which comprises at least one recurring unit (I-1), (I-2), or (I-3), and a recurring unit (II), and is insoluble or scarcely soluble in alkali, but becomes alkali soluble by action of an acid, (B) a photoacid generator, and (C) a polycyclic compound. The resin composition is used as a chemically-amplified resist for microfabrication utilizing deep UV rays.
摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）包含至少一个重复单元（I-1），（I-2）或（I-3）和重复单元（II）的树脂， 几乎不溶于碱，但通过酸的作用变得碱溶，（B）光酸产生剂，和（C）多环化合物。 该树脂组合物用作利用深紫外线的微细加工的化学增幅抗蚀剂。
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公开(公告)号：US07005230B2
公开(公告)日：2006-02-28
申请号：US10345157
申请日：2003-01-16
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising (A) a resin which comprises at least one recurring unit (I-1), (I-2), or (I-3), and a recurring unit (II), and is insoluble or scarcely soluble in alkali, but becomes alkali soluble by action of an acid, (B) a photoacid generator, and (C) a polycyclic compound. The resin composition is used as a chemically-amplified resist for microfabrication utilizing deep UV rays
摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）包含至少一个重复单元（I-1），（I-2）或（I-3）和重复单元（II）的树脂， 几乎不溶于碱，但通过酸的作用变得碱溶，（B）光酸产生剂，和（C）多环化合物。 树脂组合物用作利用深紫外线的微细加工的化学增幅抗蚀剂<化学id =“CHEM-US-00001”num =“000
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公开(公告)号：US07531286B2
公开(公告)日：2009-05-12
申请号：US10386707
申请日：2003-03-13
CPC分类号： G03F7/0397 , Y10S430/108 , Y10S430/111 , Y10S430/123 , Y10S430/126
摘要： 1. A radiation-sensitive resin composition comprising: (A) a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid and (B) a photoacid generator. The resin comprises (a) at least one recurring unit of the following formula (1-1) or (1-2), and (b) at least one recurring unit for the following formula (2-1), (2-2), or (2-3).
摘要翻译： 1.一种辐射敏感性树脂组合物，其包含：（A）不溶于或几乎不溶于碱的树脂，但通过酸的作用变得碱溶性，和（B）光酸产生剂。 树脂包含（a）至少一个下式（1-1）或（1-2）的重复单元，和（b）至少一个下式（2-1），（2-2）的重复单元 ）或（2-3）。
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公开(公告)号：US07638261B2
公开(公告)日：2009-12-29
申请号：US12348171
申请日：2009-01-02
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole.
摘要翻译： 适用于利用KrF准分子激光器或ArF准分子激光器表示的各种类型的辐射如深紫外线的用于微细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物包含：（A）包含下式（I-1）所示的重复单元（1-1）和（B）的辐照敏感性酸产生剂的树脂， （4-正丁氧基萘基）四氢噻吩六氟正丁磺酸盐。 辐射敏感性树脂组合物还可以包含（C）酸扩散控制剂如苯基苯并咪唑。
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公开(公告)号：US20090148790A1
公开(公告)日：2009-06-11
申请号：US12348171
申请日：2009-01-02
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole.
摘要翻译： 适用于利用KrF准分子激光器或ArF准分子激光器表示的各种类型的辐射如深紫外线的用于微细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物包含：（A）包含下式（I-1）所示的重复单元（1-1）和（B）的辐照敏感性酸产生剂的树脂， （4-正丁氧基萘基）四氢噻吩六氟正丁磺酸盐。 辐射敏感性树脂组合物还可以包含（C）酸扩散控制剂如苯基苯并咪唑。
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公开(公告)号：US07521169B2
公开(公告)日：2009-04-21
申请号：US10533223
申请日：2003-10-23
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole
摘要翻译： 适用于利用KrF准分子激光器或ArF准分子激光器表示的各种类型的辐射如深紫外线的用于微细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物包含：（A）包含下式（I-1）所示的重复单元（1-1）和（B）的辐照敏感性酸产生剂的树脂， （4-正丁氧基萘基）四氢噻吩六氟正丁磺酸盐。 辐射敏感性树脂组合物还可以包含（C）酸扩散控制剂如苯基苯并咪唑
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